Patents by Inventor Herbert Schmidt

Herbert Schmidt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7708830
    Abstract: A method for the production of a silicon single crystal by pulling the single crystal, according to the Czochralski method, from a melt which is held in a rotating crucible, the single crystal growing at a growth front, heat being deliberately supplied to the center of the growth front by a heat flux directed at the growth front. The method produces a silicon single crystal with an oxygen content of from 4*1017 cm?3 to 7.2*1017 cm?3 and a radial concentration change for boron or phosphorus of less than 5%, which has no agglomerated self-point defects. Semiconductor wafers are separated from the single crystal. These semiconductor wafers have may have agglomerated vacancy defects (COPs) as the only self-point defect type or may have certain other defect distributions.
    Type: Grant
    Filed: August 31, 2006
    Date of Patent: May 4, 2010
    Assignee: Siltronic AG
    Inventors: Wilfried Von Ammon, Janis Virbulis, Martin Weber, Thomas Wetzel, Herbert Schmidt
  • Publication number: 20100060066
    Abstract: The invention relates to a vehicular seat system including a seat bottom and a seat back. The headrest is connected to the seat back. The headrest consists of a number of components. These components include: a non-foam frame element, a non-foam insert secured with respect to a portion of the frame element, and a resilient element in which at least a portion of the frame element and the entire insert are embedded. The resilient element consists essentially of a homogeneous foam material. The frame element comprises a pair of post elements for coupling to the vehicular seat back. The post elements are interconnected by a cross-piece element. The headrest is connected to the seat back such that the minimum distance between the outer surface of the headrest for contacting a head of an occupant and the insert is in the range of from about 10 mm to about 30 mm.
    Type: Application
    Filed: July 31, 2009
    Publication date: March 11, 2010
    Applicant: PROPRIETECT LP
    Inventors: Henry E. HOJNACKI, George NG, Herbert SCHMIDT
  • Patent number: 7617562
    Abstract: The invention concerns an apparatus for the contactless cleaning of a conveying element which is designed to receive rod-shaped articles in the tobacco-processing industry, including at least one ionising element for removing electrostatic charges on the surfaces of the conveying element to be cleaned, at least one rotating compressed-air nozzle for loosening and removing contaminants located on surfaces of the conveying element, and a suction device for extracting the contaminated outgoing air, characterized in that associated with the apparatus is a housing for forming a cleaning chamber at least partially shielded from the environment, whereby the cleaning chamber has an inlet opening and an outlet opening for the conveying element to be cleaned, such that upper side and lower side of the conveying element are surrounded. Furthermore, the invention concerns an arrangement for transporting and/or storing rod-shaped articles with an apparatus for contactless cleaning with the above-mentioned characteristics.
    Type: Grant
    Filed: November 23, 2005
    Date of Patent: November 17, 2009
    Assignee: Hauni Maschinenbau AG
    Inventors: Hans-Herbert Schmidt, Knut Tracht
  • Publication number: 20090159099
    Abstract: A dishwasher, in particular a domestic dishwasher, having a dishwashing compartment and apparatuses for washing tableware using washing liquor, wherein it is possible to set the pressure in the apparatuses for washing tableware. A feed apparatus for an additive is provided, and the pressure in the apparatuses for washing tableware can be set as a function of the metering of the additive in the feed apparatus.
    Type: Application
    Filed: October 5, 2006
    Publication date: June 25, 2009
    Applicant: BSH Bosch und Siemens Hausgeraete GmbH
    Inventors: Michael Fauth, Georg Hechtl, Michael Rosenbauer, Herbert Schmidt
  • Patent number: 7505586
    Abstract: For encrypting a string of data elements from a first value range, a respective data element is combined with a key element by a first computing operation. The resulting combination result may lie outside the first value range. From the combination result, an encrypted data element is then derived by a second computing operation that maps onto a second value range, for example printable 1-byte characters. Decryption is accomplished by combining the encrypted data element with the key element using an inverse computing operation to the second computing operation executed iteratively until a result of an iteration step lies within the first value range.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: March 17, 2009
    Assignee: Siemens Aktiengesellschaft
    Inventor: Herbert Schmidt
  • Patent number: 7470323
    Abstract: The Czochralski method is used for producing p?-doped and epitaxially coated semiconductor wafers from silicon, wherein a silicon single crystal is pulled, and during the pulling is doped with boron, hydrogen and nitrogen, and the single crystal thus obtained is processed to form p?-doped semiconductor wafers which are epitaxially coated.
