Abstract: A fast-turn-on floating island device and a method for manufacturing thereof in the field of semiconductor technology. The device comprises a surface layer, a bottom layer and a drift layer which is located between the surface layer and the bottom layer, wherein, the drift layer comprises a plurality of epitaxial layers and a plurality of floating island layers, one of the floating island layers formed between adjacent two of the epitaxial layers, or one of the epitaxial layers between adjacent two of the floating island layers, a first doped region and a second doped region form in at least one of the floating island layers.

Abstract: The present invention discloses a method of surface texturing at nano/micro-scale by aluminum-induced rapid crystallization of amorphous silicon for controlling the wettability of a surface, enhancing cell attachment to a surface, and promoting cell growth on a surface. The present invention can be used in a variety of applications, such as producing superhydrophobic or superhydrophilic surfaces for medical devices, microelectromechanical systems, and microfluidic channels.