Patents by Inventor Hideo Miyata

Hideo Miyata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11358927
    Abstract: A method of producing an N,N-disubstituted amide of the present invention is a method of reacting a nitrile with an alcohol in the presence of a catalyst, wherein the nitrile is a compound represented by R1CN (R1 represents an alkyl group having 10 or less carbon atoms or an aryl group having 10 or less carbon atoms), wherein the alcohol is a compound represented by R2OH (R2 represents an alkyl group having 10 or less carbon atoms), wherein the catalyst is a metal salt represented by MXn (M represents a metal cation having an oxidation number of n, X represents a monovalent anion including a substituted sulfonyl group represented by —S(?O)2—R3 (R3 represents a hydrocarbon group having 10 or less carbon atoms or a group in which some or all of hydrogen atoms in the hydrocarbon group are substituted with fluorine atoms), and n represents an integer of 1 to 4), a substituent bonded to a carbon atom in a carbonyl group of the N,N-disubstituted amide is R1, and two substituents bonded to nitrogen atoms in an amide
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: June 14, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Yasuyuki Ueda, Akira Shibuya, Hideo Miyata, Hiroshi Uchida
  • Patent number: 11319278
    Abstract: Provided is a method for producing glycine, in which on synthesizing glycine from glycinonitrile, glycine can be obtained in a higher yield than that in the conventional method. The present invention relates to a method for producing glycine, including allowing glycinonitrile and water to react with each other in the presence of a cerium compound, optionally adding ammonia thereto, to obtain glycine.
    Type: Grant
    Filed: July 11, 2017
    Date of Patent: May 3, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Takanori Aoki, Akira Shibuya, Takamitsu Kobayashi, Hideo Miyata, Shinya Tsukamoto, Manabu Kuwajima, Motoki Murai
  • Publication number: 20210292273
    Abstract: Provided is a method for producing glycine, in which on synthesizing glycine from glycinonitrile, glycine can be obtained in a higher yield than that in the conventional method. The present invention relates to a method for producing glycine, including allowing glycinonitrile and water to react with each other in the presence of a cerium compound, optionally adding ammonia thereto, to obtain glycine.
    Type: Application
    Filed: July 11, 2017
    Publication date: September 23, 2021
    Applicant: SHOWA DENKO K.K.
    Inventors: Takanori AOKI, Akira SHIBUYA, Takamitsu KOBAYASHI, Hideo MIYATA, Shinya TSUKAMOTO, Manabu KUWAJIMA, Motoki MURAI
  • Publication number: 20210238123
    Abstract: A method of producing an N,N-disubstituted amide of the present invention is a method of reacting a nitrile with an alcohol in the presence of a catalyst, wherein the nitrile is a compound represented by R1CN (R1 represents an alkyl group having 10 or less carbon atoms or an aryl group having 10 or less carbon atoms), wherein the alcohol is a compound represented by R2OH (R2 represents an alkyl group having 10 or less carbon atoms), wherein the catalyst is a metal salt represented by MXn (M represents a metal cation having an oxidation number of n, X represents a monovalent anion including a substituted sulfonyl group represented by —S(?O)2—R3 (R3 represents a hydrocarbon group having 10 or less carbon atoms or a group in which some or all of hydrogen atoms in the hydrocarbon group are substituted with fluorine atoms), and n represents an integer of 1 to 4), a substituent bonded to a carbon atom in a carbonyl group of the N,N-disubstituted amide is R1, and two substituents bonded to nitrogen atoms in an amide
    Type: Application
    Filed: April 25, 2019
    Publication date: August 5, 2021
    Applicant: SHOWA DENKO K.K.
    Inventors: Yasuyuki UEDA, Akira SHIBUYA, Hideo MIYATA, Hiroshi UCHIDA
  • Patent number: 10774037
    Abstract: The present invention relates to a method for producing a specified ?-amino acid, the method including allowing a specified ?-amino acid amide and water to react with each other in the presence of a zirconium compound which contains zirconium and at least one metal element selected from the group consisting of lithium, nickel, copper, zinc, cesium, barium, hafnium, tantalum, cerium, and dysprosium.
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: September 15, 2020
    Assignee: SHOWA DENKO K.K.
    Inventors: Takanori Aoki, Akira Shibuya, Takamitsu Kobayashi, Hideo Miyata, Shinya Tsukamoto, Manabu Kuwajima, Motoki Murai
  • Publication number: 20190161434
    Abstract: The present invention relates to a method for producing a specified ?-amino acid, the method including allowing a specified ?-amino acid amide and water to react with each other in the presence of a zirconium compound which contains zirconium and at least one metal element selected from the group consisting of lithium, nickel, copper, zinc, cesium, barium, hafnium, tantalum, cerium, and dysprosium.
    Type: Application
    Filed: July 25, 2017
    Publication date: May 30, 2019
    Applicant: SHOWA DENKO K.K.
