Patents by Inventor Henrik B. Pedersen

Henrik B. Pedersen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion trapping
    Patent number: 6744042
    Abstract: A method for trapping of a plurality of charged particles in a charged particle trap. The trap includes first and second electrode mirrors having a common optical axis, the mirrors being arranged in alignment at two extremities thereof. The mirrors are capable, when voltage is applied thereto, of creating respective electric fields defined by key field parameters. The electric fields are configured to reflect charged particles causing their oscillation between the mirrors. The method includes introducing into the trap, along the optical axis, the plurality of charged particles as a beam having pre-determined key beam parameters. The method further includes choosing the key field parameters for at least one of the mirrors such as to induce bunching among charged particles in the beam.
    Type: Grant
    Filed: June 18, 2001
    Date of Patent: June 1, 2004
    Assignee: Yeda Research and Development Co., Ltd.
    Inventors: Daniel Zajfman, Oded Heber, Henrik B. Pedersen, Yinon Rudich, Irit Sagi, Michael Rappaport
  • Ion trapping
    Publication number: 20020190200
    Abstract: A method for trapping of a plurality of charged particles in a charged particle trap. The trap includes first and second electrode mirrors having a common optical axis, the mirrors being arranged in alignment at two extremities thereof. The mirrors are capable, when voltage is applied thereto, of creating respective electric fields defined by key field parameters. The electric fields are configured to reflect charged particles causing their oscillation between the mirrors. The method includes introducing into the trap, along the optical axis, the plurality of charged particles as a beam having pre-determined key beam parameters. The method further includes choosing the key field parameters for at least one of the mirrors such as to induce bunching among charged particles in the beam.
    Type: Application
    Filed: June 18, 2001
    Publication date: December 19, 2002
    Applicant: YEDA RESEARCH AND DEVELOPMENT CO., LTD.
    Inventors: Daniel Zajfman, Oded Heber, Henrik B. Pedersen, Yinon Rudich, Irit Sagi, Michael Rappaport