Abstract: A fuel filling device (18) for refueling a fuel tank (14) is disposed in the vicinity of an exhaust gas post-treatment device (10). Specifically, the fuel filling device (18) is disposed over a hydraulic pump (11) provided to an engine (9) and at a height position equivalent to the exhaust gas post-treatment device (10). Therefore, the fuel filling device (18) can be heated for a short period of time by the exhaust gas post-treatment device (10) which is exposed to high temperature soon after the start of the engine (9).

Abstract: A hydraulic oil tank (17) is supported by a tank support base (18) and a tank support base (19) at a position higher than that of an upper surface (8A) of a right side frame (8) . Also, a space portion (23) with an opening (23A) corresponding to an outer side in the right-and-left direction of an upper revolving structure (3) is provided between a hydraulic oil tank attachment site (9B) and a hydraulic oil tank attachment site (10B), and a bottom surface portion (17E) of the hydraulic oil tank (17). In addition, the opening (23A) of the space portion (23) is provided with an opening/closing cover (25D) openably closing the opening (23A).

Abstract: A fuel tank (16) for storing fuels is located between a right side frame (8) and a center frame (6) of a revolving frame (5) and is disposed on the center frame (6) side. Also, a hydraulic oil tank (19) for storing hydraulic oil is disposed adjacent to the fuel tank (16) in the right-and-left direction on the side of the right side frame (8) closer to an outer side in the right-and-left direction than the fuel tank (16). In addition, a top surface portion (19E) of the hydraulic oil tank (19) is disposed at a position higher than that of a top surface portion (16E) of the fuel tank (16).

Abstract: A method for producing a resin for a chemically amplified positive resist by polymerizing at least one monomer and/or at least one oligomer which is polymerized to provide a resin for a chemically amplified positive resist, in which two or more polymerization initiators are used to initiate the polymerization, thereby the resin is obtained at a high yield.

Abstract: A chemical amplifying type positive resist composition, excellent in balance of performance of resolution and sensitivity, having high dry etching resistance and comprising; a resin having a polymerization unit derived from a monomer represented by the following formula (I): wherein R1 and R2 independently represent hydrogen or an alkyl group having 1 to 4 carbons, and R3 represents hydrogen or a methyl group, the resin being insoluble in alkali itself but becoming alkali-soluble due to the action of an acid; and an acid generating agent is provided.

Abstract: A chemical amplification type positive resist composition is provided which gives resist patterns showing remarkably improved line edge roughness and comprises an acid generator containing a benzenesulfonate ion of the formula (I): 1

Abstract: A chemically amplified positive resist composition which is suitable for use in an exposure process utilizing an ArF excimer laser and is capable of forming a resist coat exhibiting a high hydrophillcity; is excellent in adhesion to a substrate and satisfactory in resist performance characteristics; and comprises a resin (X) which has a polymeric unit(a) derived from dihydroxy-1-adamantyl (meth)acrylate and a polymeric unit(b) derived from 2-alkyl-2-adamantyl (meth)acrylate, and which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali due to an action of acid; and an acid generating agent (Y).

Abstract: A chemically amplified positive resist composition excellent in adhesion to a substrate, as well as good in dry-etching resistance; suitable for use in excimer laser lithography utilizing ArF, KrF or the like; and comprising a resin (X) which, per se, is insoluble in alkali but becomes soluble in alkali when subjected to an action of acid, and has a polymeric unit represented by the formula(I), a polymeric unit represented by the formula(II) and a polymeric unit represented by the formula(III): and an acid generating agent (Y).

Abstract: A chemical amplifying type positive resist composition, excellent in balance of performance of resolution and sensitivity, having high dry etching resistance and comprising;

Abstract: A chemical amplifying type positive resist composition having resolution and sensitivity that are well balanced, undergoing a minimum of shrinkage due to the irradiation with electron rays of SEM, and comprising a resin that has a polymerization unit derived from an unsaturated monomer expressed by the following formula (1) and that itself is insoluble in an alkali but becomes alkali-soluble due to the action of an acid; and an acid generating agent: 1

Abstract: A chemical amplifying type positive resist composition is provided which is excellent in transmittance for the wavelength of F2 excimer light. Therefore, it is suitable for fine processing of a semiconductor using F2 excimer laser; and comprises an acid generating agent and a resin which contains a polymerization unit derived from an alicyclic hydrocarbon having a polymerizable carbon-carbon double bond in the ring and a polymerization unit derived from (meth)acrylonitrile, and which itself is insoluble or slightly soluble in an alkali but becomes alkali-soluble due to the action of an acid.

Abstract: An efficient process for producing a high quality 2-adamantyl (meth)acrylate of the formula (I): wherein R1 is hydrogen or methyl and R2 is hydrogen of lower alkyl, by using very common facilities and procedures, which reacting a (meth)acryloyl halide of the formula (II) wherein R1 is as defined above and X is halogen with a 2-adamantanol of the formula (III): wherein R2 is as defined above to form the 2-adamantyl (meth)acrylate of the formula (I), then treating a solution of this product in an organic solvent with active carbon, subsequently removing the active carbon, and thereafter separating a purified 2-adamantyl (meth)acrylate, is provided.

Abstract: A chemically amplified positive resist composition excellent in adhesion to a substrate, as well as good in dry-etching resistance;

Abstract: A chemically amplified positive resist composition which is suitable for use in an exposure process utilizing an ArF excimer laser and is capable of forming a resist coat exhibiting a high hydrophilicity; is excellent in adhesion to a substrate and satisfactory in resist performance characteristics; and comprises

Abstract: A chemical amplifying type positive resist composition, excellent in adhesion to a substrate and good in resist performances and suitable for exposure using a KrF excimer laser, ArF excimer laser, or the like, which comprises a resin having a polymerization unit of 2-alkyl-2-adamantyl (meth)acrylate and a polymerization unit of a monomer selected from 3-hydroxy-1-adamantyl (meth)acrylate and (meth)acrylonitrile, and an acid generator is provided.

Abstract: A 1-bromoalkylbenzene derivative is prepared by reacting a phenylalkene derivative with hydrogen bromide in the presence of a non-polar solvent. The phenylalkene derivative is prepared by reacting an alkenyl halide with metal magnesium to form a Grignard reagent, and then reacting the Grignard reagent with a benzyl halide derivative. An allyl Grignard reagent is prepared by reacting continuously an allyl halide derivative with metal magnesium in an organic solvent, in which the allyl halide derivative and metal magnesium are continuously added to the reaction system and the allyl Grignard reagent formed is continuously removed from the reaction system. The processes provide the intended compounds in high yields, high selectivities and high purities.

Abstract: A 1-bromoalkylbenzene derivative is prepared by reacting a phenylalkene derivative with hydrogen bromide in the presence of a non-polar solvent. The phenylalkene derivative is prepared by reacting an alkenyl halide with metal magnesium to form a Grignard reagent, and then reacting the Grignard reagent with a benzyl halide derivative. An allyl Grignard reagent is prepared by reacting continuously an allyl halide derivative with metal magnesium in an organic solvent, in which the allyl halide derivative and metal magnesium are continuously added to the reaction system and the allyl Grignard reagent formed is continuously removed from the reaction system. The processes provide the intended compounds in high yields, high selectivities and high purities.