Patents by Inventor Hiroaki Takahata
Hiroaki Takahata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11342579Abstract: The present invention aims to provide an all-solid-state lithium ion secondary battery having a high reliability which does not have a decrease in battery capacity due to absorption of moisture in the air. The all-solid-state lithium ion secondary battery is provided with a battery body having an electrolyte layer between a positive electrode layer and a negative electrode layer, a pair of terminal electrodes respectively connected to the positive electrode layer and the negative electrode layer at both end portions of the battery body, and a moisture-proof layer disposed on surfaces excluding the surfaces to be the terminal electrodes, wherein the moisture-proof layer contains a cured product of a composition containing a polymer compound and metal compound particles.Type: GrantFiled: March 28, 2018Date of Patent: May 24, 2022Assignee: TDK CORPORATIONInventors: Hiroaki Takahata, Hisaji Oyake, Masayuki Muroi, Tetsuya Ueno
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Publication number: 20200274194Abstract: The present invention aims to provide an all-solid-state lithium ion secondary battery having a high reliability which does not have a decrease in battery capacity due to absorption of moisture in the air. The all-solid-state lithium ion secondary battery is provided with a battery body having an electrolyte layer between a positive electrode layer and a negative electrode layer, a pair of terminal electrodes respectively connected to the positive electrode layer and the negative electrode layer at both end portions of the battery body, and a moisture-proof layer disposed on surfaces excluding the surfaces to be the terminal electrodes, wherein the moisture-proof layer contains a cured product of a composition containing a polymer compound and metal compound particles.Type: ApplicationFiled: March 28, 2018Publication date: August 27, 2020Applicant: TDK CORPORATIONInventors: Hiroaki TAKAHATA, Hisaji OYAKE, Masayuki MUROI, Tetsuya UENO
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Patent number: 8217117Abstract: An optical film having at least one layer formed of a polyolefin based resin composition containing 8 to 30 wt % of a component (A) defined below and 92 to 70 wt % of a component (B) defined below, with the proviso that the total of the component (A) and the component (B) is 100 wt %: component (A): an olefin based polymer with which neither a crystal fusion peak having a crystal fusion heat of 30 J/g or more nor a crystallization peak having a crystallization heat of 30 J/g or more to be observed in the range of ?50 to 200° C. is observed in a differential scanning calorimetry measurement according to JIS K 7122; and component (B): a propylene based polymer with which a crystal fusion peak having a crystal fusion heat larger than 30 J/g or a crystallization peak having a crystallization heat larger than 30 J/g to be observed in the range of ?50 to 200° C. is observed in a differential scanning calorimetry measurement according to JIS K 7122.Type: GrantFiled: September 18, 2008Date of Patent: July 10, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Kyoko Hino, Hiroaki Takahata, Ayako Yada
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Publication number: 20100283191Abstract: The process has a step of longitudinally stretching a thermoplastic resin film F by heating and floating the thermoplastic resin film F by blowing hot wind supplied from slit 20a of each nozzle 20, and simultaneously, rotating nip rolls 30A, 30B, 32A, 32B at different rotation rates. Each slit 20a of the nozzle 20 extends in the width direction of the thermoplastic resin film F. Provided that, with respect to each slit of each nozzle, the product of the wind velocity of hot wind blown from the slit A (m/s) and the width of the slit B (m) is represented by C (m2/s), and the sum total of the products C of all the slits provided in a single nozzle is represented by Q, Q of each nozzle is 3×10?2 m2/s or more and 1×10?1 m2/s or less; and the wind velocity A of the hot wind blown from each slit is 2 m/s or more and 15 m/s or less.Type: ApplicationFiled: September 18, 2008Publication date: November 11, 2010Applicant: Sumitomo Chemical Company, LimitedInventors: Hiroaki Takahata, Yoshinori Takahashi, Kyoko Hino
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Publication number: 20100283177Abstract: There is provided a process for producing a precursor film for a polypropylene-based resin retardation film that can yield films with almost no orientation and with high transparency. The process for producing a precursor film for a polypropylene-based resin retardation film comprises a step of pressing a molten sheet formed by extruding a molten polypropylene-based resin from a T-shaped die 12 at 180° C. or higher and 300° C. or lower between a cooling roll 16 having a surface temperature regulated to ?5° C. or higher and 30° C. or lower and a touch roll 14 having a surface temperature regulated to 80° C. or higher and 150° C. or lower, whereby the molten sheet is cooled and solidified.Type: ApplicationFiled: September 18, 2008Publication date: November 11, 2010Inventors: Hiroaki Takahata, Yoshinori Takahashi, Kyoko Hino, Yoshiaki Ishigami, Shuji Ozaki, Shuji Fujioka
