Patents by Inventor Hidetomo Fukuhara

Hidetomo Fukuhara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for plasma process
    Patent number: 4563240
    Abstract: The invention relates to a method and apparatus for a plasma process in which identical samples are processed in a plasma-processing apparatus provided with a radio-frequency plasma generation means and a microwave plasma generation means, by the utilization of a radio-frequency plasma in the radio-frequency plasma generation means and a microwave plasma in the microwave plasma generation means. The plasma-processing rate can thus be increased, and also electrical damage due to ions in the plasma can be reduced, thereby ensuring a high throughput and a high quality during the manufacture of semiconductor integrated circuit elements.
    Type: Grant
    Filed: August 2, 1984
    Date of Patent: January 7, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Fumio Shibata, Katsuaki Nagatomo, Hidetomo Fukuhara, Gen Marumoto, Sadayuki Okudaira