    Type: Grant
    Filed: October 11, 2007
    Date of Patent: December 30, 2008
    Assignee: Siltronic AG
    Inventors: Wilfried von Ammon, Katsuhiko Nakai, Martin Weber, Herbert Schmidt, Atsushi Ikari
  • Patent number: 7456944
    Abstract: An apparatus for detection of optical systems in a terrain area, has at least: a laser arrangement with a laser light source, a moving mirror for scanning the terrain area and a photoelement for detection of retroreflected laser radiation from the laser light source, a scan position sensor for detection of a scanning direction, and a controller for determination of the position of an optical system to be detected, from a measurement which is carried out by means of the laser arrangement by evaluation of the intensity of retroreflected laser radiation from an optical surface of the optical system, and evaluation of the associated scanning direction detected by the scan position sensor, with the controller having an electronic interface via which information relating at least to the intensity and the elevation of the detected retroreflected laser radiation can be transmitted to at least one display apparatus.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: November 25, 2008
    Assignee: Carl Zeiss Optronics GmbH
    Inventors: Hubertus Haan, Gunther Kuerbitz, Herbert Schmidt
  • Publication number: 20080187736
    Abstract: Semiconductor wafers of silicon are produced by pulling a single crystal growing on a phase boundary from a melt contained in a crucible and cutting of semiconductor wafers therefrom, wherein during pulling of the single crystal, heat is delivered to a center of the phase boundary and a radial profile of a ratio V/G from the center to an edge of the phase boundary is controlled, G being the temperature gradient perpendicular to the phase boundary and V being the pull rate. The radial profile of the ratio V/G is controlled so that the effect of thermomechanical stress in the single crystal adjoining the phase boundary, is compensated with respect to creation of intrinsic point defects. The invention also relates to defect-free semiconductor wafers of silicon, which can be produced economically by this method.
    Type: Application
    Filed: January 29, 2008
    Publication date: August 7, 2008
    Applicant: Siltronic AG
    Inventors: Andreas Sattler, Wilfried von Ammon, Martin Weber, Walter Haeckl, Herbert Schmidt
  • Publication number: 20080153261
    Abstract: Semiconductor wafers of silicon are produced by pulling a single crystal from a melt contained in a crucible and slicing semiconductor wafers from the pulled single crystal, heat being delivered to a center of the growing single crystal at the boundary with the melt during the pulling of the single crystal, a CUSP magnetic field applied such that a neutral surface of the CUSP magnetic field intersects a pulling axis of the single crystal at a distance of at least 50 mm from a surface of the melt. An apparatus suitable therefore contains a CUSP field positioned such that a neutral field intersects the axis of the crystal in the crucible 50 mm or more from the melt surface.
    Type: Application
    Filed: December 19, 2007
    Publication date: June 26, 2008
    Applicant: Siltronic AG
    Inventors: Martin Weber, Herbert Schmidt, Wilfried von Ammon
  • Publication number: 20080113171
    Abstract: Silicon wafers having a density of BMDs with sizes between 20 to 40 nm at positions ?20 ?m below the wafer surface in the range of 5×1011/cm3, and a density of BMDs with sizes of ?300 nm?1×107/cm3, exhibit reduced slip dislocation and warpage. The wafers are sliced from a crystal grown under specific conditions and then subjected to both low temperature heat-treatment and high temperature anneal.
