Patents by Inventor Hiroki Maehara
Hiroki Maehara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8394649Abstract: A magnetoresistance effect device including a multilayer structure having a pair of ferromagnetic layers and a barrier layer positioned between them, wherein at least one ferromagnetic layer has at least the part contacting the barrier layer made amorphous and the barrier layer is an MgO layer having a highly oriented texture structure.Type: GrantFiled: January 3, 2008Date of Patent: March 12, 2013Assignees: Canaon Anelva Corporation, National Institute of Advanced Industrial Science and TechnologyInventors: David D. Djayaprawira, Koji Tsunekawa, Motonobu Nagai, Hiroki Maehara, Shinji Yamagata, Naoki Watanabe, Shinji Yuasa
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Patent number: 8367156Abstract: A magnetoresistive device has an MgO (magnesium oxide) layer provided between a first ferromagnetic layer and a second ferromagnetic layer. The device is manufactured by forming a film of the MgO layer in a film forming chamber. A substance whose getter effect with respect to an oxidizing gas is large is adhered to surfaces of components provided in the chamber for forming the MgO layer. The substance having a large getter effect is a substance whose value of oxygen gas adsorption energy is 145 kcal/mol or higher. Ta (tantalum), in particular, is preferable as a substance which constitutes the magnetoresistive device.Type: GrantFiled: July 6, 2011Date of Patent: February 5, 2013Assignee: Canon Anelva CorporationInventors: Yoshinori Nagamine, Koji Tsunekawa, David Djulianto Djayaprawira, Hiroki Maehara
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Patent number: 8131249Abstract: The present invention provides a frequency converter including a frequency conversion device capable of accommodating a Si-series MMIC and also a GaAs-series MMIC by using a magneto-resistance element. A frequency converter according to an embodiment of the present invention includes: a frequency conversion device having a magneto-resistance element with a magnetization free layer, an intermediate layer, and a magnetization pinned layer; a magnetic field application mechanism for applying a magnetic field to the frequency conversion device; a local oscillator for applying a local oscillation signal to the frequency conversion device; and an input terminal electrically connected to the above frequency conversion device for receiving an external input signal. Further, the local oscillator includes a magneto-resistance element capable of generating the local oscillation signal by outputting an AC voltage according to a resistance change thereof.Type: GrantFiled: March 10, 2010Date of Patent: March 6, 2012Assignee: Canon Anelva CorporationInventor: Hiroki Maehara
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Publication number: 20110262634Abstract: A magnetoresistive device has an MgO (magnesium oxide) layer provided between a first ferromagnetic layer and a second ferromagnetic layer. The device is manufactured by forming a film of the MgO layer in a film forming chamber. A substance whose getter effect with respect to an oxidizing gas is large is adhered to surfaces of components provided in the chamber for forming the MgO layer. The substance having a large getter effect is a substance whose value of oxygen gas adsorption energy is 145 kcal/mol or higher. Ta (tantalum), in particular, is preferable as a substance which constitutes the magnetoresistive device.Type: ApplicationFiled: July 6, 2011Publication date: October 27, 2011Applicant: CANON ANELVA CORPORATIONInventors: Yoshinori Nagamine, Koji Tsunekawa, David Djulianto Djayaprawira, Hiroki Maehara
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Patent number: 8013408Abstract: A magneto-resistive device has a magnetic free layer (33), a magnetic pinned layer (31) having a magnetic moment larger than that of the magnetic free layer, and an intermediate layer (32) provided between the magnetic free layer and the magnetic pinned layer. The negative-resistance device is characterized in that the negative-resistance device shows negative resistance by making the magnetic free layer continually change the magnetization direction along with the increase of the voltage which is applied to a magneto-resistive device so that electrons flow into the negative-resistance device from a magnetic free layer side.Type: GrantFiled: May 19, 2009Date of Patent: September 6, 2011Assignee: Canon Anelva CorporationInventors: Hiroki Maehara, Hitoshi Kubota, Akio Fukushima, Shinji Yuasa, Yoshishige Suzuki, Yoshinori Nagamine
