Abstract: A display device with signal lines formed on a substrate and an organic insulation film which covers the signal lines and is formed over an upper layer side of the substrate, the display device further includes a terminal portion on which a conductive film is formed in a state that the conductive film covers portions of the signal lines which are exposed through openings formed in the organic insulation film, wherein the organic insulation film sets a film thickness thereof at a periphery of the terminal portion smaller than the film thickness at other portions, and a surface of small-film-thickness portion arranged in peripheries of the openings is formed into an uneven surface.

Abstract: An active matrix liquid crystal display device includes a plurality of gate signal lines and a plurality of drain signal lines formed on a substrate. The gate signal lines extend in parallel to one another, and the drain signal lines extend in parallel to one another, and a dummy line is formed between each of adjacent parallel extending drain signal lines.

Abstract: A display device is provided with a first contact hole formed in a display region and a second contact hole formed in a terminal region, and a first insulating layer and a second insulating layer formed in that order. The taper angle of the first insulating layer at the first contact hole is larger than the taper angle of the first insulating layer at the second contact hole, and the taper angle of the second insulating layer at the first contact hole is larger than the taper angle of the second insulating layer around the second contact hole.

Abstract: A display device is provided in which contact holes, each having a sidewall with an ideal tapered shape, are formed in a structure in which a silicon oxide film, a silicon nitride film and a silicon oxide film are stacked in the named order. The display device includes a first silicon oxide film, a silicon nitride film stacked on the first silicon oxide film, a second silicon oxide film stacked on the silicon nitride film, and a contact hole which extends through at least these three layers. In the display device, letting d2 and d3 denote, respectively, a film thickness of the silicon nitride film and a film thickness of the second silicon oxide film, these films are stacked to satisfy the relationship d2<d3, and the contact hole is formed to have a tapered shape free of constrictions.

Abstract: A display device with signal lines formed on a substrate and an organic insulation film which covers the signal lines and is formed over an upper layer side of the substrate, the display device further includes a terminal portion on which a conductive film is formed in a state that the conductive film covers portions of the signal lines which are exposed through openings formed in the organic insulation film, wherein the organic insulation film sets a film thickness thereof at a periphery of the terminal portion smaller than the film thickness at other portions, and a surface of small-film-thickness portion arranged in peripheries of the openings is formed into an uneven surface.

Abstract: A display device is provided with a first contact hole formed in a display region and a second contact hole formed in a terminal region, and a first insulating layer and a second insulating layer are formed in that order. The taper angle of the first insulating layer at the first contact hole is larger than the taper angle of the first insulating layer at the second contact hole, and the taper angle of the second insulating layer at the first contact hole is larger than the taper angle of the second insulating layer around the second contact hole.

Abstract: A display device in which contact holes each having a sidewall with an ideal tapered shape are formed in a structure in which a silicon oxide film, a silicon nitride film and a silicon oxide film are stacked in named order. The display device includes a first silicon oxide film, a silicon nitride film stacked on the first silicon oxide film, a second silicon oxide film stacked on the silicon nitride film, and a contact hole extended through at least three layers which include the first silicon oxide film, the silicon nitride film and the second silicon oxide film. In the display device, letting d2 and d3 denote, respectively, a film thickness of the silicon nitride film and a film thickness of the second silicon oxide film, these films are stacked to satisfy d2<d3 and the contact hole is formed to have a tapered shape free of constrictions.

Abstract: The present invention provides a liquid crystal display element substrate having spacers fixed in non-display regions on the liquid crystal display element substrate, where the load compression displacement of these spacers in terms of a compression stress of 0.5 to 0.6 GPa is from 0.001 to 1 &mgr;m/mN. Further, it provides a liquid crystal display device which is characterized in that, in a liquid crystal display device where a liquid crystal layer is held between two liquid crystal display element substrates, at least one of these liquid crystal display element substrates is an aforesaid liquid crystal display element substrate. As well as realizing a sufficient cell gap the present invention has the effect that, by maintaining a uniform cell gap within the screen, the problems of a lowering in the display quality due to change in the cell gap and the generation of bubbles at the time of low temperature are resolved.

Abstract: A contact lens disinfecting solution which does not include protease, wherein an organic nitrogen disinfectant and 0.01-5 w/v % of at least one polyol are contained in an aqueous medium.

Abstract: A photosensitive polyimide precursor composition containing as main ingredients a poly(amic acid) wherein at least one molecular end is esterified with an alcohol, a compound containing carbon-carbon unsaturation having photoreactivity, and a photopolymerization initiator.The photosensitive polyimide precursor composition of the present invention can be prepared without the formation of any harmful by-product. When film formed from this composition is masked for patterning and then subjected to exposure and development using a developer, the amount of exposed portion dissolved in the developer until unexposed portion is dissolved off by the developer, is small and so it is possible to obtain a thick pattern. Further, by heat-treating this pattern, there can be obtained a thick polyimide pattern.