Patents by Inventor Hiroaki Takahata

Hiroaki Takahata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11342579
    Abstract: The present invention aims to provide an all-solid-state lithium ion secondary battery having a high reliability which does not have a decrease in battery capacity due to absorption of moisture in the air. The all-solid-state lithium ion secondary battery is provided with a battery body having an electrolyte layer between a positive electrode layer and a negative electrode layer, a pair of terminal electrodes respectively connected to the positive electrode layer and the negative electrode layer at both end portions of the battery body, and a moisture-proof layer disposed on surfaces excluding the surfaces to be the terminal electrodes, wherein the moisture-proof layer contains a cured product of a composition containing a polymer compound and metal compound particles.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: May 24, 2022
    Assignee: TDK CORPORATION
    Inventors: Hiroaki Takahata, Hisaji Oyake, Masayuki Muroi, Tetsuya Ueno
  • Publication number: 20200274194
    Abstract: The present invention aims to provide an all-solid-state lithium ion secondary battery having a high reliability which does not have a decrease in battery capacity due to absorption of moisture in the air. The all-solid-state lithium ion secondary battery is provided with a battery body having an electrolyte layer between a positive electrode layer and a negative electrode layer, a pair of terminal electrodes respectively connected to the positive electrode layer and the negative electrode layer at both end portions of the battery body, and a moisture-proof layer disposed on surfaces excluding the surfaces to be the terminal electrodes, wherein the moisture-proof layer contains a cured product of a composition containing a polymer compound and metal compound particles.
    Type: Application
    Filed: March 28, 2018
    Publication date: August 27, 2020
    Applicant: TDK CORPORATION
    Inventors: Hiroaki TAKAHATA, Hisaji OYAKE, Masayuki MUROI, Tetsuya UENO
  • Patent number: 8217117
    Abstract: An optical film having at least one layer formed of a polyolefin based resin composition containing 8 to 30 wt % of a component (A) defined below and 92 to 70 wt % of a component (B) defined below, with the proviso that the total of the component (A) and the component (B) is 100 wt %: component (A): an olefin based polymer with which neither a crystal fusion peak having a crystal fusion heat of 30 J/g or more nor a crystallization peak having a crystallization heat of 30 J/g or more to be observed in the range of ?50 to 200° C. is observed in a differential scanning calorimetry measurement according to JIS K 7122; and component (B): a propylene based polymer with which a crystal fusion peak having a crystal fusion heat larger than 30 J/g or a crystallization peak having a crystallization heat larger than 30 J/g to be observed in the range of ?50 to 200° C. is observed in a differential scanning calorimetry measurement according to JIS K 7122.
    Type: Grant
    Filed: September 18, 2008
    Date of Patent: July 10, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kyoko Hino, Hiroaki Takahata, Ayako Yada
  • Publication number: 20100283191
    Abstract: The process has a step of longitudinally stretching a thermoplastic resin film F by heating and floating the thermoplastic resin film F by blowing hot wind supplied from slit 20a of each nozzle 20, and simultaneously, rotating nip rolls 30A, 30B, 32A, 32B at different rotation rates. Each slit 20a of the nozzle 20 extends in the width direction of the thermoplastic resin film F. Provided that, with respect to each slit of each nozzle, the product of the wind velocity of hot wind blown from the slit A (m/s) and the width of the slit B (m) is represented by C (m2/s), and the sum total of the products C of all the slits provided in a single nozzle is represented by Q, Q of each nozzle is 3×10?2 m2/s or more and 1×10?1 m2/s or less; and the wind velocity A of the hot wind blown from each slit is 2 m/s or more and 15 m/s or less.
    Type: Application
    Filed: September 18, 2008
    Publication date: November 11, 2010
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Hiroaki Takahata, Yoshinori Takahashi, Kyoko Hino
  • Publication number: 20100283177
    Abstract: There is provided a process for producing a precursor film for a polypropylene-based resin retardation film that can yield films with almost no orientation and with high transparency. The process for producing a precursor film for a polypropylene-based resin retardation film comprises a step of pressing a molten sheet formed by extruding a molten polypropylene-based resin from a T-shaped die 12 at 180° C. or higher and 300° C. or lower between a cooling roll 16 having a surface temperature regulated to ?5° C. or higher and 30° C. or lower and a touch roll 14 having a surface temperature regulated to 80° C. or higher and 150° C. or lower, whereby the molten sheet is cooled and solidified.
