Patents by Inventor Hayato Watanabe

Hayato Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200298180
    Abstract: A membrane separation apparatus includes: a pump controller to control a rotational speed of a booster pump; an intake water pressure regulation valve controller to control an opening degree of an intake water pressure regulation valve; a drainage water flowrate regulation valve controller to control an opening degree of a drainage water flowrate regulation valve; and a timing adjustor to adjust timings of control by the pump controller, the intake water pressure regulation valve controller, and the drainage water flowrate regulation valve controller. When water is supplied to the membrane separation apparatus, the timing adjustor provides time lags among a control start of the booster pump by the pump controller, a control start of the intake water pressure regulation valve by the intake water pressure regulation valve controller, and a control start of the drainage water flowrate regulation valve by the drainage water flowrate regulation valve controller.
    Type: Application
    Filed: February 20, 2020
    Publication date: September 24, 2020
    Inventors: Yuji TAKASHIMA, Hayato WATANABE, Masaaki HIRAO, Yoshihiko NAKA
  • Publication number: 20200227270
    Abstract: In order to implement a plasma etching method for improving a tapered shape, a plasma processing apparatus includes: a processing chamber in which a sample is subjected to plasma processing; a first radio frequency power source that supplies radio frequency power for generating a plasma; a sample stage on which the sample is placed; a second radio frequency power source that supplies radio frequency power to the sample stage; and a control unit that controls the first radio frequency power source and the second radio frequency power source so as to etch a stacked film formed by alternately stacking a silicon oxide film and a polycrystalline silicon, or a stacked film formed by alternately stacking a silicon oxide film and a silicon nitride film, by using a plasma generated by a mixed gas of a hydrogen bromide gas, a hydrofluorocarbon gas and a nitrogen element-containing gas.
    Type: Application
    Filed: October 26, 2018
    Publication date: July 16, 2020
    Inventors: Taku IWASE, Takao ARASE, Satoshi TERAKURA, Hayato WATANABE, Masahito MORI
  • Publication number: 20200044135
    Abstract: A method of manufacturing a thermoelectric converter includes filling each of a plurality of through-holes in each of a plurality of resin films with fillers containing a plurality of thermoelectric material particles. At this time, a part of the filler is extruded from each through-hole. In this state, the plurality of resin films are stacked together. A top-surface protection member having top-surface conductor patterns is stacked on one side of the plurality of resin films. A back-surface protection member having back-surface conductor patterns is stacked on the other side of the plurality of resin films. Thus, an integrated stacked body is formed. The integrated stacked body is then heated and pressurized. A plurality of thermoelectric material particles are thereby sintered to form the first and second thermoelectric members.
    Type: Application
    Filed: August 29, 2017
    Publication date: February 6, 2020
    Inventors: Toshikazu HARADA, Atusi SAKAIDA, Toshihisa TANIGUCHI, Tomohiro IMURA, Yuki SAKASHITA, Hayato WATANABE
  • Publication number: 20190226923
    Abstract: A heat flux sensor is provided with a main body which detects heat flux, and filling members. The main body has a first surface. The first surface has an uneven shape, with a plurality of concave portions and a plurality of convex portions. The filling members are filled in the plurality of concave portions. Surfaces of the filling members constitutes a part of an outer surface of the heat flux sensor. The degree of flatness of the outer surface is higher than the degree of flatness of the first surface of the main body.
    Type: Application
    Filed: July 7, 2017
    Publication date: July 25, 2019
    Applicant: DENSO CORPORATION
    Inventors: Toshikazu HARADA, Atusi SAKAIDA, Toshihisa TANIGUCHI, Tomohiro IMURA, Hayato WATANABE, Masaya HIRABAYASHI
  • Patent number: 10056236
    Abstract: A plasma processing method for plasma-etching a sample in a metallic processing chamber includes etching the sample with a plasma; plasma-cleaning the processing chamber with a fluorine-containing gas after etching the sample; and plasma-processing the processing chamber with a gas containing sulfur and oxygen after plasma cleaning the processing chamber.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: August 21, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hayato Watanabe, Masahito Mori, Takao Arase, Taku Iwase
  • Publication number: 20180082825
    Abstract: A plasma processing method for plasma-etching a sample in a metallic processing chamber includes etching the sample with a plasma; plasma-cleaning the processing chamber with a fluorine-containing gas after etching the sample; and plasma-processing the processing chamber with a gas containing sulfur and oxygen after plasma cleaning the processing chamber.
    Type: Application
    Filed: February 27, 2017
    Publication date: March 22, 2018
    Inventors: Hayato WATANABE, Masahito MORI, Takao ARASE, Taku IWASE
  • Patent number: 9370746
    Abstract: A reverse osmosis membrane separation device includes: a reverse osmosis membrane module; a flow rate detecting unit configured to detect a flow rate of permeate water to output a detected flow rate value corresponding to the flow rate; a pressure pump configured to be driven at a rotation speed corresponding to an input drive frequency and to feed supply water to the reverse osmosis membrane module; an inverter configured to output a drive frequency corresponding to an input current value signal to the pressure pump; and a control unit configured to calculate a drive frequency of the pressure pump by a velocity type digital PID algorithm, such that a detected flow rate value output from the flow rate detecting unit becomes a target flow rate value that is set in advance to output a current value signal corresponding to a calculation value of the drive frequency to the inverter.
