Patents by Inventor Hideki Satou

Hideki Satou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230137083
    Abstract: To produce aluminum nitride in the form of a lump that can easily be broken down by light pulverization, which could not be obtained by a conventional combustion synthesis method. A method for producing aluminum nitride powder by a combustion synthesis method using a metallic aluminum powder, characterized in that a powder mixture in which an aluminum nitride powder having an average primary particle diameter of 3 ?m or less as a diluent is mixed with a metallic aluminum powder in a ratio of 150 to 400 parts by mass of the aluminum nitride powder relative to 100 parts by mass of the metallic aluminum powder, is ignited to combust in a nitrogen atmosphere.
    Type: Application
    Filed: January 22, 2021
    Publication date: May 4, 2023
    Inventors: Yasuyuki Yamamoto, Hideki Satou
  • Patent number: 10294929
    Abstract: A liquid supply device which supplies liquid to a target object, comprises a cylinder having both ends closed; a piston which comparts an inner space of the cylinder into a first space and a second space, and is relatively slidable on an inner wall surface of the cylinder; a piston rod which extends to penetrate an end portion of the cylinder and has a tip end portion connected to the piston; a frame member to which a portion of the piston rod which is located outside the cylinder is fastened; a drive section which causes the cylinder to reciprocate in a direction in which the piston rod extends; a first flow line which is in communication with the first space to flow the liquid therethrough; and a second flow line which is in communication with the second space to flow the liquid therethrough.
    Type: Grant
    Filed: January 16, 2014
    Date of Patent: May 21, 2019
    Assignee: KAWASAKI JUKOGYO KABUSHIKI KAISHA
    Inventors: Kei Watanabe, Hideki Satou, Daisuke Ihara, Akira Shoji
  • Publication number: 20160333870
    Abstract: A liquid supply device which supplies liquid to a target object, comprises a cylinder having both ends closed; a piston which comparts an inner space of the cylinder into a first space and a second space, and is relatively slidable on an inner wall surface of the cylinder; a piston rod which extends to penetrate an end portion of the cylinder and has a tip end portion connected to the piston; a frame member to which a portion of the piston rod which is located outside the cylinder is fastened; a drive section which causes the cylinder to reciprocate in a direction in which the piston rod extends; a first flow line which is in communication with the first space to flow the liquid therethrough; and a second flow line which is in communication with the second space to flow the liquid therethrough.
    Type: Application
    Filed: January 16, 2014
    Publication date: November 17, 2016
    Applicant: KAWASAKI JUKOGYO KABUSHIKI KAISHA
    Inventors: Kei WATANABE, Hideki SATOU, Daisuke IHARA, Akira SHOJI
  • Publication number: 20090311162
    Abstract: An aluminum nitride sintered body in which the ratio of a peak area S2 of a diffraction peak at 2?=34° or more and 35° or less corresponding to an aluminum oxynitride phase to a peak area S1 of a diffraction peak of an aluminum nitride crystal face [100] in X-ray diffraction, i.e. S2/S1, is 0.01 or more and 0.3 or less, and the spin concentration at a magnetic field between 336 mT and 342 mT as measured by an electron spin resonance method is 1×1015 spins/cm3 or more and 1×1020 spins/cm3 or less. This is manufactured by: mixing a predetermined amount of the aluminum nitride powder and the ?-alumina powder whose ratio of average particle diameter to that of aluminum nitride powder is within the range of 0.3 or more and 0.8 or less; and sintering the mixed powder at ambient-pressure.