    Type: Application
    Filed: September 18, 2008
    Publication date: November 11, 2010
    Inventors: Hiroaki Takahata, Yoshinori Takahashi, Kyoko Hino, Yoshiaki Ishigami, Shuji Ozaki, Shuji Fujioka
  • Publication number: 20100276826
    Abstract: A method for producing a retardation film by a tenter method, in which a thermoplastic resin film 20 is stretched in the width direction thereof while heating the film with hot air supplied from blowout ports of a plurality of nozzles 30, 32 provided on the upper and lower portions of an oven 100, having a preheating step of heating the thermoplastic resin film 20 with hot air; a stretching step of stretching the thermoplastic resin film 20 preheated while heating it with hot air to obtain a stretched film 22; and a heat setting step of heating the stretched film 22 with hot air, in which, in the preheating step, the stretching step and/or the heat setting step, an air blow velocity at the blowout port of hot air to be used is 2 to 12 m/second and air blow amount per nozzle is 0.1 to 1 m3/second per meter of the length of the nozzle along the width direction of the film.
    Type: Application
    Filed: September 17, 2008
    Publication date: November 4, 2010
    Inventors: Hiroaki Takahata, Yoshinori Takahashi, Kyoko Hino
  • Publication number: 20100258960
    Abstract: There is provided a process for producing an optical thermoplastic resin film that can yield films with almost no orientation and with high transparency. The process for producing an optical thermoplastic resin film comprises a molding step of discharging a molten thermoplastic resin from a T-shaped die, and thereby molding it into a film form, and a cooling step of cooling and solidifying the molten resin molded in a film form by pressing it with a metal cooling roll 16 and a touch roll 14 in which a rubber roll 14b are disposed inside a tubular metal belt 14a, whereby the molten resin is cooled and solidified. In the cooling step, the surface temperature Ti of the cooling roll 16 is set so as to satisfy the condition represented by the following formula (1), while the surface temperature T2 of the belt 14a is set so as to satisfy the condition represented by the following formula (2). Tg?30° C.?T1+50° C. ??(1) T1+10° C.?T2?T1+150° C.
    Type: Application
    Filed: September 17, 2008
    Publication date: October 14, 2010
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hiroaki Takahata, Yoshinori Takahashi, Kyoko Hino, Yoshiaki Ishigami
  • Publication number: 20100222517
    Abstract: An optical film having at least one layer formed of a polyolefin based resin composition containing 8 to 30 wt % of a component (A) defined below and 92 to 70 wt % of a component (B) defined below, with the proviso that the total of the component (A) and the component (B) is 100 wt %: component (A): an olefin based polymer with which neither a crystal fusion peak having a crystal fusion heat of 30 J/g or more nor a crystallization peak having a crystallization heat of 30 J/g or more to be observed in the range of ?50 to 200° C. is observed in a differential scanning calorimetry measurement according to JIS K 7122; and component (B): a propylene based polymer with which a crystal fusion peak having a crystal fusion heat larger than 30 J/g or a crystallization peak having a crystallization heat larger than 30 J/g to be observed in the range of ?50 to 200° C. is observed in a differential scanning calorimetry measurement according to JIS K 7122.
    Type: Application
    Filed: September 18, 2008
    Publication date: September 2, 2010
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Kyoko Hino, Hiroaki Takahata, Ayako Yada
  • Patent number: 7744969
    Abstract: The present invention provides a method for producing a retardation film of a polypropylene resin, the method comprising subjecting a film of a polypropylene resin to longitudinal stretching and transverse stretching which are performed sequentially, wherein the transverse stretching comprises the following steps, and a polypropylene resin retardation film which is obtained by such a method and has both a high axial retardation and a uniform retardation: a step of preheating the film at a preheating temperature which is equal to or higher than the melting point of the polypropylene resin; a step of stretching the preheated film in the transverse direction at a stretching temperature which is lower than the preheating temperature; and a step of heat setting the film stretched in the transverse direction.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: June 29, 2010
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata
  • Publication number: 20100149470
    Abstract: Provided is a film that is made of a propylene-based copolymer selected from among propylene-based random copolymers and propylene-based block copolymers, the film being useful as a precursor film for the production of a retardation film by stretching. The propylene-based copolymer forming the film contains crystals containing smectic crystals, wherein the percentage of smectic crystals to all the crystals of the propylene-based copolymer. The film has an in-plane retardation of 50 nm or less and a thickness falling within the range of 30 to 200 ?m. The propylene-based copolymer is a copolymer that has a parameter (A) falling within the range of from 0.0007 to 0.1, the parameter (A) being calculated from Formula (1) defined for a stress-strain curve produced as a result of stretching a film made of the polymer at a tensile rate of 100 mm/minute at a temperature at which a stress of 0.8±0.
