Patents by Inventor Hiroki Nakagawa

Hiroki Nakagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240136886
    Abstract: For example, a drive motor module capable of suppressing resonance of an inverter cover due to vibration from a motor or the like is provided. A drive motor module 1 includes a motor, an inverter electrically connected to the motor, a housing that houses the motor and the inverter, and an inverter cover that has a plate shape and covers the inverter. An outer surface of an inverter cover is divided into a first region and a second region in plan view. In the first region, a plurality of first ribs arranged in parallel to each other and a connecting portion extending in a direction intersecting with the first rib and connected to one end side of each of the first ribs are provided in a protruding manner. In the second region, a plurality of second ribs that radially extend are provided in a protruding manner.
    Type: Application
    Filed: June 8, 2021
    Publication date: April 25, 2024
    Inventors: Ayumi NAKAGAWA, Hiroki AKAISHI, Yusuke MAKINO
  • Publication number: 20240129034
    Abstract: A forward Raman amplifier includes a plurality of pumping light sources with different wavelengths and the forward Raman amplifier, according to a fiber type or a zero-dispersion wavelength of the fiber, changes the number of pumping light sources to be emitted, changes a power ratio between the plurality of pumping light sources with the different wavelengths or changes wavelength characteristics of a gain, according to a fiber type.
    Type: Application
    Filed: July 12, 2023
    Publication date: April 18, 2024
    Applicant: Fujitsu Limited
    Inventors: Hiroshi NAKAMOTO, GOJI NAKAGAWA, Kentaro KAWANISHI, Hiroki OI, Tomohiro YAMAUCHI, Takafumi TERAHARA, Teppei OHATA
  • Patent number: 11927244
    Abstract: When a contact area with a chain guide is reduced by a back surface of a link plate having a convex portion, a friction coefficient in a fluid lubrication region is reduced. A coating film containing 10% or more of chromium is on the link plate. A friction modifier made of a molybdenum compound and including with a lubricating oil promotes generation of MoS2 by the coating film, and prevents an increase in a friction coefficient in a boundary lubrication region.
    Type: Grant
    Filed: September 20, 2021
    Date of Patent: March 12, 2024
    Assignee: DAIDO KOGYO CO., LTD.
    Inventors: Motoki Tanaka, Satoshi Yamashita, Hiroki Nakagawa, Atsushi Hayashi
  • Patent number: 11919408
    Abstract: An information processing apparatus controls a vehicle having a service power supply used to provide a service and a driving power supply used for traveling. The information processing apparatus has a storage unit configured to store service-related information concerning the service provided by the vehicle, and a controller configured to select any of a first mode, in which the service power supply and the driving power supply are independently used, and a second mode, in which the service power supply and the driving power supply are shared, based on the service-related information.
    Type: Grant
    Filed: November 18, 2020
    Date of Patent: March 5, 2024
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Shintaro Matsutani, Aya Sato, Yasuki Nakagawa, Shigeru Inamori, Fuminori Matsuoka, Taro Hasegawa, Masaki Nanahara, Misaki Sato, Motoki Maekawa, Hiroki Ashizawa
  • Publication number: 20240071087
    Abstract: An information processing apparatus (10) includes a time and space information acquisition unit (110) that acquires high-risk time and space information indicating a spatial region with an increased possibility of an accident occurring or of a crime being committed and a corresponding time slot, a possible surveillance target acquisition unit (120) that identifies a video to be analyzed from among a plurality of videos generated by capturing an image of each of a plurality of places, on the basis of the high-risk time and space information, and analyzes the identified video to acquire information of a possible surveillance target, and a target time and space identification unit (130) that identifies at least one of a spatial region where surveillance is to be conducted which is at least a portion of the spatial region or a time slot when surveillance is to be conducted, from among the spatial region and the time slot indicated by the high-risk time and space information, on the basis of the information of the
    Type: Application
    Filed: November 6, 2023
    Publication date: February 29, 2024
    Applicant: NEC Corporation
    Inventors: Junko NAKAGAWA, Ryoma Oami, Kenichiro IDA, Mika Saito, Shohzoh Nagahama, Akinari Furukawa, Yasumasa Ohtsuka, Junichi Fukuda, Fumi Ikeda, Manabu Moriyama, Fumie Einaga, Tatsunori Yamagami, Keisuke Hirayama, Yoshitsugu Kumano, Hiroki Adachi
  • Publication number: 20240071086
    Abstract: An information processing apparatus (10) includes a time and space information acquisition unit (110) that acquires high-risk time and space information indicating a spatial region with an increased possibility of an accident occurring or of a crime being committed and a corresponding time slot, a possible surveillance target acquisition unit (120) that identifies a video to be analyzed from among a plurality of videos generated by capturing an image of each of a plurality of places, on the basis of the high-risk time and space information, and analyzes the identified video to acquire information of a possible surveillance target, and a target time and space identification unit (130) that identifies at least one of a spatial region where surveillance is to be conducted which is at least a portion of the spatial region or a time slot when surveillance is to be conducted, from among the spatial region and the time slot indicated by the high-risk time and space information, on the basis of the information of the
    Type: Application
    Filed: November 6, 2023
    Publication date: February 29, 2024
    Applicant: NEC Corporation
    Inventors: Junko NAKAGAWA, Ryoma OAMI, Kenichiro IDA, Mika SAITO, Shohzoh NAGAHAMA, Akinari FURUKAWA, Yasumasa OHTSUKA, Junichi FUKUDA, Fumi IKEDA, Manabu MORIYAMA, Fumie EINAGA, Tatsunori YAMAGAMI, Keisuke ` HIRAYAMA, Yoshitsugu KUMANO, Hiroki ADACHI
  • Patent number: 11897368
    Abstract: A floor lock release mechanism includes an arm member, a lever, a switching member, a lever biasing member, and a switching member biasing member. The lever is rotatable between a rearward rotational position and a forward rotational position. The lever biasing member biases the lever toward a neutral position. The switching member is rotatable between a locked position and an unlocked position. The switching member biasing member biases the switching member toward the locked position. The lever includes a pressed portion and a pressing portion. The pressing portion is arranged on the same side as a side on which the pressed portion is arranged with respect to a straight line orthogonal to a straight line connecting the pressed portion and a rotation center.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: February 13, 2024
    Assignee: TOYOTA BOSHOKU KABUSHIKI KAISHA
    Inventor: Hiroki Nakagawa
  • Patent number: 11681222
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Grant
    Filed: May 14, 2021
    Date of Patent: June 20, 2023
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Patent number: 11667620
    Abstract: The composition contains a compound and a solvent. The compound includes a group represented by formula (1). The compound has a molecular weight of no less than 200 and has a percentage content of carbon atoms of no less than 40% by mass. In the formula (1), R1 and R2 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 taken together represent a part of an alicyclic structure having 3 to 20 ring atoms constituted together with the carbon atom to which R1 and R2 bond; Ar1 represents a group obtained by removing (n+3) hydrogen atoms from an arene or heteroarene having 6 to 20 ring atoms; and X represents an oxygen atom, —CR3R4—, —CR3R4—O— or —O—CR3R4—.
    Type: Grant
    Filed: March 5, 2020
    Date of Patent: June 6, 2023
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakatsu, Kazunori Takanashi, Kazunori Sakai, Yuushi Matsumura, Hiroki Nakagawa
  • Publication number: 20230110863
    Abstract: Provided is a thermosetting resin composition that has high reactivity, can be adapted to various curing conditions, and has extremely high versatility. The thermosetting resin composition contains a resin component (A) containing —COOR (R is an alkyl group having 50 or less carbon atoms) and a hydroxy group, and a transesterification catalyst (B). A curing start temperature is 130° C. or lower, and a gel fraction when cured under a condition of baking at 150° C. for 30 minutes is 80% or more.