    Type: Application
    Filed: September 19, 2007
    Publication date: May 15, 2008
    Applicant: SILTRONIC AG
    Inventors: Katsuhiko Nakai, Wilfried von Ammon, Sei Fukushima, Herbert Schmidt, Martin Weber
  • Publication number: 20080096371
    Abstract: The Czochralski method is used for producing p?-doped and epitaxially coated semiconductor wafers from silicon, wherein a silicon single crystal is pulled, and during the pulling is doped with boron, hydrogen and nitrogen, and the single crystal thus obtained is processed to form p?-doped semiconductor wafers which are epitaxially coated.
    Type: Application
    Filed: October 11, 2007
    Publication date: April 24, 2008
    Applicant: SILTRONIC AG
    Inventors: Wilfried von Ammon, Katsuhiko Nakai, Martin Weber, Herbert Schmidt, Atsushi Ikari
  • Patent number: 7335256
    Abstract: A silicon single crystal which, over an ingot length of over 10 percent of the total ingot length, has a uniform defect picture and narrow radial dopant and oxygen variations. The process in accordance with the Czochralski method involves bringing about a temperature distribution in the melt in the region of the solidification interface which deviates from rotational symmetry.
    Type: Grant
    Filed: July 17, 2006
    Date of Patent: February 26, 2008
    Assignee: Siltronic AG
    Inventors: Martin Weber, Wilfried von Ammon, Herbert Schmidt, Janis Virbulis, Yuri Gelfgat, Leonid Gorbunov
  • Publication number: 20070222970
    Abstract: Abstract An apparatus for detection of optical systems in a terrain area, has at least: a laser arrangement with a laser light source, a moving mirror for scanning the terrain area and a photoelement for detection of retroreflected laser radiation from the laser light source, a scan position sensor for detection of a scanning direction, and a controller for determination of the position of an optical system to be detected, from a measurement which is carried out by means of the laser arrangement by evaluation of the intensity of retroreflected laser radiation from an optical surface of the optical system, and evaluation of the associated scanning direction detected by the scan position sensor, with the controller having an electronic interface via which information relating at least to the intensity and the elevation of the detected retroreflected laser radiation can be transmitted to at least one display apparatus.
    Type: Application
    Filed: March 23, 2007
    Publication date: September 27, 2007
    Inventors: Hubertus Haan, Gunther Kuerbitz, Herbert Schmidt
  • Publication number: 20060292890
    Abstract: A method for the production of a silicon single crystal by pulling the single crystal, according to the Czochralski method, from a melt which is held in a rotating crucible, the single crystal growing at a growth front, heat being deliberately supplied to the center of the growth front by a heat flux directed at the growth front. The method produces a silicon single crystal with an oxygen content of from 4*1017 cm?3 to 7.2*1017 cm?3 and a radial concentration change for boron or phosphorus of less than 5%, which has no agglomerated self-point defects. Semiconductor wafers are separated from the single crystal. These semiconductor wafers have may have agglomerated vacancy defects (COPs) as the only self-point defect type or may have certain other defect distributions.
    Type: Application
    Filed: August 31, 2006
    Publication date: December 28, 2006
    Applicant: Siltronic AG
    Inventors: Wilfried Ammon, Janis Virbulis, Martin Weber, Thomas Wetzel, Herbert Schmidt
  • Publication number: 20060254498
    Abstract: A silicon single crystal which, over an ingot length of over 10 percent of the total ingot length, has a uniform defect picture and narrow radial dopant and oxygen variations. The process in accordance with the Czochralski method involves bringing about a temperature distribution in the melt in the region of the solidification interface which deviates from rotational symmetry.
