Abstract: A technique capable of stably releasing chips from a dicing tape, includes grinding a back surface of a semiconductor wafer, while adhering a pressure sensitive adhesive tape to a circuit forming surface of the semiconductor wafer formed with an integrated circuit, to achieve a predetermined thickness and forcibly oxidizing the back surface of the semiconductor wafer. Then, the pressure sensitive adhesive tape adhered to the circuit forming surface of the semiconductor wafer is released, and a dicing tape is adhered to the back surface of the semiconductor wafer. Further, the semiconductor wafer is divided by dicing it into individual chips, and then the back surface of the chip is pressed by way of the dicing tape, thereby releasing the chips from the dicing tape.

Abstract: A technique capable of stably releasing chips from a dicing tape, includes grinding a back surface of a semiconductor wafer, while adhering a pressure sensitive adhesive tape to a circuit forming surface of the semiconductor wafer formed with an integrated circuit, to achieve a predetermined thickness and forcibly oxidizing the back surface of the semiconductor wafer. Then, the pressure sensitive adhesive tape adhered to the circuit forming surface of the semiconductor wafer is released, and a dicing tape is adhered to the back surface of the semiconductor wafer. Further, the semiconductor wafer is divided by dicing it into individual chips, and then the back surface of the chip is pressed by way of the dicing tape, thereby releasing the chips from the dicing tape.

Abstract: A technique capable of stably releasing chips from a dicing tape, includes grinding a back surface of a semiconductor wafer, while adhering a pressure sensitive adhesive tape to a circuit forming surface of the semiconductor wafer formed with an integrated circuit, to achieve a predetermined thickness and forcibly oxidizing the back surface of the semiconductor wafer. Then, the pressure sensitive adhesive tape adhered to the circuit forming surface of the semiconductor wafer is released, and a dicing tape is adhered to the back surface of the semiconductor wafer. Further, the semiconductor wafer is divided by dicing it into individual chips, and then the back surface of the chip is pressed by way of the dicing tape, thereby releasing the chips from the dicing tape.

Abstract: Extremely thin chips laminated to a non-ultraviolet ray curing type adhesive tape are peeled from the tape without giving rise to cracks and chippings. In a center portion of a suction block used for peeling off a chip laminated to a dicing tape, three blocks which push the dicing tape upwardly are incorporated. With respect to these blocks, inside the first block having a largest diameter, there is a second block having a diameter smaller than the diameter of the first block. Further, inside the second block, there is a third block having the smallest diameter. To peel off a chip by pushing a back surface of the dicing tape with the blocks, first of all, the three blocks are simultaneously pushed upwardly by a certain amount and, thereafter, the intermediate block and the inner block are further pushed upward, and, finally, the inner block is further pushed upward.

Abstract: A technique capable of stably releasing chips from a dicing tape, includes grinding a back surface of a semiconductor wafer, while adhering a pressure sensitive adhesive tape to a circuit forming surface of the semiconductor wafer formed with an integrated circuit, to achieve a predetermined thickness and forcibly oxidizing the back surface of the semiconductor wafer. Then, the pressure sensitive adhesive tape adhered to the circuit forming surface of the semiconductor wafer is released, and a dicing tape is adhered to the back surface of the semiconductor wafer. Further, the semiconductor wafer is divided by dicing it into individual chips, and then the back surface of the chip is pressed by way of the dicing tape, thereby releasing the chips from the dicing tape.

Abstract: A thin semiconductor device which assures a high production yield. The semiconductor device includes: first and second semiconductor chips each of which has electrodes over its first surface; first leads electrically connected with the electrodes of the first semiconductor chip through first bonding wires; second leads electrically connected with the electrodes of the second semiconductor chip through second bonding wires; a die pad with first and second surfaces opposite each other where the first semiconductor chip's first surface is bonded to the first surface and the second semiconductor chip's first surface is bonded to the second surface; and a resin sealer which seals the first and second semiconductor chips, inner portions of the first and second leads, the first and second bonding wires, and the die pad. The inner portions of the first and second leads and the die pad lie at the same height level in a thickness direction of the resin sealer.

Abstract: Extremely thin chips laminated to a non-ultraviolet ray curing type adhesive tape are peeled from the tape without giving rise to cracks and chippings. In a center portion of a suction block used for peeling off a chip laminated to a dicing tape, three blocks which push the dicing tape upwardly are incorporated. With respect to these blocks, inside the first block having a largest diameter, there is a second block having a diameter smaller than the diameter of the first block. Further, inside the second block, there is a third block having the smallest diameter. To peel off a chip by pushing a back surface of the dicing tape with the blocks, first of all, the three blocks are simultaneously pushed upwardly by a certain amount and, thereafter, the intermediate block and the inner block are further pushed upward, and, finally, the inner block is further pushed upward.

Abstract: A system and method for two-sided etch of a semiconductor substrate. Reactive species are generated and flowed toward a substrate for processing. A diverter is positioned between the generation chamber and the substrate. A portion of the reactive species flows through the diverter for processing the front of the substrate. Another portion is diverted around the substrate to the backside for processing. A flow restricter is placed between the substrate and the exhaust system to increase the residence time of reactive species adjacent to the backside.