Abstract: A sensor for an immersion system is disclosed. The sensor comprises: a sensing device, a transparent layer and an opaque patterning layer. The sensing device is configured to sense a property of a beam of radiation. The transparent layer is configured to allow the passage of a beam of radiation therethrough. The transparent layer covers the sensing device. The opaque patterning layer is configured to impart a pattern to the beam of radiation. In the patterning layer is an opening in which is located an infilling material. The infilling material is transparent to the beam of radiation and has a similar refractive index to that of the transparent layer.

Abstract: A lithographic substrate provided with an alignment mark, the alignment mark having a plurality of features spaced apart from one another, each feature being spaced apart from adjacent features by a different distance is disclosed. Further, there is disclosed a method of aligning a lithographic substrate provided with an alignment mark which has a plurality of features spaced apart from one another, each feature being spaced apart from adjacent features by a different distance, the method including measuring a distance between two of the features on the substrate, comparing the distance with a recorded set of distances, and determining from the comparison the position of the substrate.

Abstract: According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.

Abstract: According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.

Abstract: A method of calibrating a front to backside alignment capable lithographic apparatus. The method includes attaching a substrate having a plurality of alignment marks to a carrier, the substrate being arranged such that the alignment marks face towards the carrier; reducing the thickness of the substrate; using an alignment system of the apparatus to measure the positions of images of alignment marks formed by optics in a substrate table of the apparatus; projecting a pattern onto the substrate, the position of the pattern being determined according to the measured positions of the alignment marks; measuring the positions of the projected pattern and the alignment marks provided on the opposite side of the substrate, the position of the alignment marks provided on the opposite side of the substrate being measured by the alignment system directing radiation through the substrate; and comparing the measured positions in order to determine an overlay error.

Abstract: A substrate bonding system has a first and a second substrate table for holding a first substrate and a second substrate, respectively, and a controller. The first substrate includes a first device having first contact pads and the second substrate a second device having second contact pads. The wafer bonding system is arranged to bond the first and second device in such a way that a circuit may be formed by the first and second device. The first and second substrate tables each include a position sensor arranged to measure an optical signal generated on an alignment marker of the first and second substrate, respectively. The first and second substrate tables include a first and second actuator respectively that is arranged to alter a position and orientation of the respective substrate table.

Abstract: A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives from different angles and has a higher effective numerical aperture (NA).

Abstract: A substrate carrier arranged to hold a substrate in position is disclosed. The substrate carrier has a transparent region that extends through the substrate carrier from a side of the substrate carrier on which the substrate is to be held to an opposite side of the substrate carrier, the transparent region being substantially transparent to a signal used to determine the position of an edge of the substrate on the substrate carrier.

Abstract: The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance. The two features are selected from a plurality of features that may be placed on a back side or a front side of a substrate. An optical system is provided for reading the features from the back side or a front side of the substrate.

Abstract: A substrate table is provided with an optical system that includes a first window and a second window arranged to allow radiation to pass into an optical arm. At least two mirrors are provided within the optical arm and are arranged to reflect radiation that is passed through the windows. At least two lenses are positioned to receive radiation reflected from the mirrors, wherein the first window is provided with a first alignment mark and the at least two mirrors and at least two lenses are arranged to form an image of the first alignment mark at the second window. A second alignment mark is provided in the second window, or in the substrate table at a location adjacent to the second window.

Abstract: In a method of measuring front to backside alignment error according to one embodiment, a transparent substrate has a plurality of marks on both the front and backside. The relative location of the marks on the front and backside of the substrate is determined to calculate the front to backside alignment error for the whole substrate. In a further embodiment, the substrate is rotated by 180° within the plane of the substrate and the front relative location of the marks is again determined.

Abstract: A lithographic apparatus includes an illumination system constructed and arrange to condition a beam of radiation, a patterning device constructed and arranged to pattern the beam of radiation, a projection system constructed and arranged to project the patterned beam of radiation onto a target portion of a substrate, a substrate table constructed and arranged to hold the substrate, and a shutter system constructed and arranged to selectively prevent at least part of the beam of radiation from passing through the projection system. The shutter system includes a first shutter element, and a rotatable second shutter element constructed and arranged to alternately allow and prevent passage of the radiation beam when rotated. The first shutter element and the rotatable second shutter element are not of identical structure.

Abstract: A cover to shield a portion of an arc lamp from electromagnetic radiation is disclosed. The cover has a reflective surface formed from a reflective material suitable to reflect the electromagnetic radiation.

Abstract: A method of pre-aligning a substrate in a lithographic apparatus is described. The substrate has at least one alignment mark provided on a side of the substrate. The method includes determining a relationship between a position of the at least one alignment mark, at least part of an edge of the substrate, and a center of the substrate. A substrate support is provided to support a substrate, the substrate support having at least one optical view window at a predetermined location to view a part of the side of the substrate. The substrate is placed on the substrate support on the basis of the relationship to position the at least one alignment mark in the at least one optical view window.

Abstract: A method of pre-aligning a substrate in a lithographic apparatus is described. The substrate has at least one alignment mark provided on a side of the substrate. The method includes determining a relationship between a position of the at least one alignment mark, at least part of an edge of the substrate, and a center of the substrate. A substrate support is provided to support a substrate, the substrate support having at least one optical view window at a predetermined location to view a part of the side of the substrate. The substrate is placed on the substrate support on the basis of the relationship to position the at least one alignment mark in the at least one optical view window.

Abstract: In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array may then be used to accurately calculate the position of further substrates.

Abstract: The invention relates to a substrate table arranged to support a substrate provided with at least one substrate mark. The at least one substrate mark having a position that can be measured using an alignment system. The substrate table is provided with an optical system having a magnification factor deviating from 1, for providing an image of the at least one alignment mark to be measured by the alignment system.

Abstract: A calibration method comprising generating a pattern with an array of individually controllable elements, providing a substrate table with a radiation sensor, using radiation to generate an image of the pattern at the substrate table, moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the sensor, detecting radiation intensity with the sensor, and calculating a calibration establishing a relationship between coordinates of the coordinate system of the array of individually controllable elements and coordinates of the coordinate system of the substrate table, based on the detected intensity and the positions of the array of individually controllable elements and the substrate table.

Abstract: An optical element is placed in the alignment beam during alignment. The optical element serves to focus the alignment beam onto the substrate alignment mark when it is at a different focal length from the front surface of the substrate.

Abstract: A method of pre-aligning a substrate in a lithographic apparatus is described. The substrate has at least one alignment mark provided on a side of the substrate. The method includes determining a relationship between a position of the at least one alignment mark, at least part of an edge of the substrate, and a center of the substrate. A substrate support is provided to support a substrate, the substrate support having at least one optical view window at a predetermined location to view a part of the side of the substrate. The substrate is placed on the substrate support on the basis of the relationship to position the at least one alignment mark in the at least one optical view window.