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Publication number: 20110094875Abstract: A magnetoresistance effect device including a multilayer structure having a pair of ferromagnetic layers and a barrier layer positioned between them, wherein at least one ferromagnetic layer has at least the part contacting the barrier layer made amorphous and the barrier layer is an MgO layer having a highly oriented texture structure.Type: ApplicationFiled: January 3, 2011Publication date: April 28, 2011Applicants: CANON ANELVA CORPORATION, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: David D. Djayaprawira, Koji Tsunekawa, Motonobu Nagai, Hiroki Maehara, Shinji Yamagata, Naoki Watanabe, Shinji Yuasa
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Publication number: 20110051481Abstract: The present invention provides a frequency converter including a frequency conversion device capable of accommodating a Si-series MMIC and also a GaAs-series MMIC by using a magneto-resistance element. A frequency converter according to an embodiment of the present invention includes: a frequency conversion device having a magneto-resistance element with a magnetization free layer, an intermediate layer, and a magnetization pinned layer; a magnetic field application mechanism for applying a magnetic field to the frequency conversion device; a local oscillator for applying a local oscillation signal to the frequency conversion device; and an input terminal electrically connected to the above frequency conversion device for receiving an external input signal. Further, the local oscillator includes a magneto-resistance element capable of generating the local oscillation signal by outputting an AC voltage according to a resistance change thereof.Type: ApplicationFiled: March 10, 2010Publication date: March 3, 2011Applicant: CANON ANELVA CORPORATIONInventor: Hiroki Maehara
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Publication number: 20100264959Abstract: To provide a frequency conversion device which uses a magneto-resistive device and thereby can correspond to a Si-based MMIC and a GaAs-based MMIC. A frequency conversion apparatus according to the present invention includes: a frequency conversion device made of a magneto-resistive device including a magnetic free layer, an intermediate layer, and a magnetic pinned layer; a magnetic field applying mechanism for applying a magnetic field to the frequency conversion device; a local oscillator for applying a local oscillation signal to the frequency conversion device; and an input terminal electrically connected to the frequency conversion device, and used to input an external input signal.Type: ApplicationFiled: October 27, 2009Publication date: October 21, 2010Applicant: CANON ANELVA CORPORATIONInventor: Hiroki Maehara
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Publication number: 20100155231Abstract: Disclosed are method and apparatus for manufacturing a magnetoresistive device which are suitable for manufacturing a high-quality magnetoresistive device by reducing damages caused during the processing of a multilayer magnetic film as a component of the magnetoresistive device, thereby preventing deterioration of magnetic characteristics due to such damages. Specifically disclosed is a method for manufacturing a magnetoresistive device, which includes processing a multilayer magnetic film by performing a reactive ion etching on a substrate which is provided with the multilayer magnetic film as a component of the magnetoresistive device. This method for manufacturing a magnetoresistive device includes irradiating the multilayer magnetic film with an ion beam after the reactive ion etching.Type: ApplicationFiled: September 13, 2006Publication date: June 24, 2010Applicant: Canon ANELVA CorporationInventors: Naoki Watanabe, Yoshimitsu Kodaira, David D. Djayaprawira, Hiroki Maehara
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Patent number: 7727409Abstract: A method of production of a magnetoresistance effect device is able to prevent or minimize a drop in the MR ratio and maintain the high performance of the magnetoresistance effect device even if forming an oxide layer as a surface-most layer constituting a protective layer by the oxidation process inevitably included in the process of production of microprocessing by dry etching performed in a vacuum. Two mask layers used for microprocessing are doubly piled up. This method of production of a magnetoresistivity effect device including a magnetic multilayer film including at least two magnetic layers includes a step of providing under a first mask material that is a nonorganic material a second mask material able to react with other atoms to form a conductive substance, and a device made according to the method.Type: GrantFiled: May 9, 2008Date of Patent: June 1, 2010Assignee: Canon Anelva CorporationInventors: Hiroki Maehara, Tomoaki Osada, Mihoko Doi, Koji Tsunekawa, Naoki Watanabe
