Patents by Inventor Haruyoshi Kuriyama

Haruyoshi Kuriyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6670282
    Abstract: To produce a SiC crystal in a shape which is used as a wafer, a guide is disposed around a SiC crystal substrate so as to cover a peripheral portion of the SiC crystal substrate. Temperature of the guide may be made higher than the sublimation temperature of the SiC when a SiC crystal is disposed upon and caused to grow on the SiC crystal substrate, thereby controlling and restricting the SiC crystal growth in the direction of the guide. Additionally, when the guide is formed in a substantially hexagonal tube shape, the SiC crystal can be produced in a hexagonal pole shape. In this case, when alignment is made between each diagonal passing through a center of the hexagon shape of the guide and specific direction (<11{overscore (2)}0> or <1{overscore (1)}00> of the SiC crystal substrate), the SiC crystal becomes aligned accordingly.
    Type: Grant
    Filed: September 18, 2001
    Date of Patent: December 30, 2003
    Assignee: Denso Corporation
    Inventors: Haruyoshi Kuriyama, Hiroyuki Kondo, Shouichi Onda, Kazukuni Hara
  • Publication number: 20030054660
    Abstract: To produce a SiC crystal in a shape which is used as a wafer, a guide is disposed around a SiC crystal substrate so as to cover a peripheral portion of the SiC crystal substrate. Temperature of the guide may be made higher than the sublimation temperature of the SiC when a SiC crystal is disposed upon and caused to grow on the SiC crystal substrate, thereby controlling and restricting the SiC crystal growth in the direction of the guide. Additionally, when the guide is formed in a substantially hexagonal tube shape, the SiC crystal can be produced in a hexagonal pole shape. In this case, when alignment is made between each diagonal passing through a center of the hexagon shape of the guide and specific direction (<11{overscore (2)}0> or <1{overscore (1)}00> of the SiC crystal substrate), the SiC crystal becomes aligned accordingly.
    Type: Application
    Filed: September 18, 2001
    Publication date: March 20, 2003
    Inventors: Haruyoshi Kuriyama, Hiroyuki Kondo, Shouichi Onda, Kazukuni Hara
  • Patent number: 6214108
    Abstract: Micropipe defects existing in a silicon carbide single crystal are closed within the single crystal. At least a portion of the micropipe defects opened on the surface of the silicon carbide single crystal (SiC substrate) is sealed up with a coating material. Then heat treatment is performed so as to saturate the inside of the micropipe defects with silicon carbide vapors. By this, the micropipe defects existing in the SiC substrate can be closed within the SiC substrate, not in a newly grown layer. Further, the micropipe defects can be efficiently closed by filling the micropipe defects with a silicon carbide material by preliminarily using super critical fluid and the like.
    Type: Grant
    Filed: May 26, 1999
    Date of Patent: April 10, 2001
    Assignees: Kabushiki Kaisha Toyota Chuo Kenkyusho, Denso Corporation
    Inventors: Atsuto Okamoto, Naohiro Sugiyama, Toshihiko Tani, Nobuo Kamiya, Hiroaki Wakayama, Yoshiaki Fukushima, Kazukuni Hara, Fusao Hirose, Shoichi Onda, Kunihiko Hara, Takashi Onoda, Haruyoshi Kuriyama, Takeshi Hasegawa
  • Patent number: 5925473
    Abstract: A radiation image storage panel having a stimulable phosphor layer and a protective film composed of a plastic material film and a coated layer of a fluororesin-containing resin composition containing light-scattering fine particles gives a radiographic image of improved quality.
    Type: Grant
    Filed: March 31, 1998
    Date of Patent: July 20, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Haruyoshi Kuriyama, Hideki Suzuki, Shinichiro Fukui
  • Patent number: 5585879
    Abstract: In a photosensitive material processing apparatus, a photosensitive material taking on the form of a long strip is fed into a conveyance mechanism and conveyed in this form along a predetermined conveyance path. An exposure device, a reservoir section, a development processing section, and a cutter are located in the conveyance path. The exposure device carries out scanning exposing operations on the long strip of the photosensitive material and thereby forms latent images on the long strip of the photosensitive material. In the reservoir section, a looped portion for serving as a buffer for conveyance is formed in the long strip of the photosensitive material, on which the latent images have been formed. In the development processing section, development processing is carried out on the long strip of the photosensitive material, which is fed via the reservoir section.
    Type: Grant
    Filed: August 3, 1994
    Date of Patent: December 17, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiro Tahara, Yukio Sugita, Youichi Kimura, Kazuo Shiota, Haruyoshi Kuriyama