    Type: Grant
    Filed: September 10, 2012
    Date of Patent: June 21, 2016
    Assignee: MIURA CO., LTD.
    Inventors: Atsuyuki Manabe, Hayato Watanabe, Yukio Noguchi
  • Patent number: 9018075
    Abstract: The present invention provides a plasma processing method in which sideetching and microloading can be suppressed in a plasma processing method of forming trenches with a mask having a minimum opening width of 20 nm or less. The plasma processing method of the present invention is characterized by including the steps of forming trenches by plasma etching, forming a nitride film on sidewalls of trenches using plasma, and forming an oxide film on sidewalls and bottom surfaces of the trenches using plasma.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: April 28, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toru Ito, Hiroaki Ishimura, Akito Kouchi, Hayato Watanabe
  • Patent number: 8845888
    Abstract: According to one embodiment, a water treatment system includes: a membrane separation device and a water softening device including a valve unit switching between a softening process in which soft water is obtained by passing raw water through a cation exchange resin bed downward and a regeneration process in which a whole of the cation exchange resin bed is regenerated by generating an opposite flow of a regenerant by supplying the regenerant from both sides of a top portion and a bottom portion of the cation exchange resin bed and collecting a liquid at an intermediate portion of the cation exchange resin bed, and a regenerant supply supplying the regenerant in a volume which gives a regeneration level of 1 to 6 eq/L-R, to a hardness leakage prevention region set in a predetermined depth on the bottom portion of the cation exchange resin bed, in the regeneration process.
    Type: Grant
    Filed: July 5, 2012
    Date of Patent: September 30, 2014
    Assignee: Miura Co., Ltd.
    Inventors: Atsuyuki Manabe, Hayato Watanabe
  • Publication number: 20130164911
    Abstract: The present invention provides a plasma processing method in which sideetching and microloading can be suppressed in a plasma processing method of forming trenches with a mask having a minimum opening width of 20 nm or less. The plasma processing method of the present invention is characterized by including the steps of forming trenches by plasma etching, forming a nitride film on sidewalls of trenches using plasma, and forming an oxide film on sidewalls and bottom surfaces of the trenches using plasma.
    Type: Application
    Filed: February 24, 2012
    Publication date: June 27, 2013
    Inventors: Toru ITO, Hiroaki Ishimura, Akito Kouchi, Hayato Watanabe
  • Publication number: 20130068674
    Abstract: A reverse osmosis membrane separation device includes: a reverse osmosis membrane module; a flow rate detecting unit configured to detect a flow rate of permeate water to output a detected flow rate value corresponding to the flow rate; a pressure pump configured to be driven at a rotation speed corresponding to an input drive frequency and to feed supply water to the reverse osmosis membrane module; an inverter configured to output a drive frequency corresponding to an input current value signal to the pressure pump; and a control unit configured to calculate a drive frequency of the pressure pump by a velocity type digital PID algorithm, such that a detected flow rate value output from the flow rate detecting unit becomes a target flow rate value that is set in advance to output a current value signal corresponding to a calculation value of the drive frequency to the inverter.
    Type: Application
    Filed: September 10, 2012
    Publication date: March 21, 2013
    Applicant: MIURA CO., LTD.
    Inventors: Atsuyuki MANABE, Hayato WATANABE, Yukio NOGUCHI
  • Publication number: 20130026083
    Abstract: According to one embodiment, a water treatment system includes: a membrane separation device and a water softening device including a valve unit switching between a softening process in which soft water is obtained by passing raw water through a cation exchange resin bed downward and a regeneration process in which a whole of the cation exchange resin bed is regenerated by generating an opposite flow of a regenerant by supplying the regenerant from both sides of a top portion and a bottom portion of the cation exchange resin bed and collecting a liquid at an intermediate portion of the cation exchange resin bed, and a regenerant supply supplying the regenerant in a volume which gives a regeneration level of 1 to 6 eq/L-R, to a hardness leakage prevention region set in a predetermined depth on the bottom portion of the cation exchange resin bed, in the regeneration process.
    Type: Application
    Filed: July 5, 2012
    Publication date: January 31, 2013
    Applicant: MIURA CO., LTD.
    Inventors: Atsuyuki MANABE, Hayato WATANABE
  • Patent number: 8020901
    Abstract: A housing including a first member, a second member, a first locking mechanism, and a second locking mechanism. The first member is configured to engage with second member. The first locking mechanism locks the first member to the second member, and unlocks in accordance with pressure provided from external of the housing. And the second locking mechanism locks the first member to the second member, and unlocks by rotating either of the first member or the second member at the second locking mechanism.
    Type: Grant
    Filed: June 28, 2006
    Date of Patent: September 20, 2011
    Assignee: Ricoh Company, Ltd.
