Abstract: A method for processing a substrate includes performing a first etch process to form a plurality of partial features in a dielectric layer disposed over the substrate; performing an irradiation process to irradiate the substrate with ultra-violet radiation having a wavelength between 100 nm and 200 nm; and after the irradiation process, performing a second etch process to form a plurality of features from the plurality of partial features.

Abstract: The present disclosure provides a loading apparatus and a physical vapor deposition (PVD) apparatus. The loading apparatus includes a pedestal configured to support a workpiece; and a first support member placed on the pedestal and configured to push up a cover ring when the pedestal is at an operation position to prevent an overlapping portion of a cover ring and the workpiece from contacting each other. In the loading apparatus and the PVD apparatus, the first support member supports the cover ring, such that the cover ring does not contact the workpiece, thereby reducing stress forces on the workpiece by external components.

Abstract: A method for processing a substrate includes performing a first etch process to form a plurality of partial features in a dielectric layer disposed over the substrate; performing an irradiation process to irradiate the substrate with ultra-violet radiation having a wavelength between 100 nm and 200 nm; and after the irradiation process, performing a second etch process to form a plurality of features from the plurality of partial features.

Abstract: A method for processing a substrate includes performing a first etch process to form a plurality of partial features in a dielectric layer disposed over the substrate; performing an irradiation process to irradiate the substrate with ultra-violet radiation having a wavelength between 100 nm and 200 nm; and after the irradiation process, performing a second etch process to form a plurality of features from the plurality of partial features.

Abstract: A meme generation method, an electronic device, and a storage medium are provided. The method includes: determining a plurality of second expression images corresponding to a target face image based on a plurality of first expression images contained in a first meme; generating a second meme corresponding to the target face image based on the plurality of second expression images corresponding to the target face image; wherein, determining an affine transformation parameter between the target face image and an i-th first expression image in the plurality of first expression images according to a corresponding relation between a face key point in the target face image and a face key point in the i-th first expression image; and transforming the target face image based on the affine transformation parameter to obtain an i-th second expression image corresponding to the target face image.

Abstract: The disclosure discloses a cartoonlization processing method for an image, and relates to a field of computational vision, image processing, face recognition, deep learning technologies. The method includes: performing skin color recognition on a facial image to be processed to determine a target skin color of a face in the facial image; processing the facial image by utilizing any cartoonizing model in a cartoonizing model set to obtain a reference cartoonized image corresponding to the facial image in a case that the cartoonizing model set does not contain a cartoonizing model corresponding to the target skin color; determining a pixel adjustment parameter based on the target skin color and a reference skin color corresponding to the any cartoonizing model; and adjusting a pixel value of each pixel point in the reference cartoonized image based on the pixel adjustment parameter, to obtain a target cartoonized image corresponding to the facial image.

Abstract: A method and apparatus for processing a video frame are provided. The method may include: converting, using an optical flow generated based on a previous frame and a next frame of adjacent frames in a video, a feature map of the previous frame to obtain a converted feature map; determining, based on an error of the optical flow, a weight of the converted feature map, and obtaining a fused feature map based on a weighted result of a feature of the converted feature map and a feature of a feature map of the next frame; and updating the feature map of the next frame as the fused feature map.

Abstract: The present disclosure discloses a method and apparatus for generating a human body three-dimensional model, a device and a storage medium. The method may include: receiving a single human body image, and extracting an SMPL human body three-dimensional model corresponding to the human body image and a PIFu human body three-dimensional model corresponding to the human body image; matching the SMPL human body three-dimensional model with the PIFu human body three-dimensional model to obtain a matching result; determining a vertex of the SMPL human body three-dimensional model closest to a vertex of the PIFu human body three-dimensional model based on the matching result to obtain a binding weight of the vertex of the PIFu human body three-dimensional model and each skeleton point of the SMPL human body three-dimensional model; and outputting a drivable human body three-dimensional model.

Abstract: The satellite image processing method includes: acquiring a first target satellite image; defogging the first target satellite image through a first neural network to acquire a first satellite image; and adjusting an image quality parameter of the first satellite image through a second neural network to acquire a second satellite image.

Abstract: A method and apparatus for generating a virtual avatar are provided. The method may include: acquiring a first avatar, and determining an expression parameter of the first avatar, where the expression parameter of the first avatar including an expression parameter of at least one of five sense organs; and determining, based on the expression parameter of at least one of the five sense organs, a target virtual avatar that is associated with an attribute of the first avatar and has an expression of the first avatar.