    Type: Application
    Filed: February 24, 2021
    Publication date: April 13, 2023
    Applicant: KYOEISHA CHEMICAL CO., LTD.
    Inventors: Yuya MORIWAKI, Tomoya MATSUDA, Kosuke ASADA, Masaru DONKAI, Hiroki NAKAGAWA, Keiji MAEO, Narutoshi YOSHIDA, Naomi TAKENAKA
  • Publication number: 20230087596
    Abstract: Provided is a thermosetting resin composition, from which a cured product having excellent transparency with less yellowing than that in the related art can be obtained, and which is advantageous in cost because a monomer obtained by using an inexpensive raw material is used. An ester compound contains, in one molecule, at least one functional group represented by the following general formula (1) or (2). (In both the general formulae (1) and (2), R1 is an alkyl group having 50 or less carbon atoms. R2 is an alkylene group having 50 or less carbon atoms that may contain an oxygen atom and a nitrogen atom as a portion thereof.
    Type: Application
    Filed: December 22, 2020
    Publication date: March 23, 2023
    Applicant: KYOEISHA CHEMICAL CO., LTD.
    Inventors: Masaru DONKAI, Yuya MORIWAKI, Tomoya MATSUDA, Kosuke ASADA, Hiroki NAKAGAWA, Keiji MAEO, Narutoshi YOSHIDA, Naomi TAKENAKA
  • Publication number: 20230002530
    Abstract: [Problem] To obtain a thermosetting resin composition that has curing performance at a lower temperature and uses transesterification capable of also suitably coping with conversion into an aqueous form as a curing reaction. [Solution] A thermosetting resin composition containing a resin component (A), which includes a structure (a) represented by the following general formula (1) and a hydroxy group (b), and a transesterification catalyst (B). n=0 to 20 R1 is an alkyl group having 50 or less carbon atoms. R3 is hydrogen or an alkyl group having 10 or less carbon atoms.
    Type: Application
    Filed: November 14, 2019
    Publication date: January 5, 2023
    Applicant: KYOEISHA CHEMICAL CO., LTD.
    Inventors: Yuya MORIWAKI, Tomoya MATSUDA, Kosuke ASADA, Masaru DONKAI, Hiroki NAKAGAWA, Keiji MAEO, Narutoshi YOSHIDA, Naomi TAKENAKA
  • Patent number: 11454890
    Abstract: A composition for resist underlayer film formation, includes a compound represented by formula (1) and a solvent. Ar1 represents an aromatic heterocyclic group having a valency of m and having 5 to 20 ring atoms; m is an integer of 1 to 11; Ar2 is a group bonding to a carbon atom of the aromatic heteroring in Ar1 and represents an aromatic carbocyclic group having 6 to 20 ring atoms and having a valency of (n+1) or an aromatic heterocyclic group having 5 to 20 ring atoms and having a valency of (n+1); n is an integer of 0 to 12; and R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, a halogen atom, or a nitro group.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: September 27, 2022
    Assignee: JSR CORPORATION
    Inventors: Naoya Nosaka, Yuushi Matsumura, Hiroki Nakatsu, Kazunori Takanashi, Hiroki Nakagawa
  • Publication number: 20220251274
    Abstract: To provide a resin composition, which has both a thermosetting property and active energy curability, satisfactory performances, and excellent performances including handleability of being inexpensive without having a concern about a short pot life after blending with a thermal cross-linking agent as in the related art. The curable resin composition contains: a resin component (A) containing a (meth)acryloyl group (a), a hydroxy group (b), and an alkyl ester group (c); and an initiator (B).
    Type: Application
    Filed: July 8, 2020
    Publication date: August 11, 2022
    Applicant: KYOEISHA CHEMICAL CO., LTD.
