Patents by Inventor Hideo Morishita

Hideo Morishita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200273665
    Abstract: Provided is a scanning electron microscope provided with an energy selection and detection function for a SE1 generated on a sample while suppressing the detection amount of a SE3 excited due to a BSE in the scanning electron microscope that does not apply a deceleration method.
    Type: Application
    Filed: September 29, 2017
    Publication date: August 27, 2020
    Inventors: Hideo MORISHITA, Toshihide AGEMURA
  • Publication number: 20200090903
    Abstract: A charged particle beam device includes: a charged particle source that emits a charged particle beam; a boosting electrode disposed between the charged particle source and a sample to form a path of the charged particle beam and to accelerate and decelerate the charged particle beam; a first pole piece that covers the boosting electrode; a second pole piece that covers the first pole piece; a first lens coil disposed outside the first pole piece and inside the second pole piece to form a first lens; a second lens coil disposed outside the second pole piece to form a second lens; and a control electrode formed between a distal end portion of the first pole piece and a distal end portion of the second pole piece to control an electric field formed between the sample and the distal end portion of the second pole piece.
    Type: Application
    Filed: March 29, 2017
    Publication date: March 19, 2020
    Inventors: Ryo HIRANO, Hideo MORISHITA, Toshihide AGEMURA, Junichi KATANE, Tsunenori NOMAGUCHI
  • Patent number: 10262830
    Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.
    Type: Grant
    Filed: November 26, 2014
    Date of Patent: April 16, 2019
    Assignee: HITACHI, LTD.
    Inventors: Daisuke Bizen, Hideo Morishita, Michio Hatano, Hiroya Ohta
  • Patent number: 10241062
    Abstract: The purpose of the present invention is to eliminate the effort in placement and extraction of samples in observations using transmitted charged particles. A charged particle beam device (601) is characterized by having: a charged particle optical lens tube that irradiates a sample (6) with a primary charged particle beam; a sample stage on which a light emitting member (500) that emits light because of charged particles that have come by transmission internally in the sample (6) or scattering therefrom or a sample platform (600) having the light emitting member (500) is attachably and detachably disposed; and a detector (503) that detects the light emitted by the light emitting member.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: March 26, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Mitsugu Sato, Kenko Uchida, Sadamitsu Aso, Taku Sakazume, Hideo Morishita, Sukehiro Ito, Takashi Ohshima
  • Patent number: 10014151
    Abstract: This composite charged particle beam device comprises a first charged particle beam column (6), a second charged particle beam column (1) which is equipped with a deceleration system, and is equipped with a detector (3) inside the column, a test piece stage (10) on which a test piece (9) is placed, and an electric field correction electrode (13) which is provided around the tip of the first charged particle beam column, wherein the electric field correction electrode is an electrode that corrects the electric field distribution formed in the vicinity of the test piece, and the electric field correction electrode is positioned between the test piece and the first charged particle beam column, and on the opposite side from the second charged particle beam column with respect to the optical axis of the first charged particle beam column.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: July 3, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yuta Imai, Hideo Morishita, Toshihide Agemura
  • Publication number: 20180025885
    Abstract: This composite charged particle beam device comprises a first charged particle beam column (6), a second charged particle beam column (1) which is equipped with a deceleration system, and is equipped with a detector (3) inside the column, a test piece stage (10) on which a test piece (9) is placed, and an electric field correction electrode (13) which is provided around the tip of the first charged particle beam column, wherein the electric field correction electrode is an electrode that corrects the electric field distribution formed in the vicinity of the test piece, and the electric field correction electrode is positioned between the test piece and the first charged particle beam column, and on the opposite side from the second charged particle beam column with respect to the optical axis of the first charged particle beam column.
    Type: Application
    Filed: February 4, 2016
    Publication date: January 25, 2018
    Inventors: Yuta IMAI, Hideo MORISHITA, Toshihide AGEMURA
  • Patent number: 9812288
    Abstract: The objective of the present invention is to simply perform image observation through transmitted charged particles. A sample irradiated by a charged particle beam is disposed directly or via a predetermined member on a light-emitting element (23) whereinto charged particles that have traversed or scattered inside the sample enter, causing a light to be emitted therefrom, which is collected and detected efficiently using a light transmission means (203) to generate a transmission charged particle image of the sample.
    Type: Grant
    Filed: January 9, 2015
    Date of Patent: November 7, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Minami Shouji, Takashi Ohshima, Yuusuke Oominami, Hideo Morishita, Kunio Harada
  • Publication number: 20170263415
    Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.
    Type: Application
    Filed: November 26, 2014
    Publication date: September 14, 2017
    Inventors: Daisuke BIZEN, Hideo MORISHITA, Michio HATANO, Hiroya OHTA
  • Publication number: 20170069458
    Abstract: The objective of the present invention is to simply perform image observation through transmitted charged particles. A sample irradiated by a charged particle beam is disposed directly or via a predetermined member on a light-emitting element (23) whereinto charged particles that have traversed or scattered inside the sample enter, causing a light to be emitted therefrom, which is collected and detected efficiently using a light transmission means (203) to generate a transmission charged particle image of the sample.
    Type: Application
    Filed: January 9, 2015
    Publication date: March 9, 2017
    Inventors: Minami SHOUJI, Takashi OHSHIMA, Yuusuke OOMINAMI, Hideo MORISHITA, Kunio HARADA
  • Patent number: 9570268
    Abstract: The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.
