Patents by Inventor Hirokazu Deguchi

Hirokazu Deguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5057708
    Abstract: Disclosed is a duplex system having a function to suppress radio wave radiation. To suppress unnecessary radiation of radio waves from duplex clock signal lines, the system comprises a plurality of cards each for mounting electronic devices, a backboard for supporting the plurality of cards to be standing closely together in parallel, a first and a second clock signal sources for respectively generating a first and a second clock signals, a first and a second selecting gates for alternatively selecting one of the first and second clock signals to be output, and a first and a second group of clock signal lines, the clock signal lines in the first and second group respectively being wired closely in parallel on the backboard and wired on the cards, for respectively conducting the first and second clock signals to the cards.
    Type: Grant
    Filed: June 15, 1990
    Date of Patent: October 15, 1991
    Assignee: Fujitsu Ltd.
    Inventors: Masateru Tagami, Hirokazu Deguchi
  • Patent number: 4609267
    Abstract: A synthetic resin lens having a refractive index of at least 1.55 and an antireflection coating thereon is provided. The antireflection coating includes at least a hard coat layer formed of a dielectric substance having a refractive index n.sub.h disposed on the lens having a refractive index n.sub.s (n.sub.s .noteq.n.sub.h) and at least one antireflection layer of a dielectric or metallic material disposed between the lens and the hard coat layer. The antireflection layer has a refractive index n in the range represented by the formula: ##EQU1## and an optical film thickness of 4 (where denotes a wavelength in the range between about 450 nm to 650 nm) or two or more plies optically equivalent to a single layer of the antireflection material. The synthetic resin lens may be prepared by radical polmerization of a mixed monomer solution of styrene, 2,2-bis[3,5-dibromo-4-(2-methacryloloxyethoxy)phenyl]propane, and ultraviolet absorber and a light stabilizer.
    Type: Grant
    Filed: December 22, 1981
    Date of Patent: September 2, 1986
    Assignee: Seiko Epson Corporation
    Inventors: Hirokazu Deguchi, Kenji Kojima, Takao Mogami