Patents by Inventor Hidenobu Ishikawa

Hidenobu Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6887967
    Abstract: A thermosetting polyimide resin composition is provided which comprises a polyimide resin and an epoxy resin, which has excellent heat resistance, low dielectric constant and low dielectric loss tangent and also yields a cured article having good mechanical properties such as tensile strength and tensile elongation. Also, a process for producing a polyimide resin used in the polyimide resin composition is provided. The thermosetting polyimide resin composition comprises a polyimide resin (X), which has a carboxyl group and a linear hydrocarbon structure having a number-average molecular weight of 300 to 6,000, and an epoxy resin (Y).
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: May 3, 2005
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Eiju Ichinose, Yohzoh Yamashina, Hidenobu Ishikawa
  • Patent number: 6784275
    Abstract: Disclosed is an active energy ray-curable polyimide resin composition which comprises a polymerizable polyimide resin (I) having an isocyanurate ring, an alicyclic structure, an imide ring and a (meth)acryloyl group and being capable of patterning with a dilute alkali aqueous solution.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: August 31, 2004
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Eiju Ichinose, Yohzoh Yamashina, Hidenobu Ishikawa
  • Publication number: 20040096757
    Abstract: An object of the present invention is to provide a photosensitive resin composition or a photosensitive resist for color filters which is superior in heat resistance, water resistance, solvent resistance, chemical resistance, and also transparency, and a method for producing color filters using them. The present invention relates to a photosensitive resin composition comprising a vinyl polymer (A) having at least one cyclocarbonate group and at least one carboxyl group in the molecule and a compound (B) having at least two ethylenically unsaturated double bonds in the molecule as a main component, which can introduce crosslinked structures by photocuring and thermosetting, a photosensitive resist for color filters comprising the photosensitive resin composition and a colorant, and a method for producing a color filter, using the photosensitive resist for color filters.
    Type: Application
    Filed: September 25, 2003
    Publication date: May 20, 2004
    Inventors: Hiroyuki Tokuda, Yasunobu Hirota, Hidenobu Ishikawa
  • Publication number: 20030149222
    Abstract: A thermosetting polyimide resin composition is provided which comprises a polyimide resin and an epoxy resin, which has excellent heat resistance, low dielectric constant and low dielectric loss tangent and also yields a cured article having good mechanical properties such as tensile strength and tensile elongation. Also, a process for producing a polyimide resin used in the polyimide resin composition is provided. The thermosetting polyimide resin composition comprises a polyimide resin (X), which has a carboxyl group and a linear hydrocarbon structure having a number-average molecular weight of 300 to 6,000, and an epoxy resin (Y).
    Type: Application
    Filed: January 23, 2003
    Publication date: August 7, 2003
    Applicant: DAINIPPON INK AND CHEMICALS, INC
    Inventors: Eiju Ichinose, Yohzoh Yamashina, Hidenobu Ishikawa
  • Publication number: 20030130475
    Abstract: Disclosed is an active energy ray-curable polyimide resin composition which comprises a polymerizable polyimide resin (I) having an isocyanurate ring, an alicyclic structure, an imide ring and a (meth)acryloyl group and being capable of patterning with a dilute alkali aqueous solution.
    Type: Application
    Filed: June 27, 2002
    Publication date: July 10, 2003
    Applicant: Dainippon Ink and Chemicals, Inc.
    Inventors: Eiju Ichinose, Yohzoh Yamashina, Hidenobu Ishikawa
  • Patent number: 6410611
    Abstract: Objects of the present invention are the provision of an active energy ray curable composition which can be cured in the absence of a photoinitiator, and which can also be cured at practical light intensities and irradiating energy, and a method for curing the said curable composition; in which the composition comprises a maleimide derivative represented by formula (1): wherein m and n each represent an integer of 1 to 5, and the total of m and n is 6 or smaller, R11 and R12 each represent a linking group selected from the group consisting of {circle around (1)} an alkylene group, {circle around (2)} an alicyclic group, {circle around (3)} an arylalkylene group, and {circle around (4)} a cycloalkylalkyene group, G1 and G2 each represent an ester linkage selected from the group consisting of —COO— and —OCO—, R2 represents a linking chain having an average molecular weight of 100 to 100,000 selected from the group consisting of (A) a (poly)ether linking chain and (B
    Type: Grant
    Filed: May 15, 1998
    Date of Patent: June 25, 2002
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Yoshinobu Sakurai, Atsushi Miyakawa, Hisatomo Yonehara, Hidenobu Ishikawa, Katsuji Takahashi
  • Patent number: 5847022
    Abstract: The present invention provides a radiation curable resin composition and method of production therefor; the present composition has wide applications as an ink, coating or the like, is dilutable in water or an organic solvent, and forms a coating which has excellent hardening characteristics and adherence to a substrate, as well as superior resistance to heat, chemicals and boiling, this resin composition may be redissolved with water or an organic solvent prior to hardening; which have a number average weight of 500 to 50,000, characterized in that the aprotic ammonium salt represented by general formula 1 is contained in the resin in the amount of 0.1 to 4.0 mol/kg.
