Patents by Inventor Hidetaka Matsuuchi

Hidetaka Matsuuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8580086
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: November 12, 2013
    Assignee: Noxilizer, Inc.
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Publication number: 20130220793
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Application
    Filed: March 18, 2013
    Publication date: August 29, 2013
    Applicant: SAIAN CORPORATION
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Patent number: 8425852
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Grant
    Filed: March 3, 2010
    Date of Patent: April 23, 2013
    Assignee: Saian Corporation
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Patent number: 8128783
    Abstract: A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
    Type: Grant
    Filed: September 12, 2007
    Date of Patent: March 6, 2012
    Assignees: Amarante Technologies, Inc., Saian Corporation
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Masaaki Mike, Sang Hun Lee
  • Publication number: 20110286908
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Application
    Filed: March 3, 2010
    Publication date: November 24, 2011
    Applicant: SAIAN CORPORATION
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Patent number: 7976672
    Abstract: A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.
    Type: Grant
    Filed: February 13, 2007
    Date of Patent: July 12, 2011
    Assignee: Saian Corporation
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Hirofumi Hayashi, Masaaki Mike
  • Publication number: 20090200910
    Abstract: A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
    Type: Application
    Filed: September 12, 2007
    Publication date: August 13, 2009
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Masaaki Mike, Sang Hun Lee
  • Publication number: 20080053988
    Abstract: Disclosed is a plasma generation apparatus, which comprises a microwave generation section adapted to generate a microwave, a gas supply section adapted to supply a gas to be plasmatized, a plasma generation nozzle which is provided with an inner electrode adapted to receive the microwave and an outer electrode concentrically disposed outside the inner electrode, and adapted to plasmatize the gas supplied from the gas supply section thereinto, based on energy of the microwave, and emit the plasmatized gas from a distal end thereof; and an adapter attached to the distal end of the plasma generation nozzle.
    Type: Application
    Filed: August 27, 2007
    Publication date: March 6, 2008
    Applicant: NORITSU KOKI CO., LTD.
    Inventors: Kiyotaka Arai, Hirofumi Mankawa, Hidetaka Matsuuchi, Ryuichi Iwasaki, Kazuhiro Yoshida, Shigeru Masuda, Hirofumi Hayashi, Masaaki Mike
  • Publication number: 20070193517
    Abstract: A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.
    Type: Application
    Filed: February 13, 2007
    Publication date: August 23, 2007
    Applicant: NORITSU KOKI CO., LTD.
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Hirofumi Hayashi, Masaaki Mike