Patents by Inventor Hee-Hwan Kim
Hee-Hwan Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240174087Abstract: An embodiment server includes a processor configured to collect driving data based on a driver driving propensity or a driving situation from a plurality of vehicles and to change information for determining an output torque suitable for each of the vehicles by analyzing the driving data and a communication device configured to transmit the changed information for determining the output torque to the vehicles by communicating with the vehicles.Type: ApplicationFiled: April 11, 2023Publication date: May 30, 2024Inventors: Byeong Wook Jeon, Jung Hwan Bang, Hyung Seuk Ohn, Hee Yeon Nah, Won Seok Jeon, Ki Sang Kim, Dong Hoon Won, Dong Hoon Jeong
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Publication number: 20240174236Abstract: An embodiment vehicle driving control apparatus includes a processor configured to determine an output torque of a driving source by using a driver driving propensity for each driver of a plurality of drivers or a driving situation based on a learning algorithm and a memory configured to store algorithms and data to be driven by the processor.Type: ApplicationFiled: April 11, 2023Publication date: May 30, 2024Inventors: Byeong Wook Jeon, Jung Hwan Bang, Hyung Seuk Ohn, Hee Yeon Nah, Won Seok Jeon, Ki Sang Kim, Dong Hoon Won, Dong Hoon Jeong
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Publication number: 20240166640Abstract: The present disclosure relates to a heteroaryl derivative and uses thereof. The heteroaryl derivative of the present disclosure exhibits excellent inhibitory activity against EGFR and/or HER2, and thus may be usefully employed as a therapeutic agent for EGFR- and/or HER2-related diseases.Type: ApplicationFiled: January 16, 2024Publication date: May 23, 2024Applicant: Voronoi Inc.Inventors: Youn Ho LEE, Seon Ah Hwang, In Seob Shim, Hyeon Ho Jeon, Woo Mi Do, Hee Sun Ryu, Jung Beom Son, Nam Doo Kim, Sung Hwan Kim, Hong Ryul Jung, Young Yi Lee
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Publication number: 20240165824Abstract: Disclosed herein is an inspection robot system for the customs inspection of container-loaded cargo. The inspection robot system includes: an attachment-type mobile robot configured to drive in the state of being attached to the top surface of a container; and a flexible robot system configured to interface with the attachment-type mobile robot, to selectively accommodate and extend a flexible robot having multiple degrees of freedom, and to perform inspection on cargo.Type: ApplicationFiled: August 23, 2023Publication date: May 23, 2024Applicants: Korea Advanced Institute of Science and Technology, UJIN Technology, Inc.Inventors: Ki Uk KYUNG, Jee Hwan RYU, Ye Sung YI, Hee Ju MUN, Ji Sung KIM, Dong Geol LEE, Joong Ku LEE, Young Geun KIM, Gee Joon EUM, Hyun Su KIM, Hyun Soo JO
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Publication number: 20240166214Abstract: An apparatus and a method for predicting a speed of a vehicle. The apparatus includes storage that stores past driving information of the vehicle. The apparatus also includes a controller that extracts feature information about a current state of the vehicle from the past driving information of the vehicle. The controller also generates a query corresponding to each target time point based on the feature information. The controller also determines forward information corresponding to each target time point by using each query. The controller also predicts the speed of the vehicle at each target time point based on the query corresponding to each target time point and the forward information corresponding to each target time point.Type: ApplicationFiled: May 1, 2023Publication date: May 23, 2024Applicants: HYUNDAI MOTOR COMPANY, KIA CORPORATIONInventors: Won Seok Jeon, Jung Hwan Bang, Hyung Seuk Ohn, Hee Yeon Nah, Ki Sang Kim, Byeong Wook Jeon, Dong Hoon Won, Dong Hoon Jeong
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Patent number: 11991902Abstract: A display device includes a bank including an opening exposing a surface of a base. The bank further includes side surfaces adjacent to an upper surface. The side surfaces slope downward from the upper surface toward an opening in an organic film pattern. A plurality of fine holes is formed on the upper surface and the side surfaces, the bank may also include a plurality of inner holes.Type: GrantFiled: May 5, 2022Date of Patent: May 21, 2024Assignee: Samsung Display Co., Ltd.Inventors: Myung Hwan Kim, Suk Hoon Kang, Min Jae Kim, Hee Ra Kim, Beom Soo Shin, Hong Yeon Lee, Baek Kyun Jeon
