Abstract: A display device and a bezel thereof are provided. The display device includes a display panel and a bezel. The display panel has a first surface and a second surface. The first surface includes at least one pixel pad section, and the second surface includes at least one circuit pad section. The bezel includes a first surface connecting portion, a second surface connecting portion and at least one conductive wire. The edge of the display panel having the pixel pad section and the circuit pad section is accommodated between the first surface connecting portion and the second surface connecting portion. Each conductive wire has a first end and a second end. The first end is disposed on the first surface connecting portion and the second end is disposed on the second surface connecting portion. The part of the first connecting portion having the first end corresponds to the pixel pad section, and the part of the second connecting portion having the second end corresponds to the circuit pad section.

Abstract: The present invention discloses a flue gas low-temperature adsorption denitrification method, including: pressurizing a flue gas that has been subjected to dust removal and desulfurization, precooling the pressurized flue gas, cooling the precooled flue gas to a temperature lower than room temperature by a flue gas cooling system, flowing the flue gas at the temperature lower than room temperature into a low-temperature denitrification system, performing physical adsorption denitrification in the low-temperature denitrification system, precooling the flue gas that has been subjected to dust removal and desulfurization with the denitrificated flue gas, and flowing the heat-absorbed clean flue gas into a chimney to be discharged.

Abstract: A connector comprises an insulation housing, a shielding shell, an inner sheath, and an outer sheath. The shielding shell is sheathed on the insulation housing. The inner sheath is formed on the shielding shell by injection molding. The inner sheath includes a front end wrapped on the shielding shell and a retaining portion formed on the front end of the inner sheath and spaced from the shielding shell to form a gap therebetween. The outer sheath is formed on the shielding shell and the inner sheath by injection molding. The outer sheath includes an engaging portion embedded in the gap between the retaining portion and the shielding shell. The retaining portion holds the engaging portion on the shielding shell to prevent the formation of a gap between the front end of the outer sheath and the shielding shell.

Abstract: A method includes forming a first overlay feature in a first dielectric layer over a first wafer; forming a second dielectric layer over the first overlay feature and the first dielectric layer; forming an opening in the second dielectric layer by at least using an exposure tool; forming a second overlay feature in the opening of the second dielectric layer, such that a first edge of the first overlay feature is covered by the second dielectric layer; directing an electron beam to the first and second overlay features and the second dielectric layer; detecting the electron beam reflected from the first overlay feature through the second dielectric layer and from the second overlay feature by a detector; obtaining, by a controller, an overlay error between the first overlay feature and the second overlay feature according to the reflected electron beam electrically connected to the detector.

Abstract: A method includes forming a first overlay feature in a first dielectric layer over a first wafer; forming a second dielectric layer over the first overlay feature and the first dielectric layer; forming an opening in the second dielectric layer by at least using an exposure tool; forming a second overlay feature in the opening of the second dielectric layer, such that a first edge of the first overlay feature is covered by the second dielectric layer; directing an electron beam to the first and second overlay features and the second dielectric layer; detecting the electron beam reflected from the first overlay feature through the second dielectric layer and from the second overlay feature by a detector; obtaining, by a controller, an overlay error between the first overlay feature and the second overlay feature according to the reflected electron beam electrically connected to the detector.