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Publication number: 20100276826Abstract: A method for producing a retardation film by a tenter method, in which a thermoplastic resin film 20 is stretched in the width direction thereof while heating the film with hot air supplied from blowout ports of a plurality of nozzles 30, 32 provided on the upper and lower portions of an oven 100, having a preheating step of heating the thermoplastic resin film 20 with hot air; a stretching step of stretching the thermoplastic resin film 20 preheated while heating it with hot air to obtain a stretched film 22; and a heat setting step of heating the stretched film 22 with hot air, in which, in the preheating step, the stretching step and/or the heat setting step, an air blow velocity at the blowout port of hot air to be used is 2 to 12 m/second and air blow amount per nozzle is 0.1 to 1 m3/second per meter of the length of the nozzle along the width direction of the film.Type: ApplicationFiled: September 17, 2008Publication date: November 4, 2010Inventors: Hiroaki Takahata, Yoshinori Takahashi, Kyoko Hino
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Publication number: 20100258960Abstract: There is provided a process for producing an optical thermoplastic resin film that can yield films with almost no orientation and with high transparency. The process for producing an optical thermoplastic resin film comprises a molding step of discharging a molten thermoplastic resin from a T-shaped die, and thereby molding it into a film form, and a cooling step of cooling and solidifying the molten resin molded in a film form by pressing it with a metal cooling roll 16 and a touch roll 14 in which a rubber roll 14b are disposed inside a tubular metal belt 14a, whereby the molten resin is cooled and solidified. In the cooling step, the surface temperature Ti of the cooling roll 16 is set so as to satisfy the condition represented by the following formula (1), while the surface temperature T2 of the belt 14a is set so as to satisfy the condition represented by the following formula (2). Tg?30° C.?T1+50° C. ??(1) T1+10° C.?T2?T1+150° C.Type: ApplicationFiled: September 17, 2008Publication date: October 14, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hiroaki Takahata, Yoshinori Takahashi, Kyoko Hino, Yoshiaki Ishigami
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Publication number: 20100222517Abstract: An optical film having at least one layer formed of a polyolefin based resin composition containing 8 to 30 wt % of a component (A) defined below and 92 to 70 wt % of a component (B) defined below, with the proviso that the total of the component (A) and the component (B) is 100 wt %: component (A): an olefin based polymer with which neither a crystal fusion peak having a crystal fusion heat of 30 J/g or more nor a crystallization peak having a crystallization heat of 30 J/g or more to be observed in the range of ?50 to 200° C. is observed in a differential scanning calorimetry measurement according to JIS K 7122; and component (B): a propylene based polymer with which a crystal fusion peak having a crystal fusion heat larger than 30 J/g or a crystallization peak having a crystallization heat larger than 30 J/g to be observed in the range of ?50 to 200° C. is observed in a differential scanning calorimetry measurement according to JIS K 7122.Type: ApplicationFiled: September 18, 2008Publication date: September 2, 2010Applicant: Sumitomo Chemical Company, LimitedInventors: Kyoko Hino, Hiroaki Takahata, Ayako Yada
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Patent number: 7744969Abstract: The present invention provides a method for producing a retardation film of a polypropylene resin, the method comprising subjecting a film of a polypropylene resin to longitudinal stretching and transverse stretching which are performed sequentially, wherein the transverse stretching comprises the following steps, and a polypropylene resin retardation film which is obtained by such a method and has both a high axial retardation and a uniform retardation: a step of preheating the film at a preheating temperature which is equal to or higher than the melting point of the polypropylene resin; a step of stretching the preheated film in the transverse direction at a stretching temperature which is lower than the preheating temperature; and a step of heat setting the film stretched in the transverse direction.Type: GrantFiled: March 23, 2007Date of Patent: June 29, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata
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Publication number: 20100149470Abstract: Provided is a film that is made of a propylene-based copolymer selected from among propylene-based random copolymers and propylene-based block copolymers, the film being useful as a precursor film for the production of a retardation film by stretching. The propylene-based copolymer forming the film contains crystals containing smectic crystals, wherein the percentage of smectic crystals to all the crystals of the propylene-based copolymer. The film has an in-plane retardation of 50 nm or less and a thickness falling within the range of 30 to 200 ?m. The propylene-based copolymer is a copolymer that has a parameter (A) falling within the range of from 0.0007 to 0.1, the parameter (A) being calculated from Formula (1) defined for a stress-strain curve produced as a result of stretching a film made of the polymer at a tensile rate of 100 mm/minute at a temperature at which a stress of 0.8±0.Type: ApplicationFiled: September 25, 2007Publication date: June 17, 2010Inventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata, Takashi Sakurai