    Type: Grant
    Filed: April 14, 2014
    Date of Patent: February 14, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuta Imai, Takashi Ohshima, Hideo Morishita
  • Patent number: 9536703
    Abstract: This scanning electron microscope is provided with: a deceleration means that decelerates an electron beam (5) when the electron beam is passing through an objective lens; and a first detector (8) and a second detector (7) that are disposed between the electron beam and the objective lens and have a sensitive surface having an axially symmetric shape with respect to the optical axis of the electron beam. The first detector is provided at the sample side with respect to the second detector, and exclusively detects the signal electrons having a high energy that have passed through a retarding field energy filter (9A). When the distance between the tip (13) at the sample side of the objective lens and the sensitive surface of the first detector is L1 and the distance between the tip at the sample side of the objective lens and the sensitive surface of the second detector is L2, then L1/L2?5/9.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: January 3, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshihide Agemura, Hideo Morishita
  • Publication number: 20160148782
    Abstract: This scanning electron microscope is provided with: a deceleration means that decelerates an electron beam (5) when the electron beam is passing through an objective lens; and a first detector (8) and a second detector (7) that are disposed between the electron beam and the objective lens and have a sensitive surface having an axially symmetric shape with respect to the optical axis of the electron beam. The first detector is provided at the sample side with respect to the second detector, and exclusively detects the signal electrons having a high energy that have passed through a retarding field energy filter (9A). When the distance between the tip (13) at the sample side of the objective lens and the sensitive surface of the first detector is L1 and the distance between the tip at the sample side of the objective lens and the sensitive surface of the second detector is L2, then L1/L2?5/9.
    Type: Application
    Filed: July 11, 2014
    Publication date: May 26, 2016
    Inventors: Toshihide AGEMURA, Hideo MORISHITA
  • Publication number: 20160104597
    Abstract: The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.
    Type: Application
    Filed: April 14, 2014
    Publication date: April 14, 2016
    Inventors: Yuta IMAI, Takashi OHSHIMA, Hideo MORISHITA
  • Publication number: 20160025659
    Abstract: The purpose of the present invention is to eliminate the effort in placement and extraction of samples in observations using transmitted charged particles. A charged particle beam device (601) is characterized by having: a charged particle optical lens tube that irradiates a sample (6) with a primary charged particle beam; a sample stage on which a light emitting member (500) that emits light because of charged particles that have come by transmission internally in the sample (6) or scattering therefrom or a sample platform (600) having the light emitting member (500) is attachably and detachably disposed; and a detector (503) that detects the light emitted by the light emitting member.
    Type: Application
    Filed: January 22, 2014
    Publication date: January 28, 2016
    Inventors: Yusuke OMINAMI, Mitsugu SATO, Kenko UCHIDA, Sadamitsu ASO, Taku SAKAZUME, Hideo MORISHITA, Sukehiro ITO, Takashi OHSHIMA
  • Patent number: 9208994
    Abstract: The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2, 3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.
    Type: Grant
    Filed: July 7, 2011
    Date of Patent: December 8, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takashi Ohshima, Michio Hatano, Hideo Morishita
  • Patent number: 9029766
    Abstract: To provide a low acceleration scanning electron microscope that can discriminate and detect reflected electrons and secondary electrons even with a low probe current, this scanning electron microscope is provided with an electron gun (29), an aperture (26), a sample table (3), an electron optical system (4-1) for making an electron beam (31) converge on a sample (2), a deflection means (10), a secondary electron detector (8), a reflected electron detector (9), and a cylindrical electron transport means (5) in a position between the electron gun (29) and sample (2). The reflected electron detector (9) is provided within the electron transport means (5) and on a side further away from the electron gun (29) than the secondary electron detector (8) and the deflection means (10). The reception surface (9-1) of the reflected electron detector (9) is electrically wired so as to have the same potential as the electron transport means (5).
    Type: Grant
    Filed: May 28, 2012
    Date of Patent: May 12, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hideo Morishita, Takashi Ohshima, Michio Hatano, Sukehiro Ito
  • Publication number: 20140361167
    Abstract: To provide a low acceleration scanning electron microscope that can discriminate and detect reflected electrons and secondary electrons even with a low probe current, this scanning electron microscope is provided with an electron gun (29), an aperture (26), a sample table (3), an electron optical system (4-1) for making an electron beam (31) converge on a sample (2), a deflection means (10), a secondary electron detector (8), a reflected electron detector (9), and a cylindrical electron transport means (5) in a position between the electron gun (29) and sample (2). The reflected electron detector (9) is provided within the electron transport means (5) and on a side further away from the electron gun (29) than the secondary electron detector (8) and the deflection means (10). The reception surface (9-1) of the reflected electron detector (9) is electrically wired so as to have the same potential as the electron transport means (5).
    Type: Application
    Filed: May 28, 2012
    Publication date: December 11, 2014
    Inventors: Hideo Morishita, Takashi Ohshima, Micho Hatano, Sukehiro Ito
  • Patent number: 8629395
    Abstract: In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector.
    Type: Grant
    Filed: January 12, 2011
    Date of Patent: January 14, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hideo Morishita, Michio Hatano, Takashi Ohshima, Mitsugu Sato, Tetsuya Sawahata, Sukehiro Ito, Yasuko Aoki
  • Publication number: 20130146766
    Abstract: The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2,3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.
    Type: Application
    Filed: July 7, 2011
    Publication date: June 13, 2013
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Takashi Ohshima, Michio Hatano, Hideo Morishita
  • Publication number: 20120298864
    Abstract: In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector.
    Type: Application
    Filed: January 12, 2011
    Publication date: November 29, 2012
    Inventors: Hideo Morishita, Michio Hatano, Takashi Ohshima, Mitsugu Sato, Tetsuya Sawahata, Sukehiro Ito, Yasuko Aoki