    Type: Application
    Filed: September 25, 2007
    Publication date: June 17, 2010
    Inventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata, Takashi Sakurai
  • Publication number: 20090227756
    Abstract: The present invention provides a method for producing a retardation film of a polypropylene resin, the method comprising subjecting a film of a polypropylene resin to longitudinal stretching and transverse stretching which are performed sequentially, wherein the transverse stretching comprises the following steps, and a polypropylene resin retardation film which is obtained by such a method and has both a high axial retardation and a uniform retardation: a step of preheating the film at a preheating temperature which is equal to or higher than the melting point of the polypropylene resin; a step of stretching the preheated film in the transverse direction at a stretching temperature which is lower than the preheating temperature; and a step of heat setting the film stretched in the transverse direction.
    Type: Application
    Filed: March 23, 2007
    Publication date: September 10, 2009
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata
  • Publication number: 20090100677
    Abstract: An imprinting method which is capable of forming desired concave/convex patterns on opposite surfaces of a substrate with high accuracy while making it possible to easily peel both stampers off the substrate after completion of a pressing process. As one stamper formed with one concave/convex pattern and the other stamper formed with the other concave/convex pattern for transferring the respective patterns to opposite surfaces of a substrate, there used are one stamper and the other stamper which have similar shapes in plan view and plane areas larger than that of the substrate. The one and the other stampers are pressed against opposite surfaces of the substrate, respectively, such that at least part of an outer periphery of one of the two stampers does not overlap the other in a direction of a thickness of the substrate.
    Type: Application
    Filed: October 17, 2008
    Publication date: April 23, 2009
    Applicant: TDK Corporation
    Inventors: Minoru FUJITA, Shigeki ISHIYAMA, Satoru KUROKAWA, Hiroaki TAKAHATA
  • Patent number: 7365815
    Abstract: Disclosed is a phase retardation film including two outer layers facing each other, and an inner layer interposed between the outer layers, each of the outer layers are formed of a non-styrene polymeric material and the inner layer being formed of a polymeric material with a negative intrinsic birefringence, wherein the phase retardation film has a negative intrinsic birefringence and a Haze from 0% to 1%. A liquid crystal display device including the phase retardation film is also disclosed.
    Type: Grant
    Filed: June 10, 2005
    Date of Patent: April 29, 2008
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata, Ryuma Kuroda
  • Patent number: 7204188
    Abstract: A stamper with a sharp uneven pattern for manufacturing high precision information media and a method of manufacturing a stamper. The method includes (1) manufacturing a photoresist master by forming a light absorption layer and a photoresist layer on substrate, (2) forming a latent image on the photoresist layer, and an uneven pattern in the photoresist layer by developing the latent image, (3) forming a Ni thin film on the uneven pattern by electroless plating, (4) forming a Ni film on the Ni thin film, and (5) removing the Ni thin film and the Ni film from the photoresist master. The method also includes, prior to the step of forming the Ni thin film on the photoresist layer, a metal catalyst being provided on the surface of the uneven pattern, the metal catalyst being activated, and the surface of the uneven pattern being washed with ultra pure water.
    Type: Grant
    Filed: January 6, 2003
    Date of Patent: April 17, 2007
    Assignee: TDK Corporation
    Inventors: Hisaji Oyake, Hiroaki Takahata, Kenji Yoneyama, Yuuichi Kawaguchi
  • Publication number: 20050280758
    Abstract: Disclosed is a phase retardation film including two outer layers facing each other, and an inner layer interposed between the outer layers, each of the outer layers are formed of a non-styrene polymeric material and the inner layer being formed of a polymeric material with a negative intrinsic birefringence, wherein the phase retardation film has a negative intrinsic birefringence and a Haze from 0% to 1%. A liquid crystal display device including the phase retardation film is also disclosed.
