Patents by Inventor Heng-Kun Chen

Heng-Kun Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dummy patterns
    Patent number: 9857677
    Abstract: A semiconductor layout pattern includes a device layout pattern, a plurality of rectangular first dummy patterns having a first size, a plurality of rectangular second dummy patterns having second sizes, and a plurality of bar-like third dummy patterns having varied third sizes. The pattern densities are smartly equalized by positioning the second dummy patterns.
    Type: Grant
    Filed: January 12, 2016
    Date of Patent: January 2, 2018
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chen-Hua Tsai, Jian-Cheng Chen, Chin-Yueh Tsai, Yao-Jen Fan, Heng-Kun Chen, Hsiang Yang
  • DUMMY PATTERNS
    Publication number: 20160126182
    Abstract: A semiconductor layout pattern includes a device layout pattern, a plurality of rectangular first dummy patterns having a first size, a plurality of rectangular second dummy patterns having second sizes, and a plurality of bar-like third dummy patterns having varied third sizes. The pattern densities are smartly equalized by positioning the second dummy patterns.
    Type: Application
    Filed: January 12, 2016
    Publication date: May 5, 2016
    Inventors: Chen-Hua Tsai, Jian-Cheng Chen, Chin-Yueh Tsai, Yao-Jen Fan, Heng-Kun Chen, Hsiang Yang
  • Dummy patterns and method for generating dummy patterns
    Patent number: 9269649
    Abstract: A method for generating dummy patterns includes providing a layout region having a layout pattern with a first density, inserting a plurality of first dummy patterns with a second density corresponding to the first density in the layout pattern, dividing the layout region into a plurality of sub-regions with a third density, adjusting a size of the first dummy pattern according to a difference between the second density and the third density, and outputting the layout pattern and the first dummy patterns on a photomask.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: February 23, 2016
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chen-Hua Tsai, Jian-Cheng Chen, Chin-Yueh Tsai, Yao-Jen Fan, Heng-Kun Chen, Hsiang Yang
  • Dummy patterns and method for generating dummy patterns
    Patent number: 9245822
    Abstract: A semiconductor layout pattern includes a device layout pattern, a plurality of rectangular first dummy patterns having a first size, a plurality of rectangular second dummy patterns having varied second sizes, and a plurality of first via dummy patterns smaller than the second dummy patterns and arranged in a spatial range within the second dummy patterns.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: January 26, 2016
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chen-Hua Tsai, Jian-Cheng Chen, Chin-Yueh Tsai, Yao-Jen Fan, Heng-Kun Chen, Hsiang Yang
  • DUMMY PATTERNS AND METHOD FOR GENERATING DUMMY PATTERNS
    Publication number: 20140042636
    Abstract: A method for generating dummy patterns includes providing a layout region having a layout pattern with a first density, inserting a plurality of first dummy patterns with a second density corresponding to the first density in the layout pattern, dividing the layout region into a plurality of sub-regions with a third density, adjusting a size of the first dummy pattern according to a difference between the second density and the third density, and outputting the layout pattern and the first dummy patterns on a photomask.
    Type: Application
    Filed: October 28, 2013
    Publication date: February 13, 2014
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chen-Hua Tsai, Jian-Cheng Chen, Chin-Yueh Tsai, Yao-Jen Fan, Heng-Kun Chen, Hsiang Yang
  • DUMMY PATTERNS AND METHOD FOR GENERATING DUMMY PATTERNS
    Publication number: 20140042640
    Abstract: A semiconductor layout pattern includes a device layout pattern, a plurality of rectangular first dummy patterns having a first size, a plurality of rectangular second dummy patterns having varied second sizes, and a plurality of first via dummy patterns smaller than the second dummy patterns and arranged in a spatial range within the second dummy patterns.
    Type: Application
    Filed: October 28, 2013
    Publication date: February 13, 2014
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chen-Hua Tsai, Jian-Cheng Chen, Chin-Yueh Tsai, Yao-Jen Fan, Heng-Kun Chen, Hsiang Yang
  • Dummy patterns and method for generating dummy patterns
    Patent number: 8597860
    Abstract: A method for generating dummy patterns includes providing a layout region having a layout pattern with a first density, inserting a plurality of first dummy patterns with a second density corresponding to the first density in the layout pattern, dividing the layout region into a plurality of sub-regions with a third density, adjusting a size of the first dummy pattern according to a difference between the second density and the third density, and outputting the layout pattern and the first dummy patterns on a photomask.
    Type: Grant
    Filed: May 20, 2011
    Date of Patent: December 3, 2013
    Assignee: United Microelectronics Corp.
    Inventors: Chen-Hua Tsai, Jian-Cheng Chen, Chin-Yueh Tsai, Yao-Jen Fan, Heng-Kun Chen, Hsiang Yang
  • DUMMY PATTERNS AND METHOD FOR GENERATING DUMMY PATTERNS
    Publication number: 20120295187
    Abstract: A method for generating dummy patterns includes providing a layout region having a layout pattern with a first density, inserting a plurality of first dummy patterns with a second density corresponding to the first density in the layout pattern, dividing the layout region into a plurality of sub-regions with a third density, adjusting a size of the first dummy pattern according to a difference between the second density and the third density, and outputting the layout pattern and the first dummy patterns on a photomask.
    Type: Application
    Filed: May 20, 2011
    Publication date: November 22, 2012
    Inventors: Chen-Hua Tsai, Jian-Cheng Chen, Chin-Yueh Tsai, Yao-Jen Fan, Heng-Kun Chen, Hsiang Yang