Patents by Inventor Hideo Horibe

Hideo Horibe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220326614
    Abstract: Provided is a high-sensitive photosensitive resin composition which contains a black colorant and by which development and pattern formation are possible even with a low exposure amount. A positive-type photosensitive resin composition according to one embodiment contains: a first resin (A) having a plurality of phenolic hydroxyl groups, at least some of which are protected with an acid-labile group; a second resin (B) having an epoxy group and a phenolic hydroxyl group; at least one colorant (C) selected from the group consisting of a black dye and a black pigment; and a photoacid generator (D).
    Type: Application
    Filed: June 3, 2020
    Publication date: October 13, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Yasuhiro ISHIDA, Kentaro FURUE, Yoshikazu ARAI, Mitsuhiro IWASAKI, Hideo HORIBE
  • Patent number: 6955178
    Abstract: A substrate treatment apparatus includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, and a supply device for supplying the wet ozone-containing gas from the wetting device to a work object on a surface of the substrate. The supply device includes a gas disperser including apertures aligned in rows in a width direction of the work object. The apertures in adjacent rows are not aligned with each other in a direction perpendicular to the rows. At least one of the gas disperser and the substrate is movable in a direction perpendicular to the rows. A gas conduit connects the wetting device to the supply device. A wet ozone-containing gas heating device heats the wet ozone-containing gas to a temperature at least equal to the temperature of the substrate.
    Type: Grant
    Filed: July 25, 2003
    Date of Patent: October 18, 2005
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masaki Kuzumoto, Seiji Noda, Izumi Oya, Makoto Miyamoto, Hideo Horibe, Tatsuo Kataoka, Tetsuji Oishi
  • Patent number: 6773633
    Abstract: Conventional batteries have the problem that, when battery temperature rises above a temperature at which the separator melts and flows due to an internal short-circuit, a large short-circuit current is generated between the positive and negative electrodes, that further raises the battery temperature. As a result, the short-circuit current further increases. The inventive electrode increases its resistivity with increasing temperature, and a processing for producing the electrode is disclosed. The electrode of the invention has an electron conductive material containing a conductive filler and a resin and increases its resistivity with increasing temperature.
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: August 10, 2004
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Makiko Kise, Shoji Yoshioka, Jun Aragane, Hiroaki Urushibata, Hisashi Shiota, Hideo Horibe, Shigeru Aihara, Daigo Takemura
  • Patent number: 6616773
    Abstract: A substrate treatment assembly for treating a work object on a surface of a substrate by supplying to the work object a wet ozone-containing gas wetted with a treatment solution includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, a supply device for supplying the wet ozone-containing gas to a work object on a surface of the substrate, a gas conduit connecting the wetting device to the supply device, and a heating device for heating the wet ozone-containing gas to a temperature approximately equal to or greater than the temperature of the substrate.
    Type: Grant
    Filed: October 11, 2000
    Date of Patent: September 9, 2003
    Assignees: Mitsubishi Denki Kabushiki Kaisha, SPC Electronics Corporation
    Inventors: Masaki Kuzumoto, Seiji Noda, Izumi Oya, Makoto Miyamoto, Hideo Horibe, Tatsuo Kataoka, Tetsuji Oishi
  • Patent number: 6598593
    Abstract: A fuel supply apparatus mounting structure in which a set plate for holding a fuel supply apparatus is not corroded or deteriorated by the exposure to salt for thawing snow sprayed in winter in cold districts or to salt particles contained in sea wind in coastal areas is provided. The fuel supply apparatus mounting structure comprises a fuel pump 2 disposed within a fuel tank for pumping fuel to an internal combustion engine, a set plate 3 made of a synthetic resin and holding the fuel pump 2 and closing an opening hole 1a in the fuel tank 1, a gasket for maintaining airtight between the set plate 3 and the fuel tank 1, and a plate 4 for fastening the set plate 3 to the fuel tank 1, and a protective member 6, 8 made of a material which is not reacted, dissolved or deteriorated by a reaction product generated by a chemical reaction occurring between the plate 4 and the set plate 3 is inserted.
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: July 29, 2003
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Shigeki Kanamaru, Hideo Horibe
  • Publication number: 20030066549
    Abstract: There is provided a process for treating a substrate by removing organic pollutant on the surface of the substrate using mixed gas of wet ozone-containing gas and basic gas, wherein the introduction amount of basic gas is controlled, thereby achieving complete prevention of corrosion of metal wiring previously formed on the substrate, and an apparatus therefor.