    Inventors: Yuya MORIWAKI, Tomoya MATSUDA, Kosuke ASADA, Masaru DONKAI, Naomi TAKENAKA, Hiroki NAKAGAWA
  • Patent number: 11402757
    Abstract: A composition for resist underlayer film formation, includes a compound represented by formula (1) and a solvent. Ar1 represents an aromatic heterocyclic group having a valency of m and having 5 to 20 ring atoms; m is an integer of 1 to 11; Ar2 is a group bonding to a carbon atom of the aromatic heteroring in Ar1 and represents an aromatic carbocyclic group having 6 to 20 ring atoms and having a valency of (n+1) or an aromatic heterocyclic group having 5 to 20 ring atoms and having a valency of (n+1); n is an integer of 0 to 12; and R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, a halogen atom, or a nitro group.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: August 2, 2022
    Assignee: JSR CORPORATION
    Inventors: Naoya Nosaka, Yuushi Matsumura, Hiroki Nakatsu, Kazunori Takanashi, Hiroki Nakagawa
  • Publication number: 20220137508
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: May 14, 2021
    Publication date: May 5, 2022
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu NAKASHIMA, Gouji WAKAMATSU, Kentarou GOTOU, Yukio NISHIMURA, Takeo SHIOYA
  • Patent number: 11243468
    Abstract: A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R1 and R2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R1 and R2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R1 and R2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R1 and R2 bond.
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: February 8, 2022
    Assignee: JSR CORPORATION
    Inventors: Naoya Nosaka, Goji Wakamatsu, Tsubasa Abe, Ichihiro Miura, Kengo Ehara, Hiroki Nakatsu, Hiroki Nakagawa
  • Publication number: 20220003295
    Abstract: When a contact area with a chain guide is reduced to a small area by forming a back surface of a link plate into a convex portion having a round shape or the like, a friction coefficient in a fluid lubrication region is reduced (region E). A coating film containing 10% or more of chromium is formed on the link plate. A friction modifier made of a molybdenum compound such as MoDTC and added to a lubricating oil promotes generation of MoS2 by the chromium coating film, and prevents an increase in the friction coefficient in a boundary lubrication region.
    Type: Application
    Filed: September 20, 2021
    Publication date: January 6, 2022
    Inventors: Motoki TANAKA, Satoshi YAMASHITA, Hiroki NAKAGAWA, Atsushi HAYASHI
  • Publication number: 20210405272
    Abstract: Provided is an optical film that, when being incorporated into an image display device, can suppress the image display device from appearing pale. An optical film including a UV-absorbing layer containing a UV-absorbing agent B on a plastic film containing a UV-absorbing agent A, wherein fluorescence emission when the plastic film side is irradiated with excitation light having a wavelength of 365 nm and fluorescence emission when the UV-absorbing layer side is irradiated with excitation light having a wavelength of 365 nm satisfy a specific condition.
    Type: Application
    Filed: November 13, 2019
    Publication date: December 30, 2021
    Inventors: Seiichi ISOJIMA, Junya EGUCHI, Takashi KURODA, Hiroki NAKAGAWA
  • Publication number: 20210370800
    Abstract: A floor lock release mechanism includes an arm member, a lever, a switching member, a lever biasing member, and a switching member biasing member. The lever is rotatable between a rearward rotational position and a forward rotational position. The lever biasing member biases the lever toward a neutral position. The switching member is rotatable between a locked position and an unlocked position. The switching member biasing member biases the switching member toward the locked position. The lever includes a pressed portion and a pressing portion. The pressing portion is arranged on the same side as a side on which the pressed portion is arranged with respect to a straight line orthogonal to a straight line connecting the pressed portion and a rotation center.
    Type: Application
    Filed: May 25, 2021
    Publication date: December 2, 2021
    Applicant: TOYOTA BOSHOKU KABUSHIKI KAISHA
    Inventor: Hiroki NAKAGAWA