Patents by Inventor Hiroki Yamazaki

Hiroki Yamazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190261176
    Abstract: When updating a key to guarantee security, updating the key during decryption of update data causes an ECU to stop functioning due to a decryption failure. Therefore, an in-vehicle gateway or a key management device of the present invention includes: an update data acquisition unit that receives, from outside a vehicle, update data encrypted with a predetermined key; a key acquisition unit that receives a key from outside the vehicle; a key storage unit in which the key received by the key acquisition unit is stored; and a decryption unit that decrypts the update data acquired by the update data acquisition unit based on the key stored in the storage unit, in which the update data acquisition unit transmits a key acquisition request signal after completion of decryption of the update data by the decryption unit.
    Type: Application
    Filed: September 27, 2017
    Publication date: August 22, 2019
    Applicant: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Hiroki YAMAZAKI, Mikio KATAOKA
  • Publication number: 20180212765
    Abstract: A confidential information setting apparatus includes: a communication unit that acquires an encryption key and condition information, which is a condition for setting a secret key to a terminal, from a memory unit of a server and acquires a terminal ID, which is an identifier for uniquely identifying the terminal, and the secret key associated with the terminal ID and encrypted from a memory unit of a user apparatus; an encryption processing unit that decrypts the encrypted secret key with the encryption key; and a control unit that judges whether the decrypted secret key can be set to the terminal or not, based on the condition information and sets the secret key to the terminal when a result of the judgment indicates that the secret key can be set to the terminal.
    Type: Application
    Filed: November 18, 2015
    Publication date: July 26, 2018
    Inventors: Hiroki YAMAZAKI, Hiromi ISOKAWA, Hiroyuki HIGAKI
  • Patent number: 10023720
    Abstract: Provided is a filler powder that has a lower coefficient of thermal expansion than silica powder and is less likely to cause quality and color alteration of a resin when blended into the resin. The filler powder is made of a crystallized glass in which ?-quartz solid solution and/or ?-eucryptite is precipitated. The filler powder preferably has an average particle size D50 of 5 ?m or less. The filler powder preferably has a coefficient of thermal expansion of 5×10?7/° C. or less in a range of 30 to 150° C.
    Type: Grant
    Filed: May 19, 2014
    Date of Patent: July 17, 2018
    Assignee: NIPPON ELECTRIC GLASS CO., LTD.
    Inventors: Noriaki Masuda, Yohei Hosoda, Shingo Nakane, Hiroki Yamazaki
  • Publication number: 20170269519
    Abstract: A fixing device includes a pair of fixing members disposed to face each other in a fixing area, a movable member movably supporting at least one of the fixing members between first and second positions, a driving device including a contact member and a drive source to move the movable member between the first and second positions, and a controller that controls the driving device, and if a temperature of the one of the fixing members is equal to or higher than a preset temperature when the driving device moves the movable member from the second position to the first position, changes the control to make driving force constantly exceed a rotational load of the driving device in accordance with advancement of a time of increase in the rotational load as compared with when the temperature of the one of the fixing members is lower than the preset temperature.
    Type: Application
    Filed: August 31, 2016
    Publication date: September 21, 2017
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Hiroki YAMAZAKI, Yasutaka NAITO, Eiichiro TOKUHIRO, Tsuyoshi SUNOHARA
  • Publication number: 20170262719
    Abstract: A biometric authentication system includes an information terminal having ID information, an acquisition terminal that acquires biometric information, and an authentication processing apparatus. The processing apparatus includes: a first part that acquires the ID and location information on the information terminal; a second part that communicates with the acquisition terminal to acquire the biometric information; a first storage part for storing an indication that the information terminal is located within a predetermined range; a second storage part that stores the ID and biometric reference information; and a controller.
    Type: Application
    Filed: July 13, 2015
    Publication date: September 14, 2017
    Applicant: HITACHI, LTD.
    Inventors: Hiroki YAMAZAKI, Keiji KITANE, Takeshi INOUE, Shinichirou FUKUSHIMA, Hiroyuki HAGAKI
  • Publication number: 20170032936
    Abstract: An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching.
    Type: Application
    Filed: October 11, 2016
    Publication date: February 2, 2017
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akira KOSHIISHI, Masaru SUGIMOTO, Kunihiko HINATA, Noriyuki KOBAYASHI, Chishio KOSHIMIZU, Ryuji OHTANI, Kazuo KIBI, Masashi SAITO, Naoki MATSUMOTO, Manabu IWATA, Daisuke YANO, Yohei YAMAZAWA, Hidetoshi HANAOKA, Toshihiro HAYAMI, Hiroki YAMAZAKI, Manabu SATO
  • Publication number: 20160379805
    Abstract: A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring.
    Type: Application
    Filed: September 7, 2016
    Publication date: December 29, 2016
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akira KOSHIISHI, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani, Kazuo Kibi, Masashi Saito, Naoki Matsumoto, Yoshinobu Ohya, Manabu Iwata, Daisuke Yano, Yohei Yamazawa, Hidetoshi Hanaoka, Toshihiro Hayami, Hiroki Yamazaki, Manabu Sato
  • Patent number: 9490105
    Abstract: A plasma processing apparatus includes a first and second electrodes disposed on upper and lower sides and opposite each other within a process container, a first RF power application unit and a DC power supply both connected to the first electrode, and second and third radio frequency power application units both connected to the second electrode. A conductive member is disposed within the process container and grounded to release through plasma a current caused by a DC voltage applied from the DC power supply. The conductive member is supported by a first shield part around the second electrode and laterally protruding therefrom at a position between the mount face of the second electrode and an exhaust plate for the conductive member to be exposed to the plasma. The conductive member is grounded through a conductive internal body of the first shield part.
    Type: Grant
    Filed: November 1, 2013
    Date of Patent: November 8, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani, Kazuo Kibi, Masashi Saito, Naoki Matsumoto, Yoshinobu Ohya, Manabu Iwata, Daisuke Yano, Yohei Yamazawa, Hidetoshi Hanaoka, Toshihiro Hayami, Hiroki Yamazaki, Manabu Sato
  • Publication number: 20160281526
    Abstract: A low-pressure turbine of a jet engine includes: a turbine case; turbine blades rotatable about an axis of the turbine case; and a shroud including a plurality of shroud segments annularly placed along an inner peripheral surface of the turbine case while surrounding the turbine blades. Each shroud segment is provided with a projection and an outward groove. The shroud segment is fixed to the turbine case by allowing the projection to engage with a receiving groove of the turbine case in an axial direction, and allowing the outward groove to engage with an inward projection of the turbine case in a radial direction. The shroud segment is provided with a pressure receiving portion that receives a force to release an engaged state of the outward groove with the inward projection of the turbine case in a step of removing the shroud segment from the turbine case.
    Type: Application
    Filed: June 6, 2016
    Publication date: September 29, 2016
    Applicant: IHI Corporation
    Inventors: Hiroki YAMAZAKI, Masahiro TERASAWA, Yasuhiro II