    Type: Application
    Filed: July 17, 2006
    Publication date: November 16, 2006
    Applicant: Siltronic AG
    Inventors: Martin Weber, Wilfried von Ammon, Herbert Schmidt, Janis Virbulis, Yuri Gelfgat, Leonid Gorbunov
  • Publication number: 20060107968
    Abstract: The invention concerns an apparatus for the contactless cleaning of a conveying element which is designed to receive rod-shaped articles in the tobacco-processing industry, including at least one ionising element for removing electrostatic charges on the surfaces of the conveying element to be cleaned, at least one rotating compressed-air nozzle for loosening and removing contaminants located on surfaces of the conveying element, and a suction device for extracting the contaminated outgoing air, characterized in that associated with the apparatus is a housing for forming a cleaning chamber at least partially shielded from the environment, whereby the cleaning chamber has an inlet opening and an outlet opening for the conveying element to be cleaned, such that upper side and lower side of the conveying element are surrounded. Furthermore, the invention concerns an arrangement for transporting and/or storing rod-shaped articles with an apparatus for contactless cleaning with the above-mentioned characteristics.
    Type: Application
    Filed: November 23, 2005
    Publication date: May 25, 2006
    Applicant: HAUNI MASCHINENBAU AG
    Inventors: Hans-Herbert Schmidt, Knut Tracht
  • Patent number: 7004896
    Abstract: A method and arrangement are provided for producing compound filters for products in the tobacco-processing industry. A filter tube, having a filter element in a central region of the filter tube, is supplied to a predetermined position. Predetermined portions of filtering material are then inserted into the filter tube from at least a first end of the filter tube so that filter segments form in at least a first part of the filter tube.
    Type: Grant
    Filed: January 29, 2002
    Date of Patent: February 28, 2006
    Assignee: Hauni Maschinenbau GmbH
    Inventors: Uwe Heitmann, Sönke Horn, Nikolaos Georgitsis, Heinz-Christen Lorenzen, Steffen Rocktäschel, Stephan Wolff, Wolfgang Steiniger, Gerd Strohecker, Andreas Rinke, Hans-Herbert Schmidt
  • Publication number: 20040192015
    Abstract: A method for the production of a silicon single crystal by pulling the single crystal, according to the Czochralski method, from a melt which is held in a rotating crucible, the single crystal growing at a growth front, heat being deliberately supplied to the center of the growth front by a heat flux directed at the growth front. The method produces a silicon single crystal with an oxygen content of from 4*1017 cm−3 to 7.2*1017 cm−3 and a radial concentration change for boron or phosphorus of less than 5%, which has no agglomerated self-point defects. Semiconductor wafers are separated from the single crystal. These semiconductor wafers have may have agglomerated vacancy defects (COPs) as the only self-point defect type or may have certain other defect distributions.
    Type: Application
    Filed: March 25, 2004
    Publication date: September 30, 2004
    Applicant: Siltronic AG
    Inventors: Wilfried Von Ammon, Janis Virbulis, Martin Weber, Thomas Wetzel, Herbert Schmidt
  • Publication number: 20040118334
    Abstract: A silicon single crystal which, over an ingot length of over 10 percent of the total ingot length, has a uniform defect picture and narrow radial dopant and oxygen variations. The process in accordance with the Czochralski method involves bringing about a temperature distribution in the melt in the region of the solidification interface which deviates from rotational symmetry.
    Type: Application
    Filed: December 10, 2003
    Publication date: June 24, 2004
    Applicant: Wacker Siltronic AG
    Inventors: Martin Weber, Wilfried von Ammon, Herbert Schmidt, Janis Virbulis, Yuri Gelfgat, Leonid Gorbunov
  • Publication number: 20040055410
    Abstract: A system for damping vibrations coming from a motor, such as a pump motor in a dishwasher. The motor includes a housing and freely oscillating means affixed to the housing for damping the characteristic vibrations of the motor. The oscillating means include at least one mass component affixed to the housing by at least one elastic linkage component.
    Type: Application
    Filed: June 12, 2003
    Publication date: March 25, 2004
    Applicant: BSH Bosch und Siemens Hausgerate GmbH
    Inventors: Michael Rosenbauer, Hubert Groll, Herbert Schmidt, Torbjorn Hansson