    Type: Grant
    Filed: March 21, 1996
    Date of Patent: December 8, 1998
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Yozo Yamashina, Eiju Ichinose, Yoichi Abe, Hidenobu Ishikawa
  • Patent number: 5714218
    Abstract: An ionizing radiation-curable resin composition which provides a cured product having no yield point in the stress-strain diagram in tension is disclosed. An optical article prepared from the ionizing radiation-curable resin composition and a surface light source using the optical article are also disclosed. The present invention provides an excellent ionizing radiation-curable resin composition, an excellent optical article comprising a cured product of the resin composition, and an excellent surface light source using the optical article, which have high surface hardness and a high refractive index and are free from deformation, permanent sets, and reduction in weather resistance after curing.
    Type: Grant
    Filed: August 21, 1995
    Date of Patent: February 3, 1998
    Assignees: Dainippon Printing Co., Ltd., Dainippon Ink and Chemicals, Inc.
    Inventors: Toshikazu Nishio, Hiroshi Kojima, Hisanori Ishida, Kazuko Etou, Hiroyuki Amemiya, Michiko Takeuchi, Eiji Ichinose, Youichi Abe, Hidenobu Ishikawa
  • Patent number: 5304628
    Abstract: A radiation-curing resin composition comprising (A) a resin having a carboxylic acid group and an unsaturated double bond and (B) a compound containing a cyclocarbonate group. The composition is excellent in stability and curing properties and provides a cured film excellent in water resistance, solvent resistance, chemical resistance, and heat resistance.
    Type: Grant
    Filed: August 4, 1992
    Date of Patent: April 19, 1994
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Masashi Kinoshita, Hidenobu Ishikawa
  • Patent number: 5155165
    Abstract: Polyurethane polyurea particles are obtained by an interfacial polymerization reaction between a hydrophobic phase which is capable of forming a three-dimensional crosslinked structure by reaction and is a mixture comprising a polyisocyanate compound and a polyhydroxy compound with the isocyanate groups being stoichiometrically excessive, and a polyamine in an amount not more than one equivalent of the stoichiometrically excessive isocyanate groups in the hydrophobic phase, and by polyurethanization reaction inside the particles.
    Type: Grant
    Filed: May 30, 1990
    Date of Patent: October 13, 1992
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Osamu Maruyama, Yoichi Abe, Hidenobu Ishikawa, Noboru Okoshi
  • Patent number: 4855334
    Abstract: A curable resin composition comprising an isocyanuric ring-containing urethane-modified radical-polymerizable compound. The composition can give a protective coating having excellent surface mar resistance and improved secondary adhesion.
    Type: Grant
    Filed: June 3, 1985
    Date of Patent: August 8, 1989
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Osamu Maruyama, Hidenobu Ishikawa, Nobuo Takahashi
  • Patent number: 4690987
    Abstract: An activation energy-curable resin composition comprising as an essential ingredient a resin obtained by reacting (a) the reaction product of a novolac epoxy compound and an unsaturated monocarboxylic acid with (b) the reaction product of a diisocyanate and a poly(meth)acrylate having one hydroxyl group for each molecule.
    Type: Grant
    Filed: May 23, 1985
    Date of Patent: September 1, 1987
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Shigeru Sakakibara, Shunji Arimoto, Hidenobu Ishikawa, Osamu Maruyama
  • Patent number: 4179417
    Abstract: A composition for water-base paints, said composition comprising (I) a water-soluble resin, and (II) a water-dispersible polymer containing at least one group selected from the class consisting of hydroxyl and carboxyl groups, said water-soluble resin being obtained by polymerizing 50 to 99.5% by weight of an alkyl ester of an .alpha.,.beta.-monoethylenically unsaturated acid or an alkenyl benzene, 0.5 to 20% by weight of an .alpha.,.beta.-monoethylenically unsaturated acid and 0 to 30% by weight of a hydroxyalkyl ester of an .alpha.,.beta.-monoethylenically unsaturated acid in the presence of at least one unsaturated compound selected from the group consisting of alkyd resins containing a polymerizable unsaturated group, epoxy esters containing a polymerizable unsaturated group, drying oils, fatty acids of drying oils and diene polymers, and water-solubilizing the product with ammonia or an amine.
    Type: Grant
    Filed: June 27, 1977
    Date of Patent: December 18, 1979
    Assignee: Dainippon Ink & Chemicals Inc.
    Inventors: Masuyuki Sunada, Hirotugu Takanashi, Hidenobu Ishikawa, Akikazu Takahashi, Fumio Yoshino