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Patent number: 11990361Abstract: The chuck for supporting a target substrate for a display device, the chuck includes: a base having a first surface to support an object and a second surface opposite the first surface, the first surface including a first area and a second area; and indentations formed in the second area and recessed from the first area in a thickness direction of the base. The indentations include a first indentation extending in a first direction and a second indentation extending in a second direction intersecting the first direction.Type: GrantFiled: July 1, 2021Date of Patent: May 21, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Hee Sun Jang, Tae Hun Kim, Do Hwan Kim, Jae Han Kim, Seung Ho Myoung, Dae Young Oh, Gyeong Hee Han
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Publication number: 20240161336Abstract: A method of generating a human model according to the present disclosure may include generating a plurality of feature maps from an input image, wherein the plurality of feature maps include a body center map, a part index map, a body part map and a parameter map, generating a part-attentive feature configured with feature maps for each body part based on the part index map and the body part map, readjusting the part-attentive feature based on the parameter map and generating a pose parameter based on the readjusted part-attentive feature.Type: ApplicationFiled: November 15, 2023Publication date: May 16, 2024Applicants: Electronics and Telecommunications Research Institute, Konkuk University Industrial Cooperation CorpInventors: Gi Mun UM, Hee Kyung LEE, Won Jun KIM, Jeong Hwan KIM
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Publication number: 20240153792Abstract: An apparatus and method for processing a substrate can reduce the concentration of process by-products in a chemical solution.Type: ApplicationFiled: November 7, 2023Publication date: May 9, 2024Applicants: SEMES CO., LTD., SAMSUNG ELECTRONICS CO., LTD.Inventors: Min Jung KIM, Jin Ah HAN, Hee Hwan KIM, Yong Hoon HONG, Kyoung Suk KIM, Jong Hyeok PARK, Jin Hyung PARK, Dae Hyuk CHUNG, Ji Hoon CHA
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Patent number: 11963439Abstract: The present disclosure relates to an organic electroluminescent compound and an organic electroluminescent device comprising the same. By comprising the compound according to the present disclosure, it is possible to produce an organic electroluminescent device having improved driving voltage, power efficiency, and/or lifetime properties compared to the conventional organic electroluminescent devices.Type: GrantFiled: August 24, 2022Date of Patent: April 16, 2024Assignee: Rohm and Haas Electronic Materials Korea Ltd.Inventors: Eun-Joung Choi, Young-Kwang Kim, Su-Hyun Lee, So-Young Jung, YeJin Jeon, Hong-Se Oh, Dong-Hyung Lee, Jin-Man Kim, Hyun-Woo Kang, Mi-Ja Lee, Hee-Ryong Kang, Hyo-Nim Shin, Jeong-Hwan Jeon, Sang-Hee Cho
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Publication number: 20240104464Abstract: A system selecting a process key factor in a commercial chemical process, includes: a data extraction unit that extracts tag data in units of a set period; an outlier discrimination unit that discriminates and aggregates outliers by tag by using an outlier extraction reference master; an outlier processing unit that generates an input mart draft excluding the outliers; a derived variable generation unit that generates derived variables for each tag, and generates an advanced input mart having the derived variable added thereto; a yield calculation unit that backs up the result of calculation of a yield by realizing a target value via exclusion and correction of the outliers; and a key factor extraction unit that extracts a yield key factor by calculating importance of each tag, and backs up importance data for each tag.Type: ApplicationFiled: April 27, 2022Publication date: March 28, 2024Applicant: SK GAS CO., LTD.Inventors: Ung Gi HONG, Sung Joo YEO, Seung Hwan KONG, Min Ho KIM, Hae Bin SHIN, Hee Dong CHOI, Young Gook KYE
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SYSTEM AND METHOD FOR PREDICTING PROCESS CHANGES BY USING KEY FACTORS IN COMMERCIAL CHEMICAL PROCESS
