Patents by Inventor Henricus J. J. Kroon

Henricus J. J. Kroon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a semiconductor device, in which a photolacquer mask is formed by means of a two-layer lacquer system.
    Patent number: 4704347
    Abstract: A method of manufacturing a semiconductor device, in which there is applied to a surface of a semiconductor substrate a base layer of photosensitive lacquer, which is coated with a top layer of photosensitive lacquer. By means of a first patterned irradiation, there is formed in the top layer a mask of which a contact copy is formed in the base layer during a second irradiation. A material which can be discolored is used for the top layer. During the first irradiation, the top layer is locally discolored, whereupon the layer thus discolored is used as a mask during the second irradiation. By the use of the discoloring top layer, additional processing steps, which would ensure from a wet development of the top layer, are avoided.
    Type: Grant
    Filed: January 29, 1986
    Date of Patent: November 3, 1987
    Assignee: U.S. Philips Corporation
    Inventors: Franciscus A. Vollenbroek, Jan G. Dil, Henricus J. J. Kroon, Elisabeth J. Spiertz, Wilhelmus P. M. Nijssen