    Type: Application
    Filed: July 26, 2007
    Publication date: December 17, 2009
    Inventors: Tatsuo Esaki, Hideki Satou
  • Patent number: 6890494
    Abstract: The present invention is directed to a method for polymerizing olefins in a multi-stage polymerization apparatus including a gas-phase polymerization reactor in a subsequent stage. By use of the present method, the composition of gas in the gas-phase reactor is easily adjusted, and moreover, a polymer having an intended composition is produced in a consistent manner. In one aspect, the method for polymerizing olefins is performed in successive, multiple stages by use of a plurality of polymerization reactors disposed in series which include at least one gas-phase polymerization reactor after a first reactor, wherein a multi-component gas is removed from a gas-phase reactor and pressurized and/or cooled to thereby liquefy a portion of the gas; at least a portion of gas is discharged; and the remaining gas and the liquid are returned to the gas-phase reactor.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: May 10, 2005
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Hideki Satou, Youichi Matsuo, Itaru Matsuhiro
  • Patent number: 6872289
    Abstract: A thin film is fabricated while causing ions in a plasma P to be incident by effecting biasing relative to the space potential of the plasma P by imparting a set potential to the surface of a substrate 9. A bias system 6 causes the substrate surface potential Vs to vary in pulse form by imposing an electrode imposed voltage Ve in pulse form on a bias electrode 23 which is in a dielectric block 22. The pulse frequency is lower than the oscillation frequency of ions in the plasma P, and the pulse period T, pulse width t and pulse height h are controlled by a control section 62 in a manner such that the incidence of ions is optimized. The imposed pulses are controlled in a manner such that the substrate surface potential Vs recovers to a floating potential Vf at the end of a pulse period T, and that the ion incidence energy temporarily crosses a thin film sputtering threshold value in a pulse period T.
    Type: Grant
    Filed: March 7, 2001
    Date of Patent: March 29, 2005
    Assignee: Anelva Corporation
    Inventors: Shigeru Mizuno, Makoto Satou, Manabu Tagami, Hideki Satou
  • Patent number: 6818708
    Abstract: The process for polymerizing olefins uses a plurality of series-connected polymerization reactors in which at least one of second and subsequent reactors is a vapor-phase polymerization reactor containing a multicomponent gas. The process comprises the steps of: taking the multicomponent gas out of the vapor-phase polymerization reactor; mixing the multicomponent gas with an inert gas which is lighter than at least one component of the multicomponent gas, thereby obtaining a mixed gas; compressing and/or cooling the mixed gas to liquefy a part of the multicomponent gas; discharging at least a part of a gaseous mixture comprising the inert gas and an unliquefied multicomponent gas out of a reaction system; and returning a fluid comprising the remainder of the gaseous mixture and the liquefied multicomponent gas to the vapor-phase polymerization reactor.
    Type: Grant
    Filed: September 18, 2002
    Date of Patent: November 16, 2004
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Hideki Satou, Shinji Araki, Hiromi Adachi
  • Publication number: 20030130444
    Abstract: The process for polymerizing olefins uses a plurality of series-connected polymerization reactors in which at least one of second and subsequent reactors is a vapor-phase polymerization reactor containing a multicomponent gas. The process comprises the steps of: taking the multicomponent gas out of the vapor-phase polymerization reactor; mixing the multicomponent gas with an inert gas which is lighter than at least one component of the multicomponent gas, thereby obtaining a mixed gas; compressing and/or cooling the mixed gas to liquefy a part of the multicomponent gas; discharging at least a part of a gaseous mixture comprising the inert gas and an unliquefied multicomponent gas out of a reaction system; and returning a fluid comprising the remainder of the gaseous mixture and the liquefied multicomponent gas to the vapor-phase polymerization reactor.
    Type: Application
    Filed: September 18, 2002
    Publication date: July 10, 2003
    Inventors: Hideki Satou, Shinji Araki, Hiromi Adachi
  • Patent number: 6348238
    Abstract: A thin film is fabricated while causing ions in a plasma P to be incident by effecting biasing relative to the space potential of the plasma P by imparting a set potential to the surface of a substrate 9. A bias system 6 causes the substrate surface potential Vs to vary in pulse form by imposing an electrode imposed voltage Ve in pulse form on a bias electrode 23 which is in a dielectric block 22. The pulse frequency is lower than the oscillation frequency of ions in the plasma P, and the pulse period T, pulse width t and pulse height h are controlled by a control section 62 in a manner such that the incidence of ions is optimized. The imposed pulses are controlled in a manner such that the substrate surface potential Vs recovers to a floating potential Vf at the end of a pulse period T, and that the ion incidence energy temporarily crosses a thin film sputtering threshold value in a pulse period T.