    Inventor: Hayato Watanabe
  • Patent number: 7961471
    Abstract: An information processing apparatus having improved cooling efficiency is disclosed. The information processing apparatus includes a first chassis and a second chassis separated from each other at a prescribed distance, the first chassis accommodating a substrate on which high heat generating parts such as a CPU and a chipset are mounted, and the second chassis accommodating low heat generating and low heat resistance parts. Because of this structure, the first chassis and the second chassis are thermally isolated, and the surface area of the apparatus is increased, thereby improving the cooling efficiency of the apparatus.
    Type: Grant
    Filed: May 6, 2008
    Date of Patent: June 14, 2011
    Assignee: Ricoh Company, Ltd.
    Inventors: Satoshi Odanaka, Hayato Watanabe
  • Patent number: 7937012
    Abstract: An angle adjusting device configured to support an operations panel so that up and down rotation of the operations panel against an apparatus main body can be made in a designated angle range and configured to adjust a rotational angle of the operations panel in up and down directions against the apparatus main body, the angle adjusting device includes i) a fixing member fixed to the apparatus main body, ii) a rotation member where the operations panel is provided, the rotation member being provided to the fixing member so as to be rotated with respect to a designated rotation shaft in the designated angle range, iii) a lock mechanism configured to lock rotation of the rotation member against the fixing member with respect to the rotation shaft, at one or more parts in the designated angle range, by using a force other than a frictional force between the fixing member and the rotation member, and iv) a setting mechanism configured to set a lock-on state and lock-off state of the lock mechanism.
    Type: Grant
    Filed: March 16, 2006
    Date of Patent: May 3, 2011
    Assignee: Ricoh Company, Ltd.
    Inventors: Mitsuhiro Kawai, Hayato Watanabe
  • Patent number: 7660114
    Abstract: A heat dissipating member, a heat dissipating mechanism, and an information processing apparatus capable of improving the cooling efficiency without increasing the size of the apparatus are disclosed. In the information processing apparatus, it becomes possible to effectively transfer heat from a unit such as a memory disposed in an inner space of the apparatus to the outside regardless of the layout position of the unit by using the heat dissipating mechanism fixed to a unit and a heat dissipation surface so that the heat is transferred from the unit to the heat dissipation surface.
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: February 9, 2010
    Assignee: Ricoh Company, Ltd.
    Inventors: Hayato Watanabe, Satoshi Odanaka
  • Patent number: 7583518
    Abstract: An information processing device is disclosed that is able to prevent displacement of an extension board caused by vibration or shock, and able to prevent deformation of the extension board and members nearby. The information processing device includes a substrate with a CPU (Central Processing Unit) mounted thereon, a housing that accommodates the substrate, an extension board arranged to be parallel to the substrate, and a supporting member that is fixed on the housing and is arranged to be parallel to at least one end surface of the substrate so that the supporting member supports the extension board.
    Type: Grant
    Filed: January 16, 2007
    Date of Patent: September 1, 2009
    Assignee: Ricoh Company, Ltd.
    Inventor: Hayato Watanabe
  • Patent number: 7564002
    Abstract: An electromechanical device including a key top member (i.e., a push button cover device) used in a push button mechanism. The key top member has a main body, a frame surrounding the main body, and a hinge portion supporting the key top main body. The hinge portion is formed integrally to the frame. The electromechanical device can be used in an operation panel of an image forming apparatus. The hinge and the main body are less susceptible to breakage during transport, installation and maintenance because they are surrounded by the frame.
    Type: Grant
    Filed: July 7, 2006
    Date of Patent: July 21, 2009
    Assignee: Ricoh Company Ltd.
    Inventor: Hayato Watanabe
  • Patent number: 7561428
    Abstract: A disclosed information processing apparatus includes a central processing unit; a substrate on which the central processing unit is mounted; a housing configured to form a space for accommodating the substrate; and a dividing member configured to divide the space into a first space for accommodating the substrate and a second space other than the first space.
    Type: Grant
    Filed: June 8, 2007
    Date of Patent: July 14, 2009
    Assignee: Ricoh Company, Ltd.
    Inventor: Hayato Watanabe
  • Patent number: 7484093
    Abstract: An information processor including a processing device for recording information on a recording medium or reproducing the information recorded on the recording medium, is provided with: an encrypting/decrypting device which is capable of an encrypting operation for encrypting the information to be recorded when the information is recorded on the recording medium and a decrypting operation for decrypting the information to be reproduced from the recording medium when the information is reproduced from the recording medium; the processing device which includes the two or more encrypting/decrypting devices; a control device which controls the encrypting/decrypting device so as to perform one of the encrypting operation and the decrypting operation; and a switching device which switches a transmission path of the information to the encrypting/decrypting device in response to one of the operations performed by the encrypting/decrypting device.
    Type: Grant
    Filed: May 7, 2004
    Date of Patent: January 27, 2009
    Assignee: Pioneer Corporation
    Inventors: Koichiro Kakutani, Yuji Matsumoto, Yasuyuki Umehara, Takashi Irisawa, Takeshi Nonaka, Yukiyoshi Haraguchi, Kyoko Oishi, Shinya Sasatani, Hayato Watanabe, Yuji Shimizu