Abstract: An X-ray imaging system is configured to acquire first and second images from a teacher X-ray image including an inspection target. Discrimination information to discriminate at least one of an area of the inspection target in the first and second images, and an area of a defect part is acquired. Machine learning for producing a learned model is performed by using input teacher data sets based on the first and second images, and output teacher data sets based on the discrimination information.

Abstract: In an X-ray imaging, first and second images of X-ray images corresponding to different emission angles are generated. In the X-ray imaging system, based on positions of a target part included in an inspection target in the first and second images, and an angle difference between the emission angles of X-rays that are emitted to generate the first and second images, a three-dimensional position of the target part is calculated by using triangulation.

Abstract: A data analysis method includes a storage step of storing a plurality of learning algorithm groups each including a type of measurement data, a type of analysis of the measurement data, and a learning algorithm associated with each other, a learning algorithm selection step of selecting the learning algorithm based on input information, and a trained model generation step of generating a trained model based on training data and the learning algorithm.

Abstract: A data analysis apparatus includes a control unit that performs control of receiving an operation to select analysis data, control of receiving an operation to select a plurality of scripts that execute analysis on the selected analysis data, and control of executing analysis on the selected analysis data by the plurality of selected scripts in parallel. The data analysis apparatus also includes a display unit configured to display analysis results of the analysis data by the control unit on the same screen.

Abstract: A migration system of a learning model for cell image analysis is a system that migrates a learning model from a first learning device to a second learning device, in which the second learning device includes an algorithm consistency determination unit that determines, based on second algorithm specification information and first algorithm specification information, whether or not consistency is established between a first algorithm and a second algorithm, and a learning model parameter setting unit that sets a first parameter to be used together with the second algorithm.

Abstract: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

Abstract: A leak check method for a laser device includes exposing a closed space accommodating laser medium gas to the atmosphere, isolating the closed space from the atmosphere after exposing the closed space to the atmosphere, introducing neon-containing gas containing neon gas to the closed space, and determining whether or not the neon gas is leaking to outside of the closed space.

Abstract: Provided is a stress measurement device capable of easily grasping the behavior of a stress generation site in a sample. The stress measurement device is provided with a camera for imaging light emitted by a stress luminescent material, a controller for processing an image captured by the camera, and a display for displaying the image processed by the controller. The controller detects the stress generation site according to a luminescence distribution of the stress luminescent material for each of the plurality of time-series images captured by the camera and controls the display such that each stress generation site detected for each of the plurality of images is displayed on one image in a superimposed manner in mutually different display modes.

Abstract: A stress luminescence measurement device according to a first aspect is provided with a load application mechanism configured to deform a sample by applying a load to the sample, a light source configured to emit excitation light to a stress luminescent material 2 arranged on a surface of the sample, a camera configured to image luminescence of the stress luminescent material, and a controller configured to control the load application mechanism, the light source, and the camera. The controller acquires a deformation state of the sample at the imaging timing by the camera and stores the acquired deformation state of the sample in association with the image captured by the camera in a memory.

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

Abstract: A gas purification system may include: a circulation gas pipe in which a second end is connected at a first position to a second pipe through which gas is supplied from a gas supply source; a booster pump; a gas purification unit; a first tank in the circulation gas pipe; a first valve positioned between the gas supply source and the first position, the first valve having an open position and a closed position; and a second valve positioned between the first tank and the second end, the second valve having an open position and a closed position, the second valve configured to be in the closed position when the first valve is in the open position.

Abstract: A laser chamber may include a first discharge electrode, a second discharge electrode, a fan making a laser gas flow through a discharge space between the first and second discharge electrodes, a first insulating member disposed on upstream side and downstream side of the first discharge electrode in the laser gas flow, a first metal damper member disposed on upstream side of the second discharge electrode and a second insulating member disposed on downstream side of the second discharge electrode in the laser gas flow, and a second metal damper member disposed on downstream side of the second insulating member in the laser gas flow. In a boundary portion between the second metal damper member and the second insulating member, a first discharge space side surface of the second metal damper member may be located further toward the opposite side to the discharge space than a second discharge space side surface of the second insulating member.

Abstract: A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas.

Abstract: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

Abstract: A laser gas management system includes a gas regeneration apparatus connected to a plurality of excimer laser apparatuses and configured to regenerate a laser gas discharged from the plurality of excimer laser apparatuses into a regenerated gas and supply the plurality of excimer laser apparatuses with the regenerated gas and a controller configured to evaluate whether or not at least one parameter of any of the plurality of excimer laser apparatuses has exceeded a range determined in advance and determine that abnormality has occurred in the gas regeneration apparatus when the at least one parameter has exceeded the range determined in advance in two or more of the excimer laser apparatuses.

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.

Abstract: A polymeric piezoelectric film, including a helical chiral polymer (A) having a weight average molecular weight of from 50,000 to 1,000,000 and optical activity, in which, in the film: a crystallinity given by a DSC method is from 20% to 80%; a standardized molecular orientation MORc is from 3.5 to 15.0 when a reference thickness measured by a microwave transmission-type molecular orientation meter is 50 ?m; and when a direction parallel to a phase difference streak is a direction X, a direction perpendicular to the direction X and parallel to a main plane of a film is a direction Y, and the phase difference streak is evaluated by an evaluation method A, per a length of 1,000 mm in the direction Y, a number of phase difference streaks with an evaluation value of 60 or more is 0, and a sum of the evaluation values of phase difference streaks with an evaluation value of 20 or more is 1000 or less.

Abstract: A gas supply system may include a first gas supply line, a second gas supply line, a circulation gas pipe, a gas purification unit, a first valve, and a second valve. The first gas supply line may include a first branching point at which the first gas supply line branches into a first branch connected to a first chamber and a second branch connected to a second chamber and the second gas supply line may include a second branching point at which the second gas supply line branches into a third branch connected to the first chamber and a fourth branch connected to the second chamber. A first portion of the first gas supply line upstream from the first branching point and a second portion of the second gas supply line upstream from the second branching point may be constituted by separate pipes from each other.

Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively.