Patents by Inventor Henri Vink

Henri Vink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Using an Interferometer as a High Speed Variable Attenuator
    Publication number: 20080106717
    Abstract: A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.
    Type: Application
    Filed: October 3, 2007
    Publication date: May 8, 2008
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Oscar NOORDMAN, Justin Kreuzer, Henri Vink, Teunis Van Den Dool, Daniel Calero
  • Illumination system
    Publication number: 20070247606
    Abstract: A system and method are used to substantially homogenize and remove at least some coherence from a beam of radiation.
    Type: Application
    Filed: November 30, 2006
    Publication date: October 25, 2007
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Huibert Visser, Jacob Klinkhamer, Lev Ryzhikov, Scott Coston, Adel Joobeur, Henri Vink, Yevgeniy Shmarev
  • Moving beam with respect to diffractive optics in order to reduce interference patterns
    Publication number: 20070242253
    Abstract: A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element directs the partially coherent beam to reflect from an angular distribution changing element to form an incoherent beam. The partially coherent beam can be directed at valying angles or positions onto the angular distribution changing element through rotation of the rotating optical element. The angles can vary as a function of time.
    Type: Application
    Filed: April 13, 2006
    Publication date: October 18, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Huibert Visser, Johannes Baselmans, Pieter De Jager, Henri Vink
  • Methods and systems for lithographic beam generation
    Publication number: 20060139609
    Abstract: A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.
    Type: Application
    Filed: December 29, 2004
    Publication date: June 29, 2006
    Applicant: ASML Netherlands BV
    Inventors: Johannes Baselmans, Anastasius Bruinsma, Pieter De Jager, Robert-Han Munnig Schmidt, Henri Vink
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060055905
    Abstract: Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.
    Type: Application
    Filed: September 14, 2004
    Publication date: March 16, 2006
    Inventors: Johannes Baselmans, Anastasius Bruinsma, Pieter De Jager, Henri Vink