Patents by Inventor Hiaashi Okuchi

Hiaashi Okuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for cleaning semiconductor substrate
    Patent number: 8961696
    Abstract: According to one embodiment, a method for cleaning a semiconductor substrate comprises supplying water vapor to a surface of a semiconductor substrate on which a concave-convex pattern is formed while heating the semiconductor substrate at a predetermined temperature, cooling the semiconductor substrate after stopping the heating and the supply of the water vapor and freezing water on the semiconductor substrate, after freezing the water, supplying pure water onto the semiconductor substrate and melting a frozen film, and after melting the frozen film, drying the semiconductor substrate.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: February 24, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Tomita, Minako Inukai, Hiaashi Okuchi, Linan Ji
  • METHOD AND DEVICE FOR CLEANING SEMICONDUCTOR SUBSTRATE
    Publication number: 20130068257
    Abstract: According to one embodiment, a method for cleaning a semiconductor substrate comprises supplying water vapor to a surface of a semiconductor substrate on which a concave-convex pattern is formed while heating the semiconductor substrate at a predetermined temperature, cooling the semiconductor substrate after stopping the heating and the supply of the water vapor and freezing water on the semiconductor substrate, after freezing the water, supplying pure water onto the semiconductor substrate and melting a frozen film, and after melting the frozen film, drying the semiconductor substrate.
    Type: Application
    Filed: March 19, 2012
    Publication date: March 21, 2013
    Inventors: Hiroshi TOMITA, Minako Inukai, Hiaashi Okuchi, Linan Ji