Publication number: 20240095548Abstract: A system for predicting process changes by using key factors in a commercial chemical process, includes: a key factor extraction and individual tag importance backup unit that extracts yield key factors by calculating the importance of each tag, and backs up importance data for each tag; and a yield prediction model training and yield prediction performing unit that performs yield prediction model training by using the importance of each tag accumulated in the key factor extraction and individual tag importance backup unit, and performs yield prediction so as to output a yield prediction result, evaluates performance, and selects an optimal prediction model.Type: ApplicationFiled: April 27, 2022Publication date: March 21, 2024Applicant: SK GAS CO., LTD.Inventors: Ung Gi HONG, Sung Joo YEO, Seung Hwan KONG, Min Ho KIM, Hae Bin SHIN, Hee Dong CHOI, Young Gook KYE -
Publication number: 20240075810Abstract: Disclosed are an apparatus for distributing power of an electric vehicle and a method thereof capable of optimally improving the energy consumption efficiency of the electric vehicle by predicting a vehicle speed for a predetermined time using a learned vehicle speed prediction model, determining wheel power based on the vehicle speed, and distributing the wheel power to a front wheel drive motor and a rear wheel drive motor. The apparatus includes a storage that stores a vehicle speed prediction model in which learning is completed, and a controller that predicts a vehicle speed for a preset time using the vehicle speed prediction model, determines wheel power based on the vehicle speed, and distributes the wheel power to a front wheel drive motor and a rear wheel drive motor.Type: ApplicationFiled: January 26, 2023Publication date: March 7, 2024Applicants: HYUNDAI MOTOR COMPANY, KIA CORPORATIONInventors: Dong Hoon Won, Hyung Seuk Ohn, Dong Hoon Jeong, Won Seok Jeon, Ki Sang Kim, Byeong Wook Jeon, Jung Hwan Bang, Hee Yeon Nah
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Publication number: 20240074708Abstract: It is disclosed a blood glucose prediction system and method using saliva-based artificial intelligence deep learning technique.Type: ApplicationFiled: September 1, 2023Publication date: March 7, 2024Applicant: DONG WOON ANATECH CO., LTD.Inventors: In Su Jang, Min Su Kwon, Hee Jung Kwon, Sung Hwan Chung, Eun Hye Im, Ji Won Kye, Eun Hyun Shim, Hee Jin Kim, Mi Rim Kim, Hyun Seok Cho, Dong Cheol Kim
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Patent number: 11923368Abstract: A semiconductor device includes a first junction-gate field-effect transistor (JFET) having a first pinch-off voltage, and a second JFET having a second pinch-off voltage higher than the first pinch-off voltage. The first JFET includes a first top gate region disposed on a surface of a substrate, a first channel region surrounding the first top gate region, and a first bottom gate region disposed under the first channel region. The second JFET includes a second top gate region disposed on the surface and having a same depth with the first top gate region relative to the surface, a second channel region surrounding the second top gate region and disposed deeper than the first channel region relative to the surface, and a second bottom gate region disposed under the second channel region and being deeper than the first bottom gate region relative to the surface.Type: GrantFiled: December 17, 2021Date of Patent: March 5, 2024Assignee: KEY FOUNDRY CO., LTD.Inventors: Ji Man Kim, Hee Hwan Ji, Song Hwa Hong
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Publication number: 20240011158Abstract: According to the disclosed substrate processing apparatus, a first bowl is located to correspond to a substrate, and a first chemical solution supply module supplies a first chemical solution while a support module rotates at a first speed, and a second bowl is located to correspond to the substrate, and a second chemical solution supply module supplies a second chemical solution at a first flow rate while a support module rotates at a second speed equal to or smaller than the first speed, and the second bowl is located to correspond to the substrate, and the second chemical solution supply module does not supply the second chemical solution or supplies the second chemical solution at a second flow rate smaller than the first flow rate while the support module rotates at a third speed smaller than the second speed.Type: ApplicationFiled: September 26, 2023Publication date: January 11, 2024Inventors: Hee Hwan Kim, Cheol Yong Shin, Jae Youl Kim, Moon Sik Choi
