Patents by Inventor Haruo Murayama

Haruo Murayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8691367
    Abstract: A micro channel structure body 10 in which a micro channel 3 having a predetermined cross-sectional shape is formed in a laminate where substrates 1a, 1b, and 1c having formed thereon electrodes 2a, 2b, and 2c made of a thin film are laminated sequentially. The above-mentioned micro channel 3 is formed in a perpendicular direction ? perpendicular to a lamination direction ? of the above-mentioned laminate. Inner surfaces 3a and 3b of the above-mentioned micro channel 3 have an acute angle ? with respect to the lamination direction ? of the above-mentioned laminate. The above-mentioned plurality of electrodes 2a, 2b, and 2c are formed and exposed in the lamination direction ? of the inner surfaces 3a and 3b of the above-mentioned micro channel 3.
    Type: Grant
    Filed: July 16, 2008
    Date of Patent: April 8, 2014
    Assignee: Covalent Materials Corporation
    Inventors: Hiroyuki Goto, Haruo Murayama, Susumu Kimijima, Masahiko Ichishima
  • Publication number: 20090029115
    Abstract: A micro channel structure body 10 in which a micro channel 3 having a predetermined cross-sectional shape is formed in a laminate where substrates 1a, 1b, and 1c having formed thereon electrodes 2a, 2b, and 2c made of a thin film are laminated sequentially. The above-mentioned micro channel 3 is formed in a perpendicular direction ? perpendicular to a lamination direction ? of the above-mentioned laminate. Inner surfaces 3a and 3b of the above-mentioned micro channel 3 have an acute angle ? with respect to the lamination direction ? of the above-mentioned laminate. The above-mentioned plurality of electrodes 2a, 2b, and 2c are formed and exposed in the lamination direction ? of the inner surfaces 3a and 3b of the above-mentioned micro channel 3.
    Type: Application
    Filed: July 16, 2008
    Publication date: January 29, 2009
    Inventors: Hiroyuki Goto, Haruo Murayama, Susumu Kimijima, Masahiko Ichishima
  • Publication number: 20050227118
    Abstract: The present invention provides a plasma resistant member having a reinforced mechanical strength and being sufficiently durable to exposure to a low pressure high density plasma. At least the surface of the alumina based material is formed of an oxide or composite oxide layer of a group IIIA element via an intermediate layer. It is preferable in the construction of the plasma resistant member that the intermediate layer comprises 10 to 80% by weight of the oxide or composite oxide of the group IIIA element in the periodic table and 90 to 20% by weight of alumina. The intermediate layer may also comprise a course ceramic with a porosity of 0.2 to 5%. It is also desirable that at least one of the conditions such as a difference in the thermal shrinkage ratio at 1600 to 1900° C. of 3% or less is provided.
    Type: Application
    Filed: June 10, 2005
    Publication date: October 13, 2005
    Applicant: Toshiba Ceramics Co., Ltd.
    Inventors: Tomonori Uchimaru, Haruo Murayama, Takashi Tanaka, Keiji Morita, Akira Miyazaki
  • Patent number: 6933254
    Abstract: A plasma-resistant article is provided in which a surface region of the article to be exposed to plasma in a corrosive atmosphere is formed from a zirconia-based ceramic that contains yttria in an amount of 7 to 17 mol %. The plasma-resistant article exhibits a sufficient resistance against exposure to plasma and is cost-effective. Preferably, the surface region has a centerline average roughness (Ra) of 1.2 to 5.0 ?m, which is readily achieved through the use of an etching solution containing hydrofluoric acid. The present invention also provides a production method for such a plasma-resistant article.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: August 23, 2005
    Assignee: Toshiba Ceramics Co., Ltd.
    Inventors: Kenji Morita, Hiroko Ueno, Haruo Murayama
  • Publication number: 20030215643
    Abstract: A plasma-resistant article is provided in which a surface region of the article to be exposed to plasma in a corrosive atmosphere is formed from a zirconia-based ceramic that contains yttria in an amount of 7 to 17 mol %. The plasma-resistant article exhibits a sufficient resistance against exposure to plasma and is cost-effective. Preferably, the surface region has a centerline average roughness (Ra) of 1.2 to 5.0 &mgr;m, which is readily achieved through the use of an etching solution containing hydrofluoric acid. The present invention also provides a production method for such a plasma-resistant article.
    Type: Application
    Filed: November 19, 2002
    Publication date: November 20, 2003
    Applicant: Toshiba Ceramics Co., Ltd.
    Inventors: Kenji Morita, Hiroko Ueno, Haruo Murayama
  • Publication number: 20030051811
    Abstract: The present invention provides a plasma resistant member having a reinforced mechanical strength and being sufficiently durable to exposure to a low pressure high density plasma. At least the surface of the alumina based material is formed of an oxide or composite oxide layer of a group IIIA element via an intermediate layer. It is preferable in the construction of the plasma resistant member that the intermediate layer comprises 10 to 80% by weight of the oxide or composite oxide of the group IIIA element in the periodic table and 90 to 20% by weight of alumina. The intermediate layer may also comprise a course ceramic with a porosity of 0.2 to 5%. It is also desirable that at least one of the conditions such as a difference in the thermal shrinkage ratio at 1600 to 1900° C. of 3% or less is provided.
    Type: Application
    Filed: March 29, 2002
    Publication date: March 20, 2003
    Applicant: Toshiba Ceramics Co., Ltd.
    Inventors: Tomonori Uchimaru, Haruo Murayama, Takashi Tanaka, Keiji Morita, Akira Miyazaki
  • Patent number: 6492042
    Abstract: The invention is a method of producing a ceramics material comprising the steps of: preparing a raw powder in which alumina particles having an average particle diameter of 0.1-1.0 &mgr;are doped with at least magnesia of 0.01-1 weight % and a solution containing yttrium of 0.1-15 weight % in yttria; molding said raw powder and calcining a molding thus created; and heating the calcined molding in an atmosphere containing a hydrogen gas to create YAG which is leached to the surface to deposit YAG on the surface and sintering the molding.
    Type: Grant
    Filed: July 10, 2001
    Date of Patent: December 10, 2002
    Assignee: Toshiba Ceramics Co., Ltd.
    Inventors: Keiji Morita, Mitsuhiro Fujita, Haruo Murayama
  • Publication number: 20020012791
    Abstract: The invention of a producing method is a method of producing a ceramics material comprising the steps of: preparing a raw powder in which alumina particles having an average particle diameter of 0.1-1.0 &mgr;are doped with at least magnesia of 0.01-1 weight % and a solution containing yttrium of 0.1-15 weight % in yttria; molding said raw powder and calcining a molding thus created; and heating the calcined molding in an atmosphere containing a hydrogen gas to create YAG which is leached to the surface to deposit YAG on the surface and sintering the molding.
    Type: Application
    Filed: July 10, 2001
    Publication date: January 31, 2002
    Applicant: TOSHIBA CERAMICS CO., LTD.
    Inventors: Keiji Morita, Mitsuhiro Fujita, Haruo Murayama