Patents by Inventor Helene Gehles

Helene Gehles has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and arrangement for analyzing a semiconductor element and method for manufacturing a semiconductor component
    Patent number: 9991177
    Abstract: According to the improved concept, a method for analyzing a semiconductor element comprising polymer residues located on a surface of the semiconductor element is provided. The method comprises marking at least a fraction of the residues by exposing the semiconductor element to a fluorescent substance and detecting the marked residues by visualizing the marked residues on the surface of the semiconductor element using fluorescence microscopy.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: June 5, 2018
    Assignee: ams AG
    Inventors: Helene Gehles, Thomas Bodner, Joerg Siegert
  • METHOD AND ARRANGEMENT FOR ANALYZING A SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING A SEMICONDUCTOR COMPONENT
    Publication number: 20180090393
    Abstract: According to the improved concept, a method for analyzing a semiconductor element comprising polymer residues located on a surface of the semiconductor element is provided. The method comprises marking at least a fraction of the residues by exposing the semiconductor element to a fluorescent substance and detecting the marked residues by visualizing the marked residues on the surface of the semiconductor element using fluorescence microscopy.
    Type: Application
    Filed: November 29, 2017
    Publication date: March 29, 2018
    Inventors: Helene GEHLES, Thomas BODNER, Joerg SIEGERT
  • Method and arrangement for analyzing a semiconductor element and method for manufacturing a semiconductor component
    Patent number: 9852955
    Abstract: According to the improved concept, a method for analyzing a semiconductor element comprising polymer residues located on a surface of the semiconductor element is provided. The method comprises marking at least a fraction of the residues by exposing the semiconductor element to a fluorescent substance and detecting the marked residues by visualizing the marked residues on the surface of the semiconductor element using fluorescence microscopy.
    Type: Grant
    Filed: November 3, 2016
    Date of Patent: December 26, 2017
    Assignee: AMS AG
    Inventors: Helene Gehles, Thomas Bodner, Joerg Siegert