Patents by Inventor Harun H. Solak
Harun H. Solak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10025197Abstract: A method forms a pattern of metallic nanofeatures that generates by plasmonic resonance a desired image having a distribution of colors. The method includes providing a substrate having a layer of photosensitive material, exposing the layer to a high-resolution periodic pattern of dose distribution, and determining a low-resolution pattern of dose distribution such that the sum of the low-resolution pattern and the high-resolution periodic pattern of dose distribution is suitable for forming the pattern of metallic nanofeatures. The lateral dimensions of the metallic nano-features have a spatial variation across the pattern that corresponds to the distribution of colors in the desired image. The layer of photosensitive material is exposed to the low-resolution pattern of dose distribution. The layer of photosensitive material is developed to produce a pattern of nanostructures in the developed photosensitive material.Type: GrantFiled: December 18, 2015Date of Patent: July 17, 2018Assignee: Eulitha A.G.Inventors: Harun H. Solak, Christian Dais, Francis Clube
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Publication number: 20170363968Abstract: A method forms a pattern of metallic nanofeatures that generates by plasmonic resonance a desired image having a distribution of colors. The method includes providing a substrate having a layer of photosensitive material, exposing the layer to a high-resolution periodic pattern of dose distribution, and determining a low-resolution pattern of dose distribution such that the sum of the low-resolution pattern and the high-resolution periodic pattern of dose distribution is suitable for forming the pattern of metallic nanofeatures. The lateral dimensions of the metallic nano-features have a spatial variation across the pattern that corresponds to the distribution of colors in the desired image. The layer of photosensitive material is exposed to the low-resolution pattern of dose distribution. The layer of photosensitive material is developed to produce a pattern of nanostructures in the developed photosensitive material.Type: ApplicationFiled: December 18, 2015Publication date: December 21, 2017Inventors: Harun H. SOLAK, Christian DAIS, Francis CLUBE
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Patent number: 9036133Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.Type: GrantFiled: August 26, 2011Date of Patent: May 19, 2015Assignee: Eulitha AGInventors: Harun H. Solak, Christian Dais, Francis Clube
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Patent number: 9007566Abstract: An apparatus and a method for printing a desired pattern into a photosensitive layer. A mask bears a pattern of linear mask features parallel to a first direction. The layer is arranged parallel to and separated from the mask. Substantially monochromatic light is generated and the mask pattern is illuminated with the light over a range of angles of incidence in a plane parallel to the first direction, at substantially a single angle in an orthogonal plane of incidence and so that the light of each angle of incidence transmitted by the mask forms a light-field component at the layer. The integration of the components prints the desired pattern. The range of angles is selected so that the integration of the components is substantially equivalent to an average of the range of transversal intensity distributions formed between Talbot image planes by light at one of the angles of incidence.Type: GrantFiled: July 30, 2013Date of Patent: April 14, 2015Assignee: Eulitha AGInventors: Francis S. M. Clube, Christian Dais, Harun H. Solak
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Patent number: 8904316Abstract: A method for printing a periodic pattern having a first symmetry and a first period into a photosensitive layer. The method includes providing a mask bearing a pattern of at least two overlapping sub-patterns which have a second symmetry and a second period, the features of each sub-pattern being formed in a transmissive material, providing a substrate bearing the layer, arranging the mask with a separation from the substrate, providing light having a central wavelength for illuminating the mask to generate a light-field in which light of the central wavelength forms a range of intensity distributions between Talbot planes, illuminating said mask pattern with said light while maintaining the separation or changing it by a distance whereby the photosensitive layer is exposed to an average of the range of intensity distributions, wherein the light transmitted by each sub-pattern is shifted in phase relative to that transmitted by another sub-pattern.Type: GrantFiled: November 16, 2011Date of Patent: December 2, 2014Assignee: Eulitha A.G.Inventors: Harun H. Solak, Francis Clube
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Patent number: 8841046Abstract: A system for generating periodic or quasi-periodic patterns on a sample by means of an interference lithography technique includes a photon source, a mask and a sample holder. The mask has a grating for generating a predetermined pattern, wherein the mask is positioned at a first distance from the photon source. The sample holder is disposed at a second distance from the mask on a side facing away from the photon source. The second distance is selected to be where an intensity distribution is substantially stationary and distance-invariant, or the second distance is varied to obtain a desired average intensity distribution on the sample surface.Type: GrantFiled: October 13, 2005Date of Patent: September 23, 2014Assignee: Eulitha AGInventor: Harun H. Solak
