Patents by Inventor Heiko D Moritz

Heiko D Moritz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040025908
    Abstract: An elevated pressure and temperature fluid processing system providing a pressurized fluid delivery system including a process fluid supply system and pump for supplying a process fluid at a process pressure, and a process fluid heater for heating the process fluid; a process chamber with a process chamber heater; and a process discharge collection system. The system also provides a process chamber inflow valve for connecting the pressurized fluid delivery system to the process chamber for fluid flow, and a process chamber outflow valve for connecting the process chamber to the collection system for fluid flow. A process chamber bypass valve connects the pressurized fluid delivery system to the process discharge collection system so as to bypass the process chamber. A computer control system controls the pump, the process fluid heater, the chamber heater, and the valves.
    Type: Application
    Filed: August 5, 2003
    Publication date: February 12, 2004
    Inventors: Stephen Douglas, Rick White, Keith Pope, David J. Mount, Heiko D. Moritz
  • Patent number: 6612317
    Abstract: A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical carbon dioxide cleaning and processing of semiconductor wafers. The system provides for steady-state operation of fluid flow and byproducts recovery while the process chamber is brought rapidly and repeatedly on and off line as in batch operations and for various process steps.
    Type: Grant
    Filed: April 18, 2001
    Date of Patent: September 2, 2003
    Assignee: S.C. Fluids, INC
    Inventors: Michael A. Costantini, Mohan Chandra, Heiko D. Moritz, Ijaz H. Jafri, David J. Mount, Rick M. Heathwaite
  • Patent number: 6602349
    Abstract: A dry process for the cleaning of precision surfaces such as of semiconductor wafers, by using process materials such as carbon dioxide and useful additives such as cosolvents and surfactants, where the process materials are applied exclusively in gaseous and supercritical states. Soak and agitation steps are applied to the wafer, including a rapid decompression of the process chamber after a soak period at higher supercritical pressure, to mechanically weaken break up the polymers and other materials sought to be removed, combined with a supercritical fluid flush to carry away the loose debris.
    Type: Grant
    Filed: May 18, 2001
    Date of Patent: August 5, 2003
    Assignee: S.C. Fluids, Inc.
    Inventors: Mohan Chandra, David J. Mount, Michael A. Costantini, Heiko D. Moritz, Ijaz Jafri, Jim Boyd, Rick M. Heathwaite
  • Patent number: 6497239
    Abstract: An inverted pressure vessel system for conducting automated industrial processes requiring elevated pressure and temperatures has a vertically movable pedestal for opening and closing the underside loading port, with pedestal drive system and locking mechanism located below the pedestal top and isolated from the chamber opening. The chamber is connectible to a pressure control and process fluid supply system, and has heat exchangers connected to an external source for temperature control. Process fluids are distributed across a central process cavity through divergent inflow and convergent outflow process fluid channels.
    Type: Grant
    Filed: February 5, 2001
    Date of Patent: December 24, 2002
    Assignee: S. C. Fluids, Inc.
    Inventors: Robert B Farmer, Jonathan A. Talbott, Mohan Chandra, James A. Tseronis, Heiko D. Moritz
  • Publication number: 20020017521
    Abstract: A pressure vessel closing system for conducting industrial processes has a pressure vessel with an underside door opening having a major and a minor axis, a cover that is proportionally larger than the door opening, and an external door operating mechanism. The door operating mechanism has door manipulation capabilities for inward movement, rotation, lateral movement, tilting movement, and outward movement of the cover into and out of the pressure vessel through the door opening, for internally closing the door against the inner face of the door opening; the door being then self sealing from the pressure applied within the pressure vessel.
    Type: Application
    Filed: August 10, 2001
    Publication date: February 14, 2002
    Inventors: Robert B. Farmer, Heiko D. Moritz
  • Publication number: 20020014257
    Abstract: A dry process for the cleaning of precision surfaces such as of semiconductor wafers, by using process materials such as carbon dioxide and useful additives such as cosolvents and surfactants, where the process materials are applied exclusively in gaseous and supercritical states. Soak and agitation steps are applied to the wafer, including a rapid decompression of the process chamber after a soak period at higher supercritical pressure, to mechanically weaken break up the polymers and other materials sought to be removed, combined with a supercritical fluid flush to carry away the loose debris.
    Type: Application
    Filed: May 18, 2001
    Publication date: February 7, 2002
    Inventors: Mohan Chandra, David J. Mount, Michael A. Costantini, Heiko D. Moritz, Ijaz H. Jafri, Jim Boyd, Rick M. Heathwaite
  • Patent number: 6334266
    Abstract: A method and apparatus for fabricating and drying wafers, including micro-electro-mechanical system (MEMS) structures, in a second, supercritical processing fluid environment. The apparatus utilizes an inverted pressure vessel connected to a supercritical processing fluid supply and recover system, with an internal heat exchanger connected to external heating and cooling sources, which is closed with a vertically movable base plate. A wafer cassette configured for supporting multiple wafers is submerged in a first processing fluid within a container, which is installed on the base plate for insertion into the pressure vessel. Vessel inlet and outlet tubes extend vertically downward from the ceiling of the pressure vessel to nearly the base plate. Container inlet and outlet tubes extend vertically downward from the ceiling of the pressure vessel to inside the container and nearly to the bottom of the container.
    Type: Grant
    Filed: September 20, 2000
    Date of Patent: January 1, 2002
    Assignee: S.C. Fluids, Inc.
    Inventors: Heiko D Moritz, Jonathan A. Talbott, Mohan Chandra, James A. Tseronis, Ijaz Jafri
  • Publication number: 20010050096
    Abstract: A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical carbon dioxide cleaning and processing of semiconductor wafers. The system provides for steady-state operation of fluid flow and byproducts recovery while the process chamber is brought rapidly and repeatedly on and off line as in batch operations and for various process steps.
    Type: Application
    Filed: April 18, 2001
    Publication date: December 13, 2001
    Inventors: Michael A. Costantini, Mohan Chandra, Heiko D. Moritz, Ijaz H. Jafri, David J. Mount, Rick M. Heathwaite
  • Publication number: 20010029971
    Abstract: An inverted pressure vessel system for conducting automated industrial processes requiring elevated pressure and temperatures has a vertically movable pedestal for opening and closing the underside loading port, with pedestal drive system and locking mechanism located below the pedestal top and isolated from the chamber opening. The chamber is connectible to a pressure control and process fluid supply system, and has heat exchangers connected to an external source for temperature control. Process fluids are distributed across a central process cavity through divergent inflow and convergent outflow process fluid channels.
    Type: Application
    Filed: February 5, 2001
    Publication date: October 18, 2001
    Inventors: Robert B. Farmer, Jonathan A. Talbott, Mohan Chandra, James A. Tseronis, Heiko D. Moritz