Patents by Inventor Heiner Bayer

Heiner Bayer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5366573
    Abstract: Assembly of semiconductor chips is accomplished using an acrylate-based adhesive which can be cured rapidly by UV light and which gives an adhesive bond that is resistant to soldering by can be readily removed by solvents after soldering. During assembly, the back sides of the semiconductor chips are bonded to a temporary carrier by the adhesive and adjusted to the proper mirror image position on the carrier before the adhesive is cured. The chip array is then soldered on a component and the temporary carrier is removed from the chips by a solvent.
    Type: Grant
    Filed: August 24, 1993
    Date of Patent: November 22, 1994
    Assignee: Siemens Nixdorf Informationssysteme AG
    Inventors: Heiner Bayer, Barbara Lehner, Oskar Wirbser, Gregor Unger
  • Patent number: 5242715
    Abstract: In a process for coating or bonding electronic components and subassemblies with reaction resin mixtures that are stable in storage at room temperature as a one-component system for several months, reaction resin mixtures are used, which contain the following components:a cationically hardenable, solvent-free epoxy resin;a triarylsulphonium salt with hexafluorophosphate, -arsenate or -antimonate as anion, with a mass concentration of 0.01 to 5% (relative to epoxy resin); anda benzylthiolanium salt with hexafluorophosphate, -arsenate or -antimonate as anion, with a mass concentration of 0.01 to 5% (relative to epoxy resin);as well as possibly customary additives.These reaction resin mixtures are hardened through UV radiation and thermally.
    Type: Grant
    Filed: February 14, 1992
    Date of Patent: September 7, 1993
    Assignee: Siemens Aktiengesellschaft
    Inventors: Lothar Schoen, Bernhard Stapp, Heiner Bayer, Helmut Markert, Volker Muhrer
  • Patent number: 5227219
    Abstract: An acoustically matched reaction resin compound for damping coating of surface wave components is disclosed that contains one or more epoxy resins, one or more dicarboxylic acids or polycarboxylic acids or, respectively, acidic esters of dicarboxylic acids or polycarboxylic acids, an aliphatic or hetero-aromatic amine in a proportion sufficient to catalyze the cross linking of the reaction resin compound, and a solvent. The number of amine hydrogen equivalents and acid equivalents together is less than the number of epoxy equivalents and the uniformly mixed reaction resin compound can be set to a predetermined viscosity and thixotropy required for the application. For example, the reaction resin compound can be applied onto the wafer containing the surface wave components in a silk screening process. Sharp contours can be produced that survive the curing process in an unmodified state.
    Type: Grant
    Filed: September 5, 1989
    Date of Patent: July 13, 1993
    Assignee: Siemens Aktiengesellschaft
    Inventors: Heiner Bayer, Michael Rogalli, Frank Dittrich, Hans Stelzl
  • Patent number: 5158990
    Abstract: A drop coating compound in particular, for unhoused electrical and electronic circuits and components. The compound includes highly filled ultraviolet-curable epoxy resin compounds having improved properties with respect to their use and in comparison to previously used, predominantly two-component, thermally curable resins.
    Type: Grant
    Filed: January 30, 1992
    Date of Patent: October 27, 1992
    Assignee: Siemens Aktiengesellschaft
    Inventors: Heiner Bayer, Barbara Lehner, Hans-Peter Fritsch, Kurt Wohak
  • Patent number: 4970399
    Abstract: UV-hardenable reaction resin compounds are irradiated in an applicator and immediately fed to an object that is to be covered. An initial, not activated reaction resin compound is irradiated after entering an input opening in a reactor having an irradiation space, a UV-radiation source and, optionally, a reflector. Immediately thereafter the activated compound is fed to an object to be coated or to an object to be surrounded, in an open casting mold or to a closed casting mold via the exit opening, optionally via a casting canal. The method and the apparatus are particularly well suited for covering semiconductor components and for encapsulating active and passive components as well as for cementing UV-impermeable fitting parts.
    Type: Grant
    Filed: August 10, 1989
    Date of Patent: November 13, 1990
    Assignee: Siemens Aktiengesellschaft
    Inventors: Reiner Habrich, Heiner Bayer
  • Patent number: 4880662
    Abstract: UV-hardenable reaction resin compounds are irradiated in an applicator and immediately fed to an object that is to be covered. An intitial, not activated reaction resin compound is irradiated after entering an input opening in a reactor having an irradiation space, a UV-radiation source and, optionally, a reflector. Immediately thereafter the activated compound is fed to an object to be coated or to an object to be surrounded, in an open casting mold or to a closed casting mold via the exit opening, optionally via a casting canal. The method and the apparatus are particularly well suited for covering semiconductor components and for encapsulating active and passive components as well as for cementing UV-impermeable fitting parts.
    Type: Grant
    Filed: February 2, 1988
    Date of Patent: November 14, 1989
    Assignee: Siemens Aktiengesellschaft
    Inventors: Reiner Habrich, Heiner Bayer