    Inventors: Takanori AOKI, Akira SHIBUYA, Takamitsu KOBAYASHI, Hideo MIYATA, Shinya TSUKAMOTO, Manabu KUWAJIMA, Motoki MURAI
  • Patent number: 9109072
    Abstract: A curable composition includes (A) silica fine particles surface-modified with at least one silane compound including at least (A1) a polymerizable silane compound of the general formula (1), (B) a (meth)acrylate compound, and (C) a polymerization initiator, SiR1aR2bR3c(OR4)4-a-b-c??(1) wherein R1 is a C11-20 hydrocarbon group having an ethylenic unsaturated group, or a substituted C11-20 hydrocarbon group having an ethylenic unsaturated group and having an ether bond and/or an ester bond; R2 is a hydrogen atom or a C1-4 hydrocarbon group; R3 is a halogen atom; R4 is a hydrogen atom or a C1-10 hydrocarbon group; a is an integer of 1 to 3; b is an integer of 0 to 2; c is an integer of 0 to 3; the sum of a and b is 1 to 3; the sum of a, b and c is 1 to 4.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: August 18, 2015
    Assignee: SHOWA DENKO K.K.
    Inventors: Nobuyuki Takahashi, Yoshifumi Urakawa, Hideo Miyata, Shigeru Yamaki
  • Publication number: 20140378571
    Abstract: A curable composition includes (A) silica fine particles surface-modified with at least one silane compound including at least (A1) a polymerizable silane compound of the general formula (1), (B) a (meth)acrylate compound, and (C) a polymerization initiator, SiR1aR2bR3c(OR4)4-a-b-c??(1) wherein R1 is a C11-20 hydrocarbon group having an ethylenic unsaturated group, or a substituted C11-20 hydrocarbon group having an ethylenic unsaturated group and having an ether bond and/or an ester bond; R2 is a hydrogen atom or a C1-4 hydrocarbon group; R3 is a halogen atom; R4 is a hydrogen atom or a C1-10 hydrocarbon group; a is an integer of 1 to 3; b is an integer of 0 to 2; c is an integer of 0 to 3; the sum of a and b is 1 to 3; the sum of a, b and c is 1 to 4.
    Type: Application
    Filed: February 5, 2013
    Publication date: December 25, 2014
    Applicant: SHOWA DENKO K.K.
    Inventors: Nobuyuki Takahashi, Yoshifumi Urakawa, Hideo Miyata, Shigeru Yamaki
  • Patent number: 8840830
    Abstract: There is provided a method of molding which is capable of more highly precisely molding a molded article to be molded such as a lens than conventional technologies. A molded article such as a lens array and a mold for nanoimprinting is molded by repeating multiple times a transfer step including: a transformation step of bringing a light curable composition containing a compound having a polymerizable functional group and a polymerization initiator into contact with a transfer member 62 on which a transfer shape portion shaped equally to or reversely to an aspherical lens portion 312 is formed to transform the light curable composition to the transfer shape of the transfer member 62; a curing step of irradiating at least a transformed portion of the transformed light curable composition with light by a light irradiation unit 60 to cure the light curable composition; and a separation step of separating the cured light curable composition and the transfer member.
    Type: Grant
    Filed: November 13, 2009
    Date of Patent: September 23, 2014
    Assignee: AJI Co., Ltd.
    Inventors: Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Nobuaki Ishii, Katsumi Murofushi, Kunio Yoshida
  • Patent number: 8349934
    Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; R
    Type: Grant
    Filed: December 10, 2009
    Date of Patent: January 8, 2013
    Assignee: Showa Denko K.K.
    Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
  • Patent number: 8283095
    Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).
    Type: Grant
    Filed: August 14, 2007
    Date of Patent: October 9, 2012
    Assignee: Showa Denko K.K.
    Inventors: Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori, Katsumi Murofushi
  • Patent number: 8242217
    Abstract: It is an object of the present invention to provide an epoxy resin curing agent which has a favorable pot life and good storage stability as a curing agent for epoxy resins and from which an epoxy resin cured product having good water resistance and hardness is obtained through curing. The present invention is an epoxy resin curing agent containing a secondary or tertiary branched thiol compound having a substituent on a carbon atom at the ?-position to a thiol group, and is also an epoxy resin composition comprising a polyvalent epoxy compound and the epoxy resin curing agent.
    Type: Grant
    Filed: December 8, 2008
    Date of Patent: August 14, 2012
    Assignee: Showa Denko K.K.