    Type: Application
    Filed: June 10, 2005
    Publication date: December 22, 2005
    Inventors: Kyoko Hino, Toshihiko Suzuki, Hiroaki Takahata, Ryuma Kuroda
  • Publication number: 20050232130
    Abstract: A stamper (36) used for fabricating an optical recording medium is fabricated by forming a convexo-concave pattern (22) without development of a photoresist layer (16). A fabrication method of the stamper used for fabricating an optical recording medium includes: forming a light-absorbing layer (14) and the photoresist layer (16) on a glass substrate (10); forming the convexo-concave pattern (22) of undeveloped photoresist by irradiating the photoresist layer (16) with laser light from a surface of the photoresist layer that is opposite to the light-absorbing layer (14) so as to remove a part of the photoresist layer by energy of the laser light, thereby fabricating a photoresist master (26); forming a metal thin layer (28) on the convexo-concave pattern (22) in the photoresist master (26); forming a metal layer (30) on the metal thin layer (28) by electro-plating; and forming the stamper (36) by separating the metal thin layer (28) and the metal layer (30) from the photoresist master (26).
    Type: Application
    Filed: May 30, 2003
    Publication date: October 20, 2005
    Applicant: TDK CORPORATION
    Inventors: Hisaji Oyake, Hiroaki Takahata, Kenji Shirasuna
  • Publication number: 20050118534
    Abstract: A stamper with a sharp uneven pattern is obtained, and high precision information media can be manufactured using this stamper. A photoresist master 100 is manufactured by forming a light absorption layer 103 with a film thickness T that satisfies T>180 (nm) and a photoresist layer 104, in that order, on top of a substrate 102, and then forming an uneven pattern 106 in the photoresist layer 104 by forming and developing a latent image, and a stamper 120 is manufactured by forming a Ni thin film 108 on top of the uneven pattern 106 of the photoresist master 100 by electroless plating, forming a Ni film 110 on top of this Ni thin film 108 by electroforming, and then separating the Ni thin film 108 and the Ni film 110 from the photoresist master 100.
    Type: Application
    Filed: January 6, 2003
    Publication date: June 2, 2005
    Inventors: Hisaji Oyake, Hiroaki Takahata, Kenji Yoneyama, Yuuichi Kawaguchi
  • Patent number: 6885415
    Abstract: An optical member comprising a polymer which is amorphous and has a glass transition temperature of not lower than 110° C. and optical property parameters O?R(?)) and O?G(?) that satisfy the following inequality (1), |O?G(?)|<?0.75×|O?R(?)|+0.017??(1), is superior in its heat resistance and transparency and high in its stability of optical properties. Therefore, the optical member can be used as, for example, a constituent of optical systems in a liquid crystal display, thereby suppressing change in a display color tone depending on variation of using circumstances of the liquid crystal display.
    Type: Grant
    Filed: May 9, 2002
    Date of Patent: April 26, 2005
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ryuma Kuroda, Hiroaki Takahata, Nobuo Oi, Kaori Tsubouchi, Kyoko Hino
  • Publication number: 20050066825
    Abstract: A stamper with a sharp protrusion/depression pattern is obtained, and high precision information media can be produced using this stamper. A method of manufacturing a stamper comprises the steps of manufacturing a photoresist master 100 by laminating a light absorption layer 103 and a photoresist layer 104 on top of a substrate 102, and then forming an protrusion/depression pattern 106 in the photoresist layer 104 by forming and developing a latent image, providing Pd on the surface of the protrusion/depression pattern 106 as a preliminary treatment to conducting electroless plating onto the protrusion/depression pattern of the photoresist master 100, and forming a stamper 120 by forming a thin metal film 108 on top of the Pd-containing protrusion/depression pattern surface by using electroless plating, forming a Ni film 110 on top of this Ni thin film 108 using electroforming, and then removing the thin metal film 108 and the Ni film 110.
    Type: Application
    Filed: December 27, 2002
    Publication date: March 31, 2005
    Inventors: Hisaji Oyake, Hiroaki Takahata, Hitoshi Arai, Hajime Utsunomiya
  • Publication number: 20050042427
    Abstract: A stamper with a sharp uneven pattern and a favorable surface state is obtained. A photoresist master 100 is manufactured by forming a light absorption layer 103 and a photoresist layer 104, in that order, on top of a substrate 102, and then forming an uneven pattern 106 in the photoresist layer 104 by forming and developing a latent image, a Ni thin film 108 is formed on top of the uneven pattern 106 of the photoresist master 100 using either a sputtering method or a vapor deposition method, a Ni film 110 is formed on top of the Ni thin film 108, and then the Ni thin film 108 and the Ni film 110 are separated from the photoresist master 100 to form a stamper 120.
    Type: Application
    Filed: January 6, 2003
    Publication date: February 24, 2005
    Applicant: tdk corp.
    Inventors: Hisaji Oyake, Hiroaki Takahata, Hajime Utsunomiya