Patents by Inventor Henry Yee-Shian TONG

Henry Yee-Shian TONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SHOCK WAVE VISUALIZATION FOR EXTREME ULTRAVIOLET PLASMA OPTIMIZATION
    Publication number: 20230380044
    Abstract: A method for monitoring a shock wave in an extreme ultraviolet light source includes irradiating a target droplet in the extreme ultraviolet light source apparatus of an extreme ultraviolet lithography tool with ionizing radiation to generate a plasma and to detect a shock wave generated by the plasma. One or more operating parameters of the extreme ultraviolet light source is adjusted based on the detected shock wave.
    Type: Application
    Filed: July 31, 2023
    Publication date: November 23, 2023
    Inventors: Yen-Shuo SU, Jen-Hao YEH, Jhan-Hong YEH, Ting-Ya CHENG, Henry Yee Shian TONG, Chun-Lin CHANG, Han-Lung CHANG, Li-Jui CHEN, Po-Chung CHENG
  • Shock wave visualization for extreme ultraviolet plasma optimization
    Patent number: 11800626
    Abstract: A method for monitoring a shock wave in an extreme ultraviolet light source includes irradiating a target droplet in the extreme ultraviolet light source apparatus of an extreme ultraviolet lithography tool with ionizing radiation to generate a plasma and to detect a shock wave generated by the plasma. One or more operating parameters of the extreme ultraviolet light source is adjusted based on the detected shock wave.
    Type: Grant
    Filed: July 26, 2022
    Date of Patent: October 24, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yen-Shuo Su, Jen-Hao Yeh, Jhan-Hong Yeh, Ting-Ya Cheng, Henry Yee Shian Tong, Chun-Lin Chang, Han-Lung Chang, Li-Jui Chen, Po-Chung Cheng
  • EUV light source and apparatus for lithography
    Patent number: 11226564
    Abstract: In a method of diagnosing an RF generator of a laser produced plasma extreme ultra violet (LPP EUV) radiation source apparatus, a testing system is connected to the RF generator of the LPP EUV radiation source apparatus. An output power is measured by the testing system with changing an input power of the RF generator. Using a computer system, the measured output power is analyzed. Based on the analyzed measured output power, whether the RF generator is operating properly is determined.
    Type: Grant
    Filed: May 7, 2019
    Date of Patent: January 18, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jhan-Hong Yeh, Cheng-Chieh Chen, Jeng-Yann Tsay, Li-Jui Chen, Henry Yee Shian Tong, Wen-Chih Wang, Hsin-Liang Chen
  • Laser source device, extreme ultraviolet lithography device and method
    Patent number: 11158989
    Abstract: A device includes a laser source, an amplifier, an optical sensor and a spectrometer. The laser source is configured to produce a seed laser beam. The amplifier includes gain medium and a discharging unit. The discharging unit is configured to pump the gain medium for amplifying power of the seed laser beam. The optical sensor is coupled to the amplifier and configured for sensing an optical emission generated in the amplifier while the gain medium is discharging. The spectrometer is coupled with the optical sensor and configured to measure a spectrum of the optical emission.
    Type: Grant
    Filed: April 10, 2020
    Date of Patent: October 26, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Henry Yee-Shian Tong, Wen-Chih Wang, Hsin-Liang Chen, Louis Chun-Lin Chang, Cheng-Chieh Chen, Li-Jui Chen, Po-Chung Cheng, Jeng-Yann Tsay
  • LASER SOURCE DEVICE, EXTREME ULTRAVIOLET LITHOGRAPHY DEVICE AND METHOD
    Publication number: 20200245443
    Abstract: A device includes a laser source, an amplifier, an optical sensor and a spectrometer. The laser source is configured to produce a seed laser beam. The amplifier includes gain medium and a discharging unit. The discharging unit is configured to pump the gain medium for amplifying power of the seed laser beam. The optical sensor is coupled to the amplifier and configured for sensing an optical emission generated in the amplifier while the gain medium is discharging. The spectrometer is coupled with the optical sensor and configured to measure a spectrum of the optical emission.
    Type: Application
    Filed: April 10, 2020
    Publication date: July 30, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Henry Yee-Shian TONG, Wen-Chih WANG, Hsin-Liang CHEN, Louis Chun-Lin CHANG, Cheng-Chieh CHEN, Li-Jui CHEN, Po-Chung CHENG, Jeng-Yann TSAY
  • Laser source device and extreme ultraviolet lithography device
    Patent number: 10624196
    Abstract: A device includes a laser source, an amplifier, an optical sensor and a spectrometer. The laser source is configured to produce a seed laser beam. The amplifier includes gain medium and a discharging unit. The discharging unit is configured to pump the gain medium for amplifying power of the seed laser beam. The optical sensor is coupled to the amplifier and configured for sensing an optical emission generated in the amplifier while the gain medium is discharging. The spectrometer is coupled with the optical sensor and configured to measure a spectrum of the optical emission.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: April 14, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Henry Yee-Shian Tong, Wen-Chih Wang, Hsin-Liang Chen, Louis Chun-Lin Chang, Cheng-Chieh Chen, Li-Jui Chen, Po-Chung Cheng, Jeng-Yann Tsay
  • LASER SOURCE DEVICE AND EXTREME ULTRAVIOLET LITHOGRAPHY DEVICE
    Publication number: 20200107428
    Abstract: A device includes a laser source, an amplifier, an optical sensor and a spectrometer. The laser source is configured to produce a seed laser beam. The amplifier includes gain medium and a discharging unit. The discharging unit is configured to pump the gain medium for amplifying power of the seed laser beam. The optical sensor is coupled to the amplifier and configured for sensing an optical emission generated in the amplifier while the gain medium is discharging. The spectrometer is coupled with the optical sensor and configured to measure a spectrum of the optical emission.
    Type: Application
    Filed: January 8, 2019
    Publication date: April 2, 2020
    Inventors: Henry Yee-Shian TONG, Wen-Chih WANG, Hsin-Liang CHEN, Louis Chun-Lin CHANG, Cheng-Chieh CHEN, Li-Jui CHEN, Po-Chung CHENG, Jeng-Yann TSAY