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Publication number: 20090227756Abstract: The present invention provides a method for producing a retardation film of a polypropylene resin, the method comprising subjecting a film of a polypropylene resin to longitudinal stretching and transverse stretching which are performed sequentially, wherein the transverse stretching comprises the following steps, and a polypropylene resin retardation film which is obtained by such a method and has both a high axial retardation and a uniform retardation: a step of preheating the film at a preheating temperature which is equal to or higher than the melting point of the polypropylene resin; a step of stretching the preheated film in the transverse direction at a stretching temperature which is lower than the preheating temperature; and a step of heat setting the film stretched in the transverse direction.Type: ApplicationFiled: March 23, 2007Publication date: September 10, 2009Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata
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Publication number: 20090100677Abstract: An imprinting method which is capable of forming desired concave/convex patterns on opposite surfaces of a substrate with high accuracy while making it possible to easily peel both stampers off the substrate after completion of a pressing process. As one stamper formed with one concave/convex pattern and the other stamper formed with the other concave/convex pattern for transferring the respective patterns to opposite surfaces of a substrate, there used are one stamper and the other stamper which have similar shapes in plan view and plane areas larger than that of the substrate. The one and the other stampers are pressed against opposite surfaces of the substrate, respectively, such that at least part of an outer periphery of one of the two stampers does not overlap the other in a direction of a thickness of the substrate.Type: ApplicationFiled: October 17, 2008Publication date: April 23, 2009Applicant: TDK CorporationInventors: Minoru FUJITA, Shigeki ISHIYAMA, Satoru KUROKAWA, Hiroaki TAKAHATA
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Patent number: 7365815Abstract: Disclosed is a phase retardation film including two outer layers facing each other, and an inner layer interposed between the outer layers, each of the outer layers are formed of a non-styrene polymeric material and the inner layer being formed of a polymeric material with a negative intrinsic birefringence, wherein the phase retardation film has a negative intrinsic birefringence and a Haze from 0% to 1%. A liquid crystal display device including the phase retardation film is also disclosed.Type: GrantFiled: June 10, 2005Date of Patent: April 29, 2008Assignee: Sumitomo Chemical Company, LimitedInventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata, Ryuma Kuroda
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Patent number: 7204188Abstract: A stamper with a sharp uneven pattern for manufacturing high precision information media and a method of manufacturing a stamper. The method includes (1) manufacturing a photoresist master by forming a light absorption layer and a photoresist layer on substrate, (2) forming a latent image on the photoresist layer, and an uneven pattern in the photoresist layer by developing the latent image, (3) forming a Ni thin film on the uneven pattern by electroless plating, (4) forming a Ni film on the Ni thin film, and (5) removing the Ni thin film and the Ni film from the photoresist master. The method also includes, prior to the step of forming the Ni thin film on the photoresist layer, a metal catalyst being provided on the surface of the uneven pattern, the metal catalyst being activated, and the surface of the uneven pattern being washed with ultra pure water.Type: GrantFiled: January 6, 2003Date of Patent: April 17, 2007Assignee: TDK CorporationInventors: Hisaji Oyake, Hiroaki Takahata, Kenji Yoneyama, Yuuichi Kawaguchi
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Publication number: 20050280758Abstract: Disclosed is a phase retardation film including two outer layers facing each other, and an inner layer interposed between the outer layers, each of the outer layers are formed of a non-styrene polymeric material and the inner layer being formed of a polymeric material with a negative intrinsic birefringence, wherein the phase retardation film has a negative intrinsic birefringence and a Haze from 0% to 1%. A liquid crystal display device including the phase retardation film is also disclosed.Type: ApplicationFiled: June 10, 2005Publication date: December 22, 2005Inventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata, Ryuma Kuroda
