Patents by Inventor Henricus Petrus Maria Pellemans

Henricus Petrus Maria Pellemans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby
    Publication number: 20040179184
    Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.
    Type: Application
    Filed: December 16, 2003
    Publication date: September 16, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Leon Martin Levasier, Arie Jeffrey Den Boef, Ingo Dirnstorfer, Andre Bernardus Jeunink, Stefan Geerte Kruijswijk, Henricus Petrus Maria Pellemans, Irwan Dani Setija, Hoite Pieter Theodoor Tolsma