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Patent number: 7652852Abstract: A method of production of a magnetoresistance effect device is able to prevent or minimize a drop in the MR ratio and maintain the high performance of the magnetoresistance effect device even if forming an oxide layer as a surface-most layer constituting a protective layer by the oxidation process inevitably included in the process of production of microprocessing by dry etching performed in a vacuum. Two mask layers used for microprocessing are doubly piled up. This method of production of a magnetoresistivity effect device including a magnetic multilayer film including at least two magnetic layers includes a step of providing under a first mask material that is a nonorganic material a second mask material able to react with other atoms to form a conductive substance, and a device made according to the method.Type: GrantFiled: August 11, 2005Date of Patent: January 26, 2010Assignee: Canon Anelva CorporationInventors: Hiroki Maehara, Tomoaki Osada, Mihoko Doi, Koji Tsunekawa, Naoki Watanabe
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Publication number: 20090322419Abstract: An amplifying apparatus includes a magneto-resistive device which has a magnetic free layer, a magnetic pinned layer having a magnetic moment larger than that of the magnetic free layer, and an intermediate layer provided in between the magnetic free layer and the magnetic pinned layer. The amplifying apparatus has a first electrode layer provided in a magnetic free layer side of the magneto-resistive device, and a second electrode layer provided in a magnetic pinned layer side of the magneto-resistive device. The amplifying apparatus further includes a direct-current bias power-source for applying a direct-current bias to the magneto-resistive device, and a load resistor. The amplifying apparatus continually causes the change of a magnetization direction of the magnetic free layer to make the magneto-resistive device show negative resistance, and thereby amplifies an input signal.Type: ApplicationFiled: July 20, 2009Publication date: December 31, 2009Applicant: CANON ANELVA CORPORATIONInventors: Hiroki Maehara, Hitoshi Kubota, Akio Fukushima, Shinji Yuasa, Yoshishige Suzuki, Yoshinori Nagamine
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Publication number: 20090261436Abstract: A magneto-resistive device has a magnetic free layer (33), a magnetic pinned layer (31) having a magnetic moment larger than that of the magnetic free layer, and an intermediate layer (32) provided between the magnetic free layer and the magnetic pinned layer. The negative-resistance device is characterized in that the negative-resistance device shows negative resistance by making the magnetic free layer continually change the magnetization direction along with the increase of the voltage which is applied to a magneto-resistive device so that electrons flow into the negative-resistance device from a magnetic free layer side.Type: ApplicationFiled: May 19, 2009Publication date: October 22, 2009Applicant: CANON ANELVA CORPORATIONInventors: Hiroki Maehara, Hitoshi Kubota, Akio Fukushima, Shinji Yuasa, Yoshishige Suzuki, Yoshinori Nagamine
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Publication number: 20090148595Abstract: A method of manufacturing a magnetoresistance effect element having a high MR ratio even with a low RA and an apparatus of the same are provided. The magnetoresistance effect element having an MgO (magnesium oxide) layer provided between a ferromagnetic layer and a second ferromagnetic layer is manufactured by forming a film of the MgO layer in a film forming chamber in which a substance whose getter effect with respect to the oxidizing gas such as oxygen or water is large is adhered to the surfaces of components (an inner wall 37 of a film forming chamber in the interior of a first film forming chamber 21, inner walls of an adhesion preventing shield 36, a partitioning plate 22, a shutter or the like) provided in the chamber for forming the MgO layer. The substance having a large getter effect must simply be a substance whose value of oxygen gas adsorption energy is 145 kcal/mol or higher and, in particular, Ta (tantalum) as a substance which constitutes the magnetoresistance effect element is preferable.Type: ApplicationFiled: February 26, 2007Publication date: June 11, 2009Inventors: Yoshinori Nagamine, Koji Tsunekawa, David Djulianto Djayaprawira, Hiroki Maehara