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Publication number: 20050232130Abstract: A stamper (36) used for fabricating an optical recording medium is fabricated by forming a convexo-concave pattern (22) without development of a photoresist layer (16). A fabrication method of the stamper used for fabricating an optical recording medium includes: forming a light-absorbing layer (14) and the photoresist layer (16) on a glass substrate (10); forming the convexo-concave pattern (22) of undeveloped photoresist by irradiating the photoresist layer (16) with laser light from a surface of the photoresist layer that is opposite to the light-absorbing layer (14) so as to remove a part of the photoresist layer by energy of the laser light, thereby fabricating a photoresist master (26); forming a metal thin layer (28) on the convexo-concave pattern (22) in the photoresist master (26); forming a metal layer (30) on the metal thin layer (28) by electro-plating; and forming the stamper (36) by separating the metal thin layer (28) and the metal layer (30) from the photoresist master (26).Type: ApplicationFiled: May 30, 2003Publication date: October 20, 2005Applicant: TDK CORPORATIONInventors: Hisaji Oyake, Hiroaki Takahata, Kenji Shirasuna
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Publication number: 20050118534Abstract: A stamper with a sharp uneven pattern is obtained, and high precision information media can be manufactured using this stamper. A photoresist master 100 is manufactured by forming a light absorption layer 103 with a film thickness T that satisfies T>180 (nm) and a photoresist layer 104, in that order, on top of a substrate 102, and then forming an uneven pattern 106 in the photoresist layer 104 by forming and developing a latent image, and a stamper 120 is manufactured by forming a Ni thin film 108 on top of the uneven pattern 106 of the photoresist master 100 by electroless plating, forming a Ni film 110 on top of this Ni thin film 108 by electroforming, and then separating the Ni thin film 108 and the Ni film 110 from the photoresist master 100.Type: ApplicationFiled: January 6, 2003Publication date: June 2, 2005Inventors: Hisaji Oyake, Hiroaki Takahata, Kenji Yoneyama, Yuuichi Kawaguchi
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Patent number: 6885415Abstract: An optical member comprising a polymer which is amorphous and has a glass transition temperature of not lower than 110° C. and optical property parameters O?R(?)) and O?G(?) that satisfy the following inequality (1), |O?G(?)|<?0.75×|O?R(?)|+0.017??(1), is superior in its heat resistance and transparency and high in its stability of optical properties. Therefore, the optical member can be used as, for example, a constituent of optical systems in a liquid crystal display, thereby suppressing change in a display color tone depending on variation of using circumstances of the liquid crystal display.Type: GrantFiled: May 9, 2002Date of Patent: April 26, 2005Assignee: Sumitomo Chemical Company, LimitedInventors: Ryuma Kuroda, Hiroaki Takahata, Nobuo Oi, Kaori Tsubouchi, Kyoko Hino
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Publication number: 20050066825Abstract: A stamper with a sharp protrusion/depression pattern is obtained, and high precision information media can be produced using this stamper. A method of manufacturing a stamper comprises the steps of manufacturing a photoresist master 100 by laminating a light absorption layer 103 and a photoresist layer 104 on top of a substrate 102, and then forming an protrusion/depression pattern 106 in the photoresist layer 104 by forming and developing a latent image, providing Pd on the surface of the protrusion/depression pattern 106 as a preliminary treatment to conducting electroless plating onto the protrusion/depression pattern of the photoresist master 100, and forming a stamper 120 by forming a thin metal film 108 on top of the Pd-containing protrusion/depression pattern surface by using electroless plating, forming a Ni film 110 on top of this Ni thin film 108 using electroforming, and then removing the thin metal film 108 and the Ni film 110.Type: ApplicationFiled: December 27, 2002Publication date: March 31, 2005Inventors: Hisaji Oyake, Hiroaki Takahata, Hitoshi Arai, Hajime Utsunomiya
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Publication number: 20050042427Abstract: A stamper with a sharp uneven pattern and a favorable surface state is obtained. A photoresist master 100 is manufactured by forming a light absorption layer 103 and a photoresist layer 104, in that order, on top of a substrate 102, and then forming an uneven pattern 106 in the photoresist layer 104 by forming and developing a latent image, a Ni thin film 108 is formed on top of the uneven pattern 106 of the photoresist master 100 using either a sputtering method or a vapor deposition method, a Ni film 110 is formed on top of the Ni thin film 108, and then the Ni thin film 108 and the Ni film 110 are separated from the photoresist master 100 to form a stamper 120.Type: ApplicationFiled: January 6, 2003Publication date: February 24, 2005Applicant: tdk corp.Inventors: Hisaji Oyake, Hiroaki Takahata, Hajime Utsunomiya