    Type: Grant
    Filed: February 15, 2000
    Date of Patent: February 19, 2002
    Assignee: Anelva Corporation
    Inventors: Shigeru Mizuno, Makoto Satou, Manabu Tagami, Hideki Satou
  • Publication number: 20010019706
    Abstract: The present invention is directed to a method for polymerizing olefins in a multi-stage polymerization apparatus including a gas-phase polymerization reactor in a subsequent stage. By use of the present method, the composition of gas in the gas-phase reactor is easily adjusted, and moreover, a polymer having an intended composition is produced in a consistent manner. In one aspect, the method for polymerizing olefins is performed in successive, multiple stages by use of a plurality of polymerization reactors disposed in series which include at least one gas-phase polymerization reactor after a first reactor, wherein a multi-component gas is removed from a gas-phase reactor and pressurized and/or cooled to thereby liquefy a portion of the gas; at least a portion of gas is discharged; and the remaining gas and the liquid are returned to the gas-phase reactor.
    Type: Application
    Filed: March 28, 2001
    Publication date: September 6, 2001
    Applicant: Idemitsu Petrochemical Co., Ltd.
    Inventors: Hideki Satou, Youichi Matsuo, Itaru Matsuhiro
  • Patent number: 6271318
    Abstract: The present invention is directed to a method for polymerizing olefins in a multi-stage polymerization apparatus including a gas-phase polymerization reactor in a subsequent stage. By use of the present method, the composition of gas in the gas-phase reactor is easily adjusted, and moreover, a polymer having an intended composition is produced in a consistent manner. In one aspect, the method for polymerizing olefins is performed in successive, multiple stages by use of a plurality of polymerization reactors disposed in series which include at least one gas-phase polymerization reactor after a first reactor, wherein a multi-component gas is removed from a gas-phase reactor and pressurized and/or cooled to thereby liquefy a portion of the gas; at least a portion of gas is discharged; and the remaining gas and the liquid are returned to the gas-phase reactor.
    Type: Grant
    Filed: July 15, 1999
    Date of Patent: August 7, 2001
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Hideki Satou, Youichi Matsuo, Itaru Matsuhiro
  • Publication number: 20010009220
    Abstract: A thin film is fabricated while causing ions in a plasma P to be incident by effecting biasing relative to the space potential of the plasma P by imparting a set potential to the surface of a substrate 9. A bias system 6 causes the substrate surface potential Vs to vary in pulse form by imposing an electrode imposed voltage Ve in pulse form on a bias electrode 23 which is in a dielectric block 22. The pulse frequency is lower than the oscillation frequency of ions in the plasma P, and the pulse period T, pulse width t and pulse height h are controlled by a control section 62 in a manner such that the incidence of ions is optimized. The imposed pulses are controlled in a manner such that the substrate surface potential Vs recovers to a floating potential Vf at the end of a pulse period T, and that the ion incidence energy temporarily crosses a thin film sputtering threshold value in a pulse period T.
    Type: Application
    Filed: March 7, 2001
    Publication date: July 26, 2001
    Inventors: Shigeru Mizuno, Makoto Satou, Manabu Tagami, Hideki Satou
  • Patent number: 6089469
    Abstract: A viscous fluid supply control apparatus reduces a difference between a primary side pressure of a feeding pump and a secondary side pressure thereof to lessen an internal leak of the feeding pump. The viscous fluid supply control apparatus comprises a viscous fluid supply source, a discharge nozzle for discharging a viscous fluid, a feeding pump for feeding the viscous fluid from the viscous fluid supply source to the discharge nozzle, a first pressure sensor for detecting the primary side pressure of the feeding pump, a second pressure sensor for detecting the secondary side pressure of the feeding pump, and pressure regulation control means for controlling actuation of pressure regulating means regulating the primary side pressure based on detection values obtained by the first and second pressure sensors. The pressure regulation control means controls the actuation of the pressure regulating means such that the primary side pressure of the feeding pump converges on the secondary side pressure thereof.
    Type: Grant
    Filed: July 2, 1998
    Date of Patent: July 18, 2000
    Assignee: Kawasaki Jukogyo Kabushiki Kaisha
    Inventors: Masaki Fusama, Osamu Nakagawa, Hideki Satou