    Type: Application
    Filed: May 1, 2002
    Publication date: April 10, 2003
    Inventors: Seiji Noda, Hideo Horibe, Makoto Miyamoto, Izumi Oya, Masaki Kuzumoto
  • Publication number: 20020137831
    Abstract: Disclosed is a polymeric PTC composition comprising an organic polymer and conductive particles having a melting point of not less than 2000° C. dispersed therein and a circuit protection device comprising a PTC element comprising the PTC composition which are treated with a coupling agent and at least two electrodes which are electrically connected to the PTC element. The polymeric PTC composition is used to provide a circuit protection device having excellent environmental resistance properties, which exhibits a low resistance under normal operating conditions, and protects the circuit against the over-current even under large electric current and high voltage.
    Type: Application
    Filed: April 20, 2000
    Publication date: September 26, 2002
    Inventors: Hideo Horibe, Itsuo Nishiyama, Osamu Hiroi, Teijiro Mori, Tatsuya Hayashi, Chie Takahashi, Shiro Murata, Kenichi Nishina, Manabu Sogabe, Masahiro Ishikawa
  • Publication number: 20020109126
    Abstract: Conventional batteries have the following problem. When the battery temperature rises above a temperature at which the separator melts and flows due to an internal short-circuit, etc., a large short-circuit current generates between the positive and negative electrodes at portions where the separator flows to cause heat generation to further raise the battery temperature. As a result, the short-circuit current further increases.
    Type: Application
    Filed: April 5, 2002
    Publication date: August 15, 2002
    Applicant: MITSUBISHI DENKI KABUSHIKI KAISHA
    Inventors: Makiko Kise, Shoji Yoshioka, Jun Aragane, Hiroaki Urushibata, Hisashi Shiota, Hideo Horibe, Shigeru Aihara, Daigo Takemura
  • Patent number: 6399252
    Abstract: An electrode for a battery which increases resistivity with increasing temperature. The electrode has an electron conductive material containing a conductive filler and a resin so as to increase its resistivity with increasing temperature. This solves the problem of the prior art where the battery temperature rises above a temperature at which the separator melts and flows due to an internal short circuit, with a large short circuit current being generated between the positive and negative electrodes at portions where the separator flows to cause heat generation to further increase the battery temperature. As a result, the short circuit current increases further.
    Type: Grant
    Filed: December 27, 1999
    Date of Patent: June 4, 2002
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Makiko Kise, Shoji Yoshioka, Jun Aragane, Hiroaki Urushibata, Hisashi Shiota, Hideo Horibe, Shigeru Aihara, Daigo Takemura
  • Patent number: 5981146
    Abstract: When a fine pattern is formed by using a chemical-amplification-type resist film, fall of acid in the surface of the resist can be inhibited so that a fine pattern exhibiting an excellent shape is formed. A resist coating film containing a compound having a sulfonic acid group or a carbonic acid group is formed on a chemical-amplification-type resist film of a semiconductor substrate, followed by performing exposure.
    Type: Grant
    Filed: January 28, 1997
    Date of Patent: November 9, 1999
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Teruhiko Kumada, Atsuko Sasahara, Youko Tanaka, Hideo Horibe, Shigeru Kubota, Hiroshi Koezuka, Tetsuro Hanawa
  • Patent number: 5204218
    Abstract: Disclosed herein is a photosensitive resin composition containing:a photobase generator expressed in the following general formula (I): ##STR1## where R.sub.1, R.sub.2 and R.sub.3 are individually selected from the group consisting of hydrogen, halogen, alkyl groups, alkenyl groups, alkinyl groups, phenyl groups and alkoxy groups; anda base-catalytic reaction compound which is cured or decomposed under basic conditions.
    Type: Grant
    Filed: June 17, 1991
    Date of Patent: April 20, 1993
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Teruhiko Kumada, Youko Tanaka, Hideo Horibe, Shigeru Kubota, Hiroshi Koezuka
  • Patent number: 5100762
    Abstract: A radiation-sensitive polymer is capable of resistance to the dry etching when it is applied to form very fine patterns in VLSIs and other semiconductor devices, wherein the polymer is a radiation-sensitive polymer that contains at least one unit represented by the general formula (I): ##STR1## (where X is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.1 is an alkyl group, an alkoxy or an aryl group; R.sup.2 is carbon monoxide; M is Si, Ge, Sn, Ti, Mo or W; k is a number defined by the valence of (M minus 1); and l is zero or a positive integer), and which optionally contains at least one unit represented by the general formula (II): ##STR2## (where Y is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.3 is an alkyl group or an aryl group) and/or at least one unit represented by the general formula (III):--SO.sub.2 --R.sup.4 (III)(where R.sup.4 is a divalent alkyl or aryl group).
    Type: Grant
    Filed: July 9, 1990
    Date of Patent: March 31, 1992
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Youko Tanaka, Shigeru Kubota, Hideo Horibe, Hiroshi Koezuka, Teruhiko Kumada