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Publication number: 20090046395Abstract: A magnetoresistive effect thin-film magnetic head including a magnetoresistive effect element having a CPP structure in which the gap length can be precisely optimized and a method for fabricating the magnetoresistive effect thin-film magnetic head are provided. The stacked magnetoresistive effect thin-films having the cap layer as the top layer are formed on the bottom shield layer. The soft magnetic layer consisting of any soft magnetic material is then formed on the cap layer, and the micro fabrication process is performed. Subsequently, at least one insulating layer is formed on the stacked magnetoresistive effect thin-films after the micro fabrication process, having the cap layer as the top layer, on which the soft magnetic layer is formed. Then, the soft magnetic layer is exposed by removing a part of the insulating layer formed on the soft magnetic layer and the top shield layer is formed on the surface of the exposed soft magnetic layer.Type: ApplicationFiled: February 23, 2007Publication date: February 19, 2009Applicant: Canon ANELVA CorporationInventors: Hiroki Maehara, David D. Djayaprawira, Naoki Watanabe
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Publication number: 20080217289Abstract: A method of production of a magnetoresistance effect device is able to prevent or minimize a drop in the MR ratio and maintain the high performance of the magnetoresistance effect device even if forming an oxide layer as a surface-most layer constituting a protective layer by the oxidation process inevitably included in the process of production of microprocessing by dry etching performed in a vacuum. Two mask layers used for microprocessing are doubly piled up. This method of production of a magnetoresistivity effect device including a magnetic multilayer film including at least two magnetic layers includes a step of providing under a first mask material that is a nonorganic material a second mask material able to react with other atoms to form a conductive substance, and a device made according to the method.Type: ApplicationFiled: May 9, 2008Publication date: September 11, 2008Applicant: ANELVA CORPORATIONInventors: Hiroki Maehara, Tomoaki Osada, Mihoko Doi, Koji Tsunekawa, Naoki Watanabe
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Publication number: 20080180862Abstract: A magnetoresistance effect device including a multilayer structure having a pair of ferromagnetic layers and a barrier layer positioned between them, wherein at least one ferromagnetic layer has at least the part contacting the barrier layer made amorphous and the barrier layer is an MgO layer having a highly oriented texture structure.Type: ApplicationFiled: March 28, 2008Publication date: July 31, 2008Applicants: ANELVA CORPORATION, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: David D. DJAYAPRAWIRA, Koji TSUNEKAWA, Motonobu NAGAI, Hiroki MAEHARA, Shinji YAMAGATA, Naoki WATANABE, Shinji YUASA
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Publication number: 20080124454Abstract: A magnetoresistance effect device including a multilayer structure having a pair of ferromagnetic layers and a barrier layer positioned between them, wherein at least one ferromagnetic layer has at least the part contacting the barrier layer made amorphous and the barrier layer is an MgO layer having a highly oriented texture structure.Type: ApplicationFiled: January 3, 2008Publication date: May 29, 2008Applicants: ANELVA CORPORATION, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: David D. Djayaprawira, Koji Tsunekawa, Motonobu Nagai, Hiroki Maehara, Shinji Yamagata, Naoki Watanabe, Shinji Yuasa
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Publication number: 20080055793Abstract: A magnetoresistance effect device including a multilayer structure having a pair of ferromagnetic layers and a barrier layer positioned between them, wherein at least one ferromagnetic layer has at least the part contacting the barrier layer made amorphous and the barrier layer is an MgO layer having a highly oriented texture structure.Type: ApplicationFiled: October 23, 2007Publication date: March 6, 2008Applicants: ANELVA CORPORATION, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: David Djayaprawira, Koji Tsunekawa, Motonobu Nagai, Hiroki Maehara, Shinji Yamagata, Naoki Watanabe, Shinji Yuasa
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Publication number: 20060056115Abstract: A magnetoresistance effect device including a multilayer structure having a pair of ferromagnetic layers and a barrier layer positioned between them, wherein at least one ferromagnetic layer has at least the part contacting the barrier layer made amorphous and the barrier layer is an MgO layer having a highly oriented texture structure.Type: ApplicationFiled: September 7, 2005Publication date: March 16, 2006Applicants: ANELVA Corporation, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: David Djayaprawira, Koji Tsunekawa, Motonobu Nagai, Hiroki Maehara, Shinji Yamagata, Naoki Watanabe, Shinji Yuasa