Abstract: Provided is a laminate where malfunction is not likely to occur for use as a touch panel sensor. The laminate includes: a substrate; a first wiring pattern portion that is disposed on one surface side of the substrate and consists of a plurality of first metal wires; and a second wiring pattern portion that is disposed on another surface side of the substrate and consists of a plurality of second metal wires, in which both of the first metal wires and the second metal wires include metal and carbon atoms, and in a case where an average resistivity of the first metal wires is represented by a resistivity R1 and an average resistivity of the second metal wires is represented by a resistivity R2, the resistivity R1 and the resistivity R2 are the same value or a ratio of a higher resistivity among the resistivity R1 and the resistivity R2 to a lower resistivity among the resistivity R1 and the resistivity R2 is more than 1.00 and 1.40 or less.

Abstract: There are provided a pearl culture material containing at least one selected from the group consisting of a pearl nucleus and a mantle, and the at least one selected from the group consisting of a pearl nucleus and a mantle contains a protein having 10 EU/g or less of an endotoxin amount, a nucleus insertion method, and a pearl culture material composition.

Abstract: There are provided a pearl culture material containing at least one selected from the group consisting of a pearl nucleus and a mantle, and the at least one selected from the group consisting of a pearl nucleus and a mantle contains a protein having 10 EU/g or less of an endotoxin amount, a nucleus insertion method, and a pearl culture material composition.

Abstract: Provided are a pearl culture material in which at least one selected from the group consisting of a pearl nucleus and a mantle piece is coated with a protein containing a repeating sequence of GXY triplets which may be separated by one or more amino acids, and one or more RGD motifs, and having a polydispersity of less than 20; and a coating composition including the protein.

Abstract: Provided are a resist composition capable of forming a pattern having excellent pattern collapse performance, particularly in the formation of an ultrafine pattern (for example, a pattern with a line width 50 nm or less) using the resist composition containing a resin (A) having a repeating unit (a) having an aromatic ring group and a repeating unit (b) having a silicon atom in a side chain, as well as a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the resist composition.

Abstract: The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R1 and R6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R2 and R5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R3 and R4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R3 and R4 may be bonded to each other to form a ring.

Abstract: A pattern forming method including a step of coating a substrate with an actinic ray-sensitive or radiation-sensitive resin composition and forming an actinic ray-sensitive or radiation-sensitive film; a step of simultaneously irradiating the actinic ray-sensitive or radiation-sensitive film with a plurality of electron beams; and a step of developing the actinic ray-sensitive or radiation-sensitive film after the irradiation with electron beams is provided. The composition contains a resin (A), a photoacid generator (B), and an acid diffusion control agent (C) and a molar ratio (Qp) between the photoacid generator (B) and the acid diffusion control agent (C), which is represented by Equation (1) is 0.3 or greater.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.

Abstract: Provided are a resist composition capable of forming a pattern having excellent pattern collapse performance, particularly in the formation of an ultrafine pattern (for example, a pattern with a line width 50 nm or less) using the resist composition containing a resin (A) having a repeating unit (a) having an aromatic ring group and a repeating unit (b) having a silicon atom in a side chain, as well as a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the resist composition.

Abstract: The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

Abstract: Provided is a pre-rinsing liquid used in a method including forming a resist film including an actinic ray-sensitive or radiation-sensitive composition on a substrate, and irradiating the resist film with actinic rays or radiation to form a pattern on the substrate, and used for subjecting the substrate to a pre-rinsing treatment before applying the actinic ray-sensitive or radiation-sensitive composition onto the substrate. The pre-rinsing liquid satisfies the following conditions (1) and (2): (1) the pre-rinsing liquid includes 80% by mass or more of an organic solvent with respect to the total mass of the pre-rinsing liquid, and (2) the organic solvent is at least one organic solvent selected from the group consisting of alcohols, cyclic ethers, glycol ethers, glycol ether acetates, hydrocarbons, ketones, lactones, and esters.

Abstract: A pattern forming method including a step of coating a substrate with an actinic ray-sensitive or radiation-sensitive resin composition and forming an actinic ray-sensitive or radiation-sensitive film; a step of simultaneously irradiating the actinic ray-sensitive or radiation-sensitive film with a plurality of electron beams; and a step of developing the actinic ray-sensitive or radiation-sensitive film after the irradiation with electron beams is provided. The composition contains a resin (A), a photoacid generator (B), and an acid diffusion control agent (C) and a molar ratio (Qp) between the photoacid generator (B) and the acid diffusion control agent (C), which is represented by Equation (1) is 0.3 or greater.

Abstract: A recording material includes a dye-bonded polymer compound which contains a polymer compound to which a one-photon absorption dye is bonded, and a glass transition temperature of the recording material is higher than 200° C. An optical information recording medium includes a recording layer and an intermediate layer adjacent to the recording layer, and the recording layer contains the above-described recording material.

Abstract: A manufacturing method for an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin, an acid generator, an organic acid, and a solvent, includes at least one of (i), (ii), or (iii) below, and a content ratio of the organic acid in the actinic ray-sensitive or radiation-sensitive resin composition is greater than 5% by mass based on a total solid content in the composition; (i) dissolving the organic acid in a solution that does not substantially contain the resin and the acid generator, (ii) dissolving the organic acid in a solution that contains the acid generator and does not substantially contain the resin, and (iii) dissolving the organic acid in a solution that contains the resin and does not substantially contain the acid generator, an actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film, a mask blank including the film, a forming method for a photo mask and a pattern, a manufacturing method for an electronic

Abstract: A method for manufacturing a multilayer structure sheet for manufacturing an optical information recording medium having a multilayer structure with a plurality of recording layers comprises: an adhesive layer forming step of forming an adhesive layer on a first release sheet to obtain a first sheet; a recording layer forming step of forming a recording layer containing a polymer on a second release sheet or a release assisting layer formed on the second release sheet to obtain a second sheet; a laminating step of laminating the recording layer of the second sheet on the adhesive layer of the first sheet to obtain a third sheet in which the second sheet is laid on the first sheet; and a heating step of heating the second sheet.

Abstract: The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R1 and R6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R2 and R5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R3 and R4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R3 and R4 may be bonded to each other to form a ring.

Abstract: The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.

Abstract: An optical information recording medium includes at least one recording layer. The recording layer includes a recording material comprising a polymer compound to which a one-photon absorption dye is bonded, and a coupling strength ?2 between the one-photon absorption dye and the polymer compound in the recording material is higher than a coupling strength estimated to be exerted between the same one-photon absorption dye and the same polymer compound if the one-photon absorption dye is dispersed in the polymer compound in the recording material.

Abstract: The object of the invention is to provide an optical information recording medium which excels in stability e.g., for preserving the properties during a long-term storage and which enables recording using a laser having a small peak power, and a method for manufacturing such an optical information recording medium. An optical information recording medium 10 includes a recording layer 14, and intermediate layers (adhesive agent layer 15A and recording layer support layer 15B) adjacent to the recording layer 14, and the recording layer 14 includes a recording material comprising a one-photon absorption dye bound to a polymer binder (polymer compound).