Patents by Inventor Herman Vogel
Herman Vogel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10705439Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: February 26, 2018Date of Patent: July 7, 2020Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Patent number: 10599054Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: June 12, 2019Date of Patent: March 24, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Publication number: 20190294058Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: June 12, 2019Publication date: September 26, 2019Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Patent number: 10423081Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.Type: GrantFiled: December 2, 2015Date of Patent: September 24, 2019Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Thomas Venturino, Geoffrey Alan Schultz, Daniel Nicholas Galburt, Daniel Nathan Burbank, Santiago E. Delpuerto, Herman Vogel, Johannes Onvlee, Laurentius Johannes Adrianus Van Bokhoven, Christopher Charles Ward
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Patent number: 10331047Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: August 28, 2017Date of Patent: June 25, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Publication number: 20180188661Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: February 26, 2018Publication date: July 5, 2018Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Patent number: 9904185Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: October 24, 2016Date of Patent: February 27, 2018Assignees: ASML NETHERLANDS B.V., ASML HOLDINGS N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Publication number: 20170363973Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.Type: ApplicationFiled: December 2, 2015Publication date: December 21, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Thomas VENTURINO, Geoffrey Alan SCHULTZ, Daniel Nicholas GALBURT, Daniel Nathan BURBANK, Santiago E. DELPUERTO, Herman VOGEL, Johannes ONVLEE, Laurentius Johannes Adrianus VAN BOKHOVEN, Christopher Charles WARD
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Publication number: 20170357165Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: August 28, 2017Publication date: December 14, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjored Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Stefan Philip Christiaan BELFROID, Johannes Petrus Maria SMEULERS, Herman VOGEL
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Publication number: 20170293231Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.Type: ApplicationFiled: June 19, 2017Publication date: October 12, 2017Applicant: ASML HOLDING N.V.Inventors: Herman Vogel, Klaus Simon, Antonius Theodorus Anna Maria Derksen
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Patent number: 9746788Abstract: A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.Type: GrantFiled: October 13, 2016Date of Patent: August 29, 2017Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Patent number: 9715178Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.Type: GrantFiled: April 30, 2014Date of Patent: July 25, 2017Assignee: ASML HOLDING N.V.Inventors: Herman Vogel, Klaus Simon, Antonius Theodorus Anna Maria Derksen
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Patent number: 9709899Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.Type: GrantFiled: July 28, 2014Date of Patent: July 18, 2017Assignee: ASML HOLDING N.V.Inventors: Herman Vogel, Klaus Simon, Antonius Theodorus Anna Maria Derksen
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Publication number: 20170045831Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: October 24, 2016Publication date: February 16, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Joost Jeroen OTTENS, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Marco POLIZZI, Edwin Augustinus Matheus VAN GOMPEL, Johannes Petrus Maria SMEULERS, Stefan Philip Christiaan BELFROID, Herman VOGEL
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Publication number: 20170031250Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: October 13, 2016Publication date: February 2, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Stefan Philip Christiaan BELFROID, Johannes Petrus Maria SMEULERS, Herman VOGEL
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Patent number: 9507278Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: July 22, 2015Date of Patent: November 29, 2016Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik de Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Patent number: 9488923Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: May 8, 2014Date of Patent: November 8, 2016Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Publication number: 20150323876Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: July 22, 2015Publication date: November 12, 2015Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Joost Jeroen OTTENS, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Marco POLIZZI, Edwin Augustinus Matheus VAN GOMPEL, Johannes Petrus Maria SMEULERS, Stefan Philip Christiaan BELFROID, Herman VOGEL
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Patent number: 9097992Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: July 19, 2011Date of Patent: August 4, 2015Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrukus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelius Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Patent number: 9081311Abstract: An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element, wherein the first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces, and wherein the projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to the flow, that is lower against flow that is parallel to the certain direction than against flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct gas flow onto a driver part that generates heat.Type: GrantFiled: March 26, 2012Date of Patent: July 14, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Herman Vogel, Jeroen Gerard Gosen, Bart Dinand Paarhuis, Frank Johannes Jacobus Van Boxtel, Jinggao Li