Abstract: To provide a display in which the convergence of potential fluctuation toward the GND potential is improved, while the switch on the driver IC side is kept small. The display includes a plurality of drive electrodes for display and touch detection; a drive electrode driver configured to apply a driving signal to each of the plurality of the drive electrodes; and a first driving signal selector unit and a second driving signal selector unit configured to select each of the plurality of the drive electrodes to which the drive electrode driver applies the driving signal. A ground wiring line to which the drive electrode selected by the first driving signal selector unit is connected in a touch detection period is formed on a substrate on which the plurality of the drive electrodes are formed.

Abstract: To provide a display in which the convergence of potential fluctuation toward the GND potential is improved, while the switch on the driver IC side is kept small. The display includes a plurality of drive electrodes for display and touch detection; a drive electrode driver configured to apply a driving signal to each of the plurality of the drive electrodes; and a first driving signal selector unit and a second driving signal selector unit configured to select each of the plurality of the drive electrodes to which the drive electrode driver applies the driving signal. A ground wiring line to which the drive electrode selected by the first driving signal selector unit is connected in a touch detection period is formed on a substrate on which the plurality of the drive electrodes are formed.

Abstract: An apparatus for manufacturing a semiconductor device performs wet cleaning of a semiconductor wafer in a cleaning chamber, transfer of the wet-cleaned semiconductor wafer into a drying chamber and drying of the semiconductor wafer in the drying chamber. The apparatus includes an atmosphere control means for controlling the atmosphere near the surface of the semiconductor wafer by introducing liquid inert gas onto the surface of the semiconductor wafer which has been wet-cleaned in the cleaning chamber and a transfer means for transferring the semiconductor wafer into the drying chamber in the atmosphere controlled by the atmosphere control means. The atmosphere control means introduces the liquid inert gas such that the surface of the semiconductor wafer is covered with the liquid inert gas and evaporated liquid inert gas.

Abstract: A stocker for semiconductor substrates comprises a container that is for containing the semiconductor substrates and composed of a casing having an open side and a removable lid for sealing the casing at the open side, an atmosphere control unit having a cavity through which a clean gas is passed to keep the inside pressure higher than the outside atmospheric pressure and a gas supply system for supplying the gas to the cavity, and a loadport for connecting the cavity with the container to prevent outside air from entering into the inside of the container. The loadport comprises a port door and a lid placement/removing unit. The lid placement/removing unit is configured to remove the lid from the container into communication between the cavity and the container, thereby allowing the inside of the container to have the same atmosphere as the cavity.