Patents by Inventor Helmut Banzhof
Helmut Banzhof has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9153413Abstract: A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.Type: GrantFiled: February 22, 2008Date of Patent: October 6, 2015Assignee: Applied Materials Israel, Ltd.Inventors: Gilad Almogy, Avishai Bartov, Juergen Frosien, Pavel Adamec, Helmut Banzhof
-
Patent number: 8735847Abstract: A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.Type: GrantFiled: November 25, 2008Date of Patent: May 27, 2014Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Helmut Banzhof, Juergen Frosien, Dieter Winkler
-
Patent number: 8294096Abstract: A charged particle beam device is provided, including: a charged particle beam source adapted to generate a charged particle beam on an axis; an optical aberration correction device and an objective lens device, which define a corrected beam aperture angle adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device and the objective lens device are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle; and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle which is equal or less than the corrected beam aperture angle. Further, a method of operating a charged particle beam device is provided.Type: GrantFiled: April 18, 2011Date of Patent: October 23, 2012Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventor: Helmut Banzhof
-
Patent number: 8164067Abstract: It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.Type: GrantFiled: February 5, 2010Date of Patent: April 24, 2012Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Pavel Adamec, Helmut Banzhof, Ivo Liska
-
Patent number: 8049180Abstract: An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.Type: GrantFiled: October 26, 2007Date of Patent: November 1, 2011Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik MBHInventors: Juergen Frosien, Helmut Banzhof
-
Publication number: 20110253893Abstract: A charged particle beam device is provided, including: a charged particle beam source adapted to generate a charged particle beam on an axis; an optical aberration correction device and an objective lens device, which define a corrected beam aperture angle adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device and the objective lens device are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle; and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle which is equal or less than the corrected beam aperture angle. Further, a method of operating a charged particle beam device is provided.Type: ApplicationFiled: April 18, 2011Publication date: October 20, 2011Applicant: ICT Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik mbHInventor: Helmut BANZHOF
-
Publication number: 20110163229Abstract: A scanning charged particle beam device (100) is described. The scanning charged particle beam device includes a beam emitter (102) for emitting a primary electron beam, a first scan stage for scanning the beam over a specimen, an achromatic beam separator (130) adapted for separating a signal electron beam from the primary electron beam, and a detection unit (172,174,178) for detecting signal electrons.Type: ApplicationFiled: February 22, 2008Publication date: July 7, 2011Applicant: APPLIED MATERIALS ISRAEL, LTD.Inventors: Juergen Frosien, Helmut Banzhof, Pavel Adamec
-
Publication number: 20100320382Abstract: A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.Type: ApplicationFiled: February 22, 2008Publication date: December 23, 2010Applicant: APPLIED MATERIALS ISRAEL, LTD.Inventors: Gilad Almogy, Avishai Bartov, Jürgen Frosien, Pavel Adamec, Helmut Banzhof
-
Patent number: 7838830Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.Type: GrantFiled: October 24, 2007Date of Patent: November 23, 2010Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventors: Juergen Frosien, Helmut Banzhof, Jacob Levin, Dror Shemesh
-
Patent number: 7800075Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.Type: GrantFiled: August 19, 2008Date of Patent: September 21, 2010Inventors: Benyamin Buller, William J. DeVore, Juergen Frosien, Xinrong Jiang, Richard L. Lozes, Henry Thomas Pearce-Percy, Dieter Winkler, Steven T. Coyle, Helmut Banzhof
-
Publication number: 20100200748Abstract: It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.Type: ApplicationFiled: February 5, 2010Publication date: August 12, 2010Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventors: Pavel ADAMEC, Helmut BANZHOF, Ivo LISKA
-
Patent number: 7763866Abstract: The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b).Type: GrantFiled: October 19, 2004Date of Patent: July 27, 2010Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Jürgen Frosien, Stefan Lanio, Helmut Banzhof
-
Publication number: 20090146074Abstract: A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.Type: ApplicationFiled: November 25, 2008Publication date: June 11, 2009Applicant: ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbHInventors: Helmut BANZHOF, Juergen FROSIEN, Dieter WINKLER
-
Publication number: 20080308751Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.Type: ApplicationFiled: August 19, 2008Publication date: December 18, 2008Inventors: Benyamin Buller, William J. DeVore, Juergen Frosien, Xinrong Jiang, Richard L. Lozes, Henry Thomas Pearce-Percy, Dieter Winkler, Steven T. Coyle, Helmut Banzhof
-
Publication number: 20080258060Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.Type: ApplicationFiled: October 24, 2007Publication date: October 23, 2008Inventors: JUERGEN FROSIEN, Helmut Banzhof, Jacob Levin, Dror Shemesh
-
Patent number: 7427765Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle ? of from about ¼ to about 3 mrads, where the acceptance semi-angle ? is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.Type: GrantFiled: October 3, 2005Date of Patent: September 23, 2008Assignee: Jeol, Ltd.Inventors: Benyamin Buller, William J. DeVore, Juergen Frosien, Xinrong Jiang, Richard L. Lozes, Henry Thomas Pearce-Percy, Dieter Winkler, Steven T. Coyle, Helmut Banzhof
-
Publication number: 20080185514Abstract: An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.Type: ApplicationFiled: October 26, 2007Publication date: August 7, 2008Inventors: JUERGEN FROSIEN, Helmut Banzhof
-
Publication number: 20080073583Abstract: An ion beam apparatus is provided, the ion beam apparatus comprising a movable ion source, a condenser lens, an aperture, and a scanning unit disposed between the condenser lens and the aperture, said scanning unit being adapted to scan an ion beam across the aperture. Furthermore, a method for aligning components of an ion beam apparatus is provided, comprising the steps of: producing an ion beam by means of an ion source, producing a first image of a beam cross section of the ion beam at a first voltage of a condenser lens, producing a second image of the beam cross section of the ion beam at a second voltage of the condenser lens, and positioning the ion source so that the centers of the first and second images coincide.Type: ApplicationFiled: February 16, 2007Publication date: March 27, 2008Applicant: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventors: Thomas JASINSKI, Helmut BANZHOF, Jurgen FROSIEN
-
Publication number: 20070257207Abstract: The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b).Type: ApplicationFiled: October 19, 2004Publication date: November 8, 2007Inventors: Jurgen Frosien, Stefan Lanio, Helmut Banzhof
-
Patent number: 7282711Abstract: The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.Type: GrantFiled: October 4, 2002Date of Patent: October 16, 2007Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik MBHInventors: Dieter Winkler, Pavel Adamec, Achim Göhl, Helmut Banzhof