    Inventors: Yoshifumi Urakawa, Hideo Miyata, Isao Yamagami, Katsumi Murofushi
  • Publication number: 20120010361
    Abstract: The present invention provides a curable composition having a proper viscosity and excellent handling properties, and a cured product that is obtainable by curing the curable composition and has excellent transparency, heat resistance and resistance to environment and a low Abbe's number, and further can effectively decrease chromatic aberration by the combined use with a material having a high Abbe's number. The curable composition is characterized by comprising (a) silica fine particles, (b) a (meth)acrylate compound having at least two ethylenic unsaturated groups and having no ring structure, (c) a (meth)acrylate compound having at least two ethylenic unsaturated groups and having an aromatic ring structure and (d) a polymerization initiator, wherein the silica particles (a) are surface treated by a specific silane compound (e) and a specific silane compound (f).
    Type: Application
    Filed: March 10, 2010
    Publication date: January 12, 2012
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoshifumi Urakawa, Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Saori Yamaki, Nobuaki Ishii
  • Patent number: 8053167
    Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.
    Type: Grant
    Filed: November 15, 2007
    Date of Patent: November 8, 2011
    Assignee: Showa Denko K.K.
    Inventors: Katsumi Murofushi, Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori
  • Publication number: 20110263779
    Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; R
    Type: Application
    Filed: December 10, 2009
    Publication date: October 27, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
  • Publication number: 20110227239
    Abstract: There is provided a method of molding which is capable of more highly precisely molding a molded article to be molded such as a lens than conventional technologies. A molded article such as a lens array and a mold for nanoimprinting is molded by repeating multiple times a transfer step including: a transformation step of bringing a light curable composition containing a compound having a polymerizable functional group and a polymerization initiator into contact with a transfer member 62 on which a transfer shape portion shaped equally to or reversely to an aspherical lens portion 312 is formed to transform the light curable composition to the transfer shape of the transfer member 62; a curing step of irradiating at least a transformed portion of the transformed light curable composition with light by a light irradiation unit 60 to cure the light curable composition; and a separation step of separating the cured light curable composition and the transfer member.
    Type: Application
    Filed: November 19, 2009
    Publication date: September 22, 2011
    Applicants: SHOWA DENKO K.K., AJI CO., LTD
    Inventors: Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Nobuaki Ishii, Katsumi Murofushi, Kunio Yoshida
  • Patent number: 7939695
    Abstract: The present invention provides an industrially advantageous process for preparing nucleus-halogenated methylbenzyl alcohol which is a useful substance as a raw material, an intermediate for manufacturing medicines, agricultural chemicals, etc. The process of the present invention for preparing nucleus-halogenated methylbenzyl alcohol represented by the following formula (II) includes hydrogenating nucleus-halogenated benzene dicarbaldehyde represented by the following formula (I); wherein m is an integer of 0 to 3, and n is an integer of 1 to 4, with the proviso that m+n is an integer of 1 to 4, wherein m and n are the same as those in the formula (I).
    Type: Grant
    Filed: June 12, 2006
    Date of Patent: May 10, 2011
    Assignee: Showa Denko K.K.
    Inventors: Haruhiko Ikeda, Hideo Miyata
  • Publication number: 20110098411
    Abstract: An object of the present invention is to provide a curable composition which has excellent handling properties and which is able to form a cured product excellent in transparency, heat resistance, environment resistance and molding processability. The curable composition of the present invention comprises (a) silica fine particles, (b) a (meth)acrylate having at least two ethylenic unsaturated groups and no ring structure, (c) a (meth)acrylate having an ethylenic unsaturated group and an alicyclic structure, and (d) a polymerization initiator, said silica fine particles (a) are surface-treated with a silane compound (e) represented by the following general formula (1) and a silane compound (f) represented by the following general formula (2).
    Type: Application
    Filed: June 30, 2009
    Publication date: April 28, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Nobuaki Ishii, katsumi Kurofushi
  • Patent number: 7888399
    Abstract: The present invention relates to a curable composition having high adhesiveness and transparency, comprising a thiol compound containing two or more groups represented by formula (1): wherein the symbols in the formula have the meanings as described in the specification; and an urethane compound containing an ethylenically unsaturated double bond represented by formula (2): wherein the symbols in the formula have the meanings as described in the specification.
    Type: Grant
    Filed: January 25, 2007
    Date of Patent: February 15, 2011
    Assignee: Showa Denko K.K.
    Inventors: Hideo Miyata, Katsuro Urakawa, Haruhiko Ikeda, Yotaro Hattori
  • Publication number: 20100273940
    Abstract: It is an object of the present invention to provide an epoxy resin curing agent which has a favorable pot life and good storage stability as a curing agent for epoxy resins and from which an epoxy resin cured product having good water resistance and hardness is obtained through curing. The present invention is an epoxy resin curing agent containing a secondary or tertiary branched thiol compound having a substituent on a carbon atom at the ?-position to a thiol group, and is also an epoxy resin composition comprising a polyvalent epoxy compound and the epoxy resin curing agent.
    Type: Application
    Filed: December 8, 2008
    Publication date: October 28, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoshifumi Urakawa, Hideo Miyata, Isao Yamagami, Katsumi Murofushi