Patents by Inventor Hendrikus Gijsbertus Schimmel
Hendrikus Gijsbertus Schimmel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230362529Abstract: A hearing device comprising a body provided with a dome, wherein a vent path is provided through the body, and wherein the body is further provided with a valve and a valve driver which connects to the valve for opening and closing of the vent path, wherein when the vent path is closed the valve engages the body, and wherein said valve driver comprises a permanent or switchable magnet and a first electrical coil for generating magnetic field lines that cooperate with the permanent or switchable magnet for moving the valve, wherein the valve driver is arranged to energize the first electrical coil with a current magnitude and/or direction that depends on a position of the valve between an open position wherein the vent path is open and a closed position wherein the vent path is closed.Type: ApplicationFiled: August 23, 2021Publication date: November 9, 2023Applicant: Sonion Nederland B.V.Inventors: Hendrikus Gijsbertus SCHIMMEL, Laurens DE RUIJTER
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Patent number: 11175596Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.Type: GrantFiled: July 18, 2018Date of Patent: November 16, 2021Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Han-Kwang Nienhuys, Ronald Peter Albright, Jacob Brinkert, Yang-Shan Huang, Hendrikus Gijsbertus Schimmel, Antonie Hendrik Verweij
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Publication number: 20200225591Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.Type: ApplicationFiled: July 18, 2018Publication date: July 16, 2020Applicants: ASML Netherlands B,V., ASML Holding N.V.Inventors: Han-Kwang NIENHUYS, Ronald Peter ALBRIGHT, Jacob BRINKERT, Yang-Shan HUANG, Hendrikus Gijsbertus SCHIMMEL, Antonie Hendrik VERWEIJ
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Patent number: 10394141Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: GrantFiled: July 27, 2017Date of Patent: August 27, 2019Assignee: ASML Netherlands B.V.Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
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Patent number: 10359710Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.Type: GrantFiled: October 25, 2016Date of Patent: July 23, 2019Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Jeroen Marcel Huijbregtse, Maarten Van Kampen, Pieter-Jan Van Zwol
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Patent number: 10222701Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.Type: GrantFiled: September 18, 2014Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Chuangxin Zhao, Sander Baltussen, Pär Mårten Lukas Broman, Richard Joseph Bruls, Cristian Bogdan Craus, Jan Groenewold, Dzmitry Labetski, Kerim Nadir, Hendrikus Gijsbertus Schimmel, Christian Felix Wählisch
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Publication number: 20180307146Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.Type: ApplicationFiled: October 25, 2016Publication date: October 25, 2018Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus SCHIMMEL, Jeroen Marcel HUIJBREGTSE, Maarten VAN KAMPEN, Pieter-Jan VAN ZWOL
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Patent number: 10095119Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.Type: GrantFiled: October 23, 2013Date of Patent: October 9, 2018Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Michel Riepen, Reinier Theodorus Martinus Jilisen, Dennis De Graaf
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Publication number: 20170322499Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: ApplicationFiled: July 27, 2017Publication date: November 9, 2017Applicant: ASML Netherlands B.V.Inventors: Michel RIEPEN, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
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Patent number: 9753383Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: GrantFiled: June 13, 2013Date of Patent: September 5, 2017Assignee: ASML Netherlands B.V.Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
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Patent number: 9671698Abstract: A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating the fuel stream generator.Type: GrantFiled: January 22, 2013Date of Patent: June 6, 2017Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Publication number: 20160274467Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.Type: ApplicationFiled: October 23, 2013Publication date: September 22, 2016Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus SCHIMMEL, Michel RIEPEN, Reinier Theodorus Martinus JULISEN, Dennis DE GRAAF
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Patent number: 9411238Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.Type: GrantFiled: January 10, 2013Date of Patent: August 9, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
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Patent number: 9363879Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.Type: GrantFiled: November 4, 2014Date of Patent: June 7, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van de Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Patent number: 9310689Abstract: Methods and apparatus are provided for promoting the coalescence of fuel droplets in a stream generated by a radiation source droplet stream generator for use in lithographic apparatus. Various examples are described in which a modulating voltage source is applied to the emitter so that the electrical characteristics of the droplets may be controlled. This results in acceleration and deceleration of droplets in the stream which causes them to merge and promotes coalescence.Type: GrantFiled: July 31, 2012Date of Patent: April 12, 2016Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Johan Frederik Dijksman, Dzmitry Labetski
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Publication number: 20150338753Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: ApplicationFiled: June 13, 2013Publication date: November 26, 2015Applicant: ASML Netherlands B.V.Inventors: Michel RIEPEN, Dzmitry LEBETSKI, Wilbert Jan MESTROM, Wim Ronald KAMPINGA, Jan Okke NIEUWENKAMP, Jacob BRINKERT, Henricus Jozef CASTELIJNS, Nicolaas TEN KATE, Hendrikus Gijsbertus SCHIMMEL, Hans JANSEN, Dennis Jozef Maria PAULUSSEN, Brian Vernon VIRGO, Reinier Theodorus Martinus JILISEN, Ramin BADIE, Albert Pieter RIJPMA, Johannes Christiaan Leonardus FRANKEN, Peter VAN PUTTEN, Gerrit VAN DER STRAATEN
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Patent number: 9113539Abstract: A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.Type: GrantFiled: August 29, 2012Date of Patent: August 18, 2015Assignee: ASML Netherlands B.VInventors: Hendrikus Gijsbertus Schimmel, Johan Frederik Dijksman, Dzmitry Labetski
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Publication number: 20150077729Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.Type: ApplicationFiled: November 4, 2014Publication date: March 19, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf VAN EMPEL, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Erik Roelof LOOPSTRA, Johannes Hubertus Josephina MOORS, Jan Bernard Plechelmus VAN SCHOOT, Yuri Johannes Gabriël VAN DE VIJVER, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
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Publication number: 20150029478Abstract: A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating the fuel stream generator.Type: ApplicationFiled: January 22, 2013Publication date: January 29, 2015Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Publication number: 20150002830Abstract: Methods and apparatus are provided for promoting the coalescence of fuel droplets in a stream generated by a radiation source droplet stream generator for use in lithographic apparatus. Various examples are described in which a modulating voltage source is applied to the emitter so that the electrical characteristics of the droplets may be controlled. This results in acceleration and deceleration of droplets in the stream which causes them to merge and promotes coalescence.Type: ApplicationFiled: July 31, 2012Publication date: January 1, 2015Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Johan Frederik Dijksman, Dzmitry Labetski