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Publication number: 20230203672Abstract: Disclosed is a method of adjusting a concentration of a chemical liquid in a treatment liquid, the method including: treating a substrate by supplying a treatment liquid stored in a main tank from a nozzle in a heated state to the substrate, and recovering the treatment liquid used in the treatment of the substrate to the main tank directly or via still another tank, and then reusing the recovered treatment liquid, a concentration adjustment operation of adjusting a concentration of the treatment liquid in the main tank is performed in a standby time period in which the substrate is not treated with the treatment liquid, and the concentration adjustment operation is performed by discharging the treatment liquid in a heated state from the nozzle to evaporate a part of the diluting solution, and recovering the discharged treatment liquid to the main tank.Type: ApplicationFiled: December 27, 2022Publication date: June 29, 2023Inventors: Jun Kil HWANG, Min Jung KIM, Hee Hwan KIM, Seong Soo LEE
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Publication number: 20220205093Abstract: According to the disclosed substrate processing apparatus, a first bowl is located to correspond to a substrate, and a first chemical solution supply module supplies a first chemical solution while a support module rotates at a first speed, and a second bowl is located to correspond to the substrate, and a second chemical solution supply module supplies a second chemical solution at a first flow rate while a support module rotates at a second speed equal to or smaller than the first speed, and the second bowl is located to correspond to the substrate, and the second chemical solution supply module does not supply the second chemical solution or supplies the second chemical solution at a second flow rate smaller than the first flow rate while the support module rotates at a third speed smaller than the second speed.Type: ApplicationFiled: November 15, 2021Publication date: June 30, 2022Inventors: Hee Hwan Kim, Cheol Yong Shin, Jae Youl Kim, Moon Sik Choi
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Patent number: 7839358Abstract: A plasma display panel sustain-discharge circuit. First and second signal lines for supplying first and second voltages and at least one inductor coupled between one end of the panel capacitor and a third voltage are formed. Energy is stored in the inductor through a path formed between the third voltage and the first signal line in a state where a voltage of one end of the panel capacitor is substantially fixed to the first voltage. The voltage of one end of the panel capacitor substantially decreases to the second voltage using resonance current generated between the inductor and the panel capacitor and the stored energy. Energy is stored in the inductor through a path formed between the third voltage and the second line in a state where a voltage of one end of the panel capacitor is substantially fixed to the second voltage.Type: GrantFiled: November 30, 2006Date of Patent: November 23, 2010Assignee: Samsung SDI Co., Ltd.Inventors: Joo-Yul Lee, Kyoung-Ho Kang, Hee-Hwan Kim
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Patent number: 7796238Abstract: Exposure equipment having a wafer pre-alignment apparatus and a wafer pre-alignment method using the same reduce wafer pre-alignment errors. The exposure equipment comprises a plurality of exposure units in which lots of wafers are loaded, respectively, and a central control unit. The exposure units are constituted by an alignment apparatus that can detect the relative angular orientation of each wafer transferred to the apparatus and thus, sense any misalignment of the wafers. The central control unit calculates inherent error values for the exposure units based on data transmitted to the central control unit from the alignment apparatus. The central control unit also controls the equipment based on the inherent error values of the exposure units to compensate for the misalignment of the wafers in the exposure units.Type: GrantFiled: January 29, 2007Date of Patent: September 14, 2010Assignee: Samsung Electronics Co., Ltd.Inventor: Hee-Hwan Kim