Patents by Inventor HEESANG YOUN

HEESANG YOUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HOMOGENOUS PLASMA CHEMICAL REACTION DEVICE
    Publication number: 20140224643
    Abstract: A plasma system is disclosed. The system includes: a plasma device including at least one electrode; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; a precursor source configured to supply at least one precursor feedstock to the plasma device, wherein the at least one precursor feedstock includes at least one catalyst material; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media and the at least one precursor feedstock at the plasma device to form a plasma effluent.
    Type: Application
    Filed: January 27, 2014
    Publication date: August 14, 2014
    Applicant: Colorado State University Research Foundation
    Inventors: GEORGE J. COLLINS, IL-GYO KOO, HEESANG YOUN, MYEONG YEOL CHOI, CARL W. ALMGREN