Patents by Inventor HEEJAE GOO

HEEJAE GOO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190317408
    Abstract: The inventive concept relates to a substrate processing method and apparatus for providing a plurality of gas layers and contamination prevention liquid layers in a nozzle after the nozzle dispenses photoresist onto a substrate, thereby preventing photoresist in the nozzle from making contact with air and thus preventing the photoresist in the nozzle from being solidified by a reaction of the photoresist with air.
    Type: Application
    Filed: April 10, 2019
    Publication date: October 17, 2019
    Inventors: HEEJAE GOO, KYO SANG YOON, BYOUNGDOO CHOI, SANGMO YANG