Patents by Inventor Hidenori Iwasaki

Hidenori Iwasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive polymer and photosensitive material for photomechanical process
    Patent number: 4413091
    Abstract: (1) A polyvinyl alcohol derivative represented by the formula: ##STR1## (where R.sub.1 is a hydrogen atom or an alkyl group, R.sub.2 is an aryl group, and k, l, m, and n denote integers of 1 or more.) (2) A photosensitive material for photomechanical process containing a polyvinyl alcohol derivative represented by the formula: ##STR2## (where R.sub.1 is a hydrogen atom or an alkyl group, R.sub.2 is an aryl group, and k, l, m, and n denote integers of 1 or more) and a sensitizing agent.
    Type: Grant
    Filed: December 31, 1981
    Date of Patent: November 1, 1983
    Assignee: Tokyo Ohka Kogyo Kabushiki Kaisha
    Inventors: Hidenori Iwasaki, Yukio Urata, Shunichi Kasukawa
  • Photosensitive printing plate
    Patent number: 4371602
    Abstract: The photosensitive printing plate of this invention features incorporation of an organic foaming agent in the photosensitive composition that constitutes the photosensitive layer, said organic foaming agent being thermally decomposed upon drying of said composition under heating to thereby roughen the surface of the photosensitive layer. According to this invention, no specific mechanical treatment is required for forming the photosensitive layer and also there is no need of remodeling the existing coating equipments, and further, the vacuum contact time can be appreciably lessened, so that this invention can greatly improve the working efficiency in plate making and markedly reduce the production cost.
    Type: Grant
    Filed: November 13, 1979
    Date of Patent: February 1, 1983
    Inventors: Hidenori Iwasaki, Junichi Igarashi, Shunichi Kasukawa