Abstract: According to one embodiment, a template is provided with a transferring pattern on a first surface of a substrate. The transferring pattern includes a first projecting portion that projects from the first surface with a first height and extends in a first direction along the first surface, a second projecting portion that projects from the first surface with a second height higher than the first height and extends in a second direction along the first surface, a first columnar portion that is arranged at a position overlapping with the first projecting portion and has a top surface with a third height higher than the second height as a height from the first surface, and a second columnar portion that is arranged at a position overlapping with the second projecting portion and has a top surface with the third height as a height from the first surface.

Abstract: According to one embodiment, a template is provided with a transferring pattern on a first surface of a substrate. The transferring pattern includes a first projecting portion that projects from the first surface with a first height and extends in a first direction along the first surface, a second projecting portion that projects from the first surface with a second height higher than the first height and extends in a second direction along the first surface, a first columnar portion that is arranged at a position overlapping with the first projecting portion and has a top surface with a third height higher than the second height as a height from the first surface, and a second columnar portion that is arranged at a position overlapping with the second projecting portion and has a top surface with the third height as a height from the first surface.

Abstract: Provided is a method for producing a polyunsaturated fatty acid while suppressing deterioration of a silver salt solution. A method for producing a polyunsaturated fatty acid-containing composition, the method comprising: supplying a raw material solution comprising an alkyl ester of polyunsaturated fatty acid and an aqueous solution comprising a silver salt to a flow channel mixer to contact the raw material solution with the aqueous solution; and collecting the aqueous solution comprising the silver salt which has been contacted with the raw material solution, in which the supplying the aqueous solution comprising the silver salt to the flow channel mixer and the collecting the same are performed concurrently.

Abstract: Provided is a method for producing a polyunsaturated fatty acid while suppressing deterioration of a silver salt solution. A method for producing a polyunsaturated fatty acid-containing composition, the method comprising: supplying a raw material solution comprising an alkyl ester of polyunsaturated fatty acid and an aqueous solution comprising a silver salt to a flow channel mixer to contact the raw material solution with the aqueous solution; and collecting the aqueous solution comprising the silver salt which has been contacted with the raw material solution, in which the supplying the aqueous solution comprising the silver salt to the flow channel mixer and the collecting the same are performed concurrently.

Abstract: Provided is a method for producing a polyunsaturated fatty acid while preventing deterioration of a silver salt solution. A method for producing a composition comprising a polyunsaturated fatty acid, comprising: supplying an aqueous solution comprising a silver salt into a reaction vessel to contact the aqueous solution with a raw material solution comprising an alkyl ester of the polyunsaturated fatty acid; and collecting the aqueous solution comprising the silver salt which has been contacted with the raw material solution from the reaction vessel, wherein the supply of the aqueous solution comprising the silver salt into the reaction vessel and the collection of the aqueous solution comprising the silver salt from the reaction vessel are carried out concurrently with each other.

Abstract: Provided is a method for producing a polyunsaturated fatty acid while preventing deterioration of a silver salt solution. A method for producing a composition comprising a polyunsaturated fatty acid, comprising: supplying an aqueous solution comprising a silver salt into a reaction vessel to contact the aqueous solution with a raw material solution comprising an alkyl ester of the polyunsaturated fatty acid; and collecting the aqueous solution comprising the silver salt which has been contacted with the raw material solution from the reaction vessel, wherein the supply of the aqueous solution comprising the silver salt into the reaction vessel and the collection of the aqueous solution comprising the silver salt from the reaction vessel are carried out concurrently with each other.

Abstract: According to one embodiment, a pattern forming method includes forming a resist pattern on an under-layer, forming a recessed portion in the under-layer by etching the under-layer using the resist pattern as a mask, slimming the resist pattern, forming a neutral layer having an affinity for first and second polymers on a region of the under-layer not covered with the slimmed resist pattern, forming a block copolymer film containing the first polymer and the second polymer on the slimmed resist pattern and the neutral layer, and forming a microphase separation pattern comprising a first portion formed of the first polymer and a second portion formed of the second polymer by applying microphase separation processing to the block copolymer film.

Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a convex portion including an interconnect and a first film above a substrate, forming a second film on the convex portion, and forming a concave portion having a first bottom face of the first film and a second bottom face lower than the upper face of the first film in the second film. The method further includes forming a polymer film in the concave portion by using a polymer that includes first and second portions respectively having first and second affinities for the first film, phase-separating the first and second portions to form a first pattern containing the first portion and located on the first bottom face and a second pattern containing the second portion and located on the second bottom face in the polymer film, and selectively removing the first or second pattern.

Abstract: According to one embodiment, a pattern forming method includes forming a resist pattern on an under-layer, forming a recessed portion in the under-layer by etching the under-layer using the resist pattern as a mask, slimming the resist pattern, forming a neutral layer having an affinity for first and second polymers on a region of the under-layer not covered with the slimmed resist pattern, forming a block copolymer film containing the first polymer and the second polymer on the slimmed resist pattern and the neutral layer, and forming a microphase separation pattern comprising a first portion formed of the first polymer and a second portion formed of the second polymer by applying microphase separation processing to the block copolymer film.

Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a convex portion including an interconnect and a first film above a substrate, forming a second film on the convex portion, and forming a concave portion having a first bottom face of the first film and a second bottom face lower than the upper face of the first film in the second film. The method further includes forming a polymer film in the concave portion by using a polymer that includes first and second portions respectively having first and second affinities for the first film, phase-separating the first and second portions to form a first pattern containing the first portion and located on the first bottom face and a second pattern containing the second portion and located on the second bottom face in the polymer film, and selectively removing the first or second pattern.

Abstract: A method of taking water according to one aspect of the present invention includes determining a first position based on a temperature distribution in a predetermined measuring range under water, and adjusting a water intake position to make the water intake position identical to the first position.

Abstract: According to one embodiment, a pattern forming method includes forming a first guide layer on a processed film, phase-separating a first self-assembly material with the use of the first guide layer to form a first self-assembly pattern including a first polymer portion and a second polymer portion, selectively removing the first polymer portion, forming a second guide layer with the use of the second polymer portion, and phase-separating a second self-assembly material with the use of the second guide layer to form a second self-assembly pattern including a third polymer portion and a fourth polymer portion.

Abstract: According to one embodiment, a pattern forming method includes forming a first guide layer on a processed film, phase-separating a first self-assembly material with the use of the first guide layer to form a first self-assembly pattern including a first polymer portion and a second polymer portion, selectively removing the first polymer portion, forming a second guide layer with the use of the second polymer portion, and phase-separating a second self-assembly material with the use of the second guide layer to form a second self-assembly pattern including a third polymer portion and a fourth polymer portion.

Abstract: A method of generating an inspection data used for inspecting an inspection-object pattern on a substrate, the inspection-object pattern formed by transferring a first mask pattern formed on a first mask and a second mask pattern formed on a second mask onto one layer on the substrate, a part of a first transferred pattern of the first mask pattern and a part of a second transferred pattern of the second mask pattern being overlapped on the layer. The method performs a corner process on each corner of a first design data of the first mask pattern and each corner of a second design data of the second mask pattern and generates an inspection data by performing a logical operation using the corner-processed first design data and the corner processed second design data.

Abstract: A method of evaluating a photo mask, includes measuring each dimension of a plurality of pattern portions of a mask pattern formed on a photo mask, obtaining an inter-pattern distance between the pattern portion and a pattern different from the pattern portion with respect to each of the pattern portions, obtaining a dimensional difference between the measured dimension of the pattern portion and a target dimension of the pattern portion with respect to each of the pattern portions, grouping the dimensional difference obtained for each pattern portion into a plurality of groups in accordance with the inter-pattern distance obtained for each pattern portion, obtaining an evaluation value based on the dimensional difference in each group with respect to each of the groups, and evaluating the photo mask based on the evaluation value.

Abstract: A reticle has a mask substrate, a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies, and a device pattern adjacent to the test pattern established on the mask substrate.

Abstract: A writing pattern data generating method for, in order to form a first photomask for use in a manufacturing method of a semiconductor device which including forming a first resist pattern on a mask film formed on a first film using the first photomask, forming a first mask pattern by etching the mask film, removing the first resist pattern, forming a second resist film on the mask film, forming a second resist pattern on the mask film, forming a second mask pattern by etching the mask film, removing the second resist pattern, and forming a first film pattern by etching the first film, the generating method comprising correcting a first pattern data in accordance with a difference between the first film pattern and the second mask pattern and a difference between the first resist pattern and the first mask pattern.

Abstract: A method of correcting mask data performs a proximity effect correction process to a pattern shape of a photomask to form a photosensitive material film provided on a substrate to be processed or a film to be processed by using the photosensitive material film as a mask into a pattern of a desired-shape. Model-based proximity effect correction is performed to the pattern shape of the photomask to correct the pattern shape of the photomask, an estimated shape of the pattern in the photosensitive material film or the film to be processed is calculated on the basis of the pattern shape of the photomask subjected to the model-based proximity effect correction, an error between the calculated estimated shape and the desired shape is calculated, and rule-based proximity effect correction is performed to a predetermined interested portion on the basis of the calculated error to further correct the pattern shape of the photomask.

Abstract: A method of evaluating a photo mask, includes measuring each dimension of a plurality of pattern portions of a mask pattern formed on a photo mask, obtaining an inter-pattern distance between the pattern portion and a pattern different from the pattern portion with respect to each of the pattern portions, obtaining a dimensional difference between the measured dimension of the pattern portion and a target dimension of the pattern portion with respect to each of the pattern portions, grouping the dimensional difference obtained for each pattern portion into a plurality of groups in accordance with the inter-pattern distance obtained for each pattern portion, obtaining an evaluation value based on the dimensional difference in each group with respect to each of the groups, and evaluating the photo mask based on the evaluation value.

Abstract: Disclosed is a mask comprising a first area including a first surrounding area in which a halftone phase shift film or a stacked film of a halftone phase shift film and an opaque film is provided on a transparent substrate, and a first opening area surrounded by the first surrounding area, and a second area including a second surrounding area in which a halftone phase shift film is provided on the transparent substrate and a second opening area surrounded by the second surrounding area, wherein a transparent film is provided in at least a part of the second opening area, the transparent film being configured to give a predetermined phase difference to exposure light passing through that part of the second opening area in which the transparent film is provided relative to exposure light passing through the second surrounding area.