Abstract: Gas phase etching device and gas phase etching apparatus are provided. The gas phase etching device includes: a reaction chamber body, defining a space as a reaction chamber; a pedestal, disposed inside the reaction chamber for holding a workpiece; an inlet member, connected to the reaction chamber body for introducing etchants into the reaction chamber; a pressure regulating assembly, connected to the reaction chamber body for regulating a pressure inside the reaction chamber; a first temperature controller, connected to the reaction chamber body for controlling a temperature therein to a first temperature; and a second temperature controller, connected to the pedestal for controlling a temperature to a second temperature. The first temperature is a temperature that prevents the reaction chamber from being corroded by the etchants. The second temperature is a temperature under which the workpiece held by the pedestal satisfies a temperature requirement for directly performing a subsequent process.

Abstract: In certain embodiments, a method of forming a semiconductor device includes forming a patterned resist layer over a hard mask layer using an extreme ultraviolet (EUV) lithography process. The hard mask layer is disposed over a substrate. The method includes patterning the hard mask layer using the patterned resist layer as an etch mask. The method includes smoothing the hard mask layer by forming, using a first atomic layer etch step, a first layer by converting a first portion of the hard mask layer, and by removing, using a second atomic layer etch step, the first layer.

Abstract: In one embodiment, a method includes providing a substrate comprising a source/drain contact region and a dummy gate, forming a first etch stop layer aligned to the source/drain contact region, where the first etch stop layer does not cover the dummy gate. The method may include forming a second etch stop layer over the first etch stop layer, the second etch stop layer covering the first etch stop layer and the dummy gate. The method may include converting the dummy gate to a metal gate. The method may include removing the second etch stop layer using a plasma etching process. The method may include removing the first etch stop layer.

Abstract: Embodiments of the present disclosure provide a method and apparatus for generating an image. The method may include: receiving a first image including a face input by a user in an interactive scene; presenting the first image to the user; inputting the first image into a pre-trained generative adversarial network in a backend to obtain a second image output by the generative adversarial network; where the generative adversarial network uses face attribute information generated based on the input image as a constraint; and presenting the second image to the user in response to obtaining the second image output by the generative adversarial network in the backend.

Abstract: The present disclosure provides a deposition apparatus, including a first chamber, a second chamber and a third chamber. The first chamber is configured to load a substrate. The second chamber is configured to provide a high temperature environment in which a degas process and a sputtering process are performed on the substrate. The third chamber is provided between the first chamber and the second chamber. The third chamber is configured to transfer the substrate from the first chamber to the second chamber via the third chamber.

Abstract: A heating device and a heating chamber are provided, comprising a base plate (21), at least three supporting columns (22) and a heating assembly, where the at least three supporting columns are arranged vertically on the base plate and are distributed at intervals along a circumferential direction of the base plate Top ends of the at least three supporting columns form a bearing surface for supporting a to-be-heated member (23). The heating assembly includes a heating light tube (24) and a thermal radiation shielding assembly, where the heating light tube is disposed above the base plate and below the bearing surface. A projection of an effective heating area formed by uniform distribution of the heating light tube on the base plate covers a projection of the bearing surface on the base plate. The thermal radiation shielding assembly shields heat radiated by the heating light tube towards surroundings and bottom.

Abstract: A sputtering method includes one or more sputtering processes. Each sputtering process includes in a first pre-sputtering phase, sputtering a target material on a baffle plate configured to shield a substrate; in a second pre-sputtering phase, sputtering a target material compound on the baffle plate; and in a main sputtering phase, sputtering the target material compound on the substrate. The first pre-sputtering phase is used to adjust a sputtering voltage for the main sputtering phase.

Abstract: A super-resolution video reconstruction method, device, apparatus and a computer-readable storage medium are provided. The method includes: extracting a hypergraph from consecutive frames of an original video; inputting a hypergraph vector of the hypergraph into a residual convolutional neural network to obtain an output result of the residual convolutional neural network; and inputting the output result of the residual convolutional neural network into a spatial upsampling network to obtain a super-resolution frame, wherein a super-resolution video of the original video is formed by multiple super-resolution frames.

Abstract: A super-resolution video reconstruction method, device, apparatus and a computer-readable storage medium are provided. The method includes: extracting a hypergraph from consecutive frames of an original video; inputting a hypergraph vector of the hypergraph into a residual convolutional neural network to obtain an output result of the residual convolutional neural network; and inputting the output result of the residual convolutional neural network into a spatial upsampling network to obtain a super-resolution frame, wherein a super-resolution video of the original video is formed by multiple super-resolution frames.

Abstract: The present disclosure provides a loading apparatus and a physical vapor deposition (PVD) apparatus. The loading apparatus includes a pedestal configured to support a workpiece; and a first support member placed on the pedestal and configured to push up a cover ring when the pedestal is at an operation position to prevent an overlapping portion of a cover ring and the workpiece from contacting each other. In the loading apparatus and the PVD apparatus, the first support member supports the cover ring, such that the cover ring does not contact the workpiece, thereby reducing stress forces on the workpiece by external components.