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Publication number: 20130344445Abstract: An apparatus and a method for printing a desired pattern into a photosensitive layer. A mask bears a pattern of linear mask features parallel to a first direction. The layer is arranged parallel to and separated from the mask. Substantially monochromatic light is generated and the mask pattern is illuminated with the light over a range of angles of incidence in a plane parallel to the first direction, at substantially a single angle in an orthogonal plane of incidence and so that the light of each angle of incidence transmitted by the mask forms a light-field component at the layer. The integration of the components prints the desired pattern. The range of angles is selected so that the integration of the components is substantially equivalent to an average of the range of transversal intensity distributions formed between Talbot image planes by light at one of the angles of incidence.Type: ApplicationFiled: July 30, 2013Publication date: December 26, 2013Applicant: EULITHA A.G.Inventors: FRANCIS S.M. CLUBE, CHRISTIAN DAIS, HARUN H. SOLAK
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Publication number: 20130329203Abstract: A method for printing a periodic pattern having a first symmetry and a first period into a photosensitive layer. The method includes providing a mask bearing a pattern of at least two overlapping sub-patterns which have a second symmetry and a second period, the features of each sub-pattern being formed in a transmissive material, providing a substrate bearing the layer, arranging the mask with a separation from the substrate, providing light having a central wavelength for illuminating the mask to generate a light-field in which light of the central wavelength forms a range of intensity distributions between Talbot planes, illuminating said mask pattern with said light while maintaining the separation or changing it by a distance whereby the photosensitive layer is exposed to an average of the range of intensity distributions, wherein the light transmitted by each sub-pattern is shifted in phase relative to that transmitted by another sub-pattern.Type: ApplicationFiled: November 16, 2011Publication date: December 12, 2013Applicant: EULITHA A.G.Inventors: Harun H. Solak, Francis Clube
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Patent number: 8525973Abstract: A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for illuminating the mask with an intensity of monochromatic light to generate a transmitted light-field for exposing the recording layer, and illuminating the mask for an exposure time while changing the separation by a distance having a desired value and with a rate of change of separation, wherein at least one of the rate of change of separation and the intensity of light are varied during the change of separation, whereby the mask is illuminated by an energy density per incremental change of separation that varies over said distance.Type: GrantFiled: February 25, 2011Date of Patent: September 3, 2013Assignee: Eulitha A.G.Inventors: Harun H. Solak, Francis S. M. Clube, Christian Dais
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Patent number: 8524443Abstract: A method for printing a desired pattern into a photosensitive layer that includes providing a mask bearing a pattern of linear features that are parallel to a first direction, arranging the layer parallel to and separated from said mask, generating substantially monochromatic light, and illuminating the mask pattern with said light over a range of angles of incidence in a plane parallel to said first direction, at substantially a single angle in an orthogonal plane of incidence and so that the light of each angle of incidence transmitted by the mask forms a light-field component at the layer whereby the integration of said components prints the desired pattern, wherein the range of angles is selected so that the integration of said components is substantially equivalent to an average of the range of transversal intensity distributions formed between Talbot image planes by light at one of the angles of incidence.Type: GrantFiled: July 7, 2010Date of Patent: September 3, 2013Assignee: Eulitha A.G.Inventors: Francis S. M. Clube, Christian Dais, Harun H. Solak
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Patent number: 8368871Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.Type: GrantFiled: February 16, 2010Date of Patent: February 5, 2013Assignee: Eulitha AGInventors: Harun H. Solak, Christian Dais, Francis Clube
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Publication number: 20120092634Abstract: A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for illuminating the mask with an intensity of monochromatic light to generate a transmitted light-field for exposing the recording layer, and illuminating the mask for an exposure time whilst changing the separation by a range having a predetermined value and varying at least one of the rate of change of separation and the intensity of illumination so that the mask is illuminated by an energy density per incremental change of separation that varies over said range, whereby the printed pattern has low sensitivity to a deviation of the range from said predetermined value or to the initial value of the separation.Type: ApplicationFiled: October 13, 2010Publication date: April 19, 2012Inventors: Harun H. Solak, Francis S. M. Clube, Christian Dais
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Publication number: 20120092635Abstract: A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for illuminating the mask with an intensity of monochromatic light to generate a transmitted light-field for exposing the recording layer, and illuminating the mask for an exposure time whilst changing the separation by a distance having a desired value and with a rate of change of separation, wherein at least one of the rate of change of separation and the intensity of light are varied during the change of separation, whereby the mask is illuminated by an energy density per incremental change of separation that varies over said distance.Type: ApplicationFiled: February 25, 2011Publication date: April 19, 2012Inventors: Harun H. Solak, Francis S. M. Clube, Christian Dais
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Publication number: 20120009525Abstract: A method for printing a desired pattern into a photosensitive layer that includes providing a mask bearing a pattern of linear features that are parallel to a first direction, arranging the layer parallel to and separated from said mask, generating substantially monochromatic light, and illuminating the mask pattern with said light over a range of angles of incidence in a plane parallel to said first direction, at substantially a single angle in an orthogonal plane of incidence and so that the light of each angle of incidence transmitted by the mask forms a light-field component at the layer whereby the integration of said components prints the desired pattern, wherein the range of angles is selected so that the integration of said components is substantially equivalent to an average of the range of transversal intensity distributions formed between Talbot image planes by light at one of the angles of incidence.Type: ApplicationFiled: July 7, 2010Publication date: January 12, 2012Inventors: Francis S. M. Clube, Christian Dais, Harun H. Solak
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Publication number: 20110310374Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.Type: ApplicationFiled: August 26, 2011Publication date: December 22, 2011Inventors: Harun H. Solak, Christian Dais, Francis Clube
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Publication number: 20110199598Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.Type: ApplicationFiled: February 16, 2010Publication date: August 18, 2011Inventors: Harun H. Solak, Christian Dais, Francis Clube
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Publication number: 20080186579Abstract: A system for generating periodic or quasi-periodic patterns on a sample by means of an interference lithography technique includes a photon source, a mask and a sample holder. The mask has a grating for generating a predetermined pattern, wherein the mask is positioned at a first distance from the photon source. The sample holder is disposed at a second distance from the mask on a side facing away from the photon source. The second distance is selected to be where an intensity distribution is substantially stationary and distance-invariant, or the second distance is varied to obtain a desired average intensity distribution on the sample surface.Type: ApplicationFiled: October 13, 2005Publication date: August 7, 2008Applicant: Paul Scherrer InstitutInventor: Harun H. Solak
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Patent number: 6926953Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.Type: GrantFiled: March 15, 2004Date of Patent: August 9, 2005Assignee: Wisconsin Alumni Research FoundationInventors: Paul F. Nealey, Juan J. DePablo, Francesco Cerrina, Harun H. Solak, XiaoMin Yang, Richard D. Peters, Qiang Wang
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Publication number: 20040175628Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.Type: ApplicationFiled: March 15, 2004Publication date: September 9, 2004Applicant: Wisconsin Alumni Research FoundationInventors: Paul F. Nealey, Juan J. DePablo, Francesco Cerrina, Harun H. Solak, XiaoMin Yang, Richard D. Peters, Qiang Wang
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Patent number: 6746825Abstract: Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the wettability of the imaging layer in accordance with the interference patterns. A layer of a selected block copolymer is deposited onto the exposed imaging layer and annealed to separate the components of the copolymer in accordance with the pattern of wettability and to replicate the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions of the separated components may be formed with periodic dimensions in the range of 100 nm or less.Type: GrantFiled: October 5, 2001Date of Patent: June 8, 2004Assignee: Wisconsin Alumni Research FoundationInventors: Paul F. Nealey, Juan J. DePablo, Francesco Cerrina, Harun H. Solak, XiaoMin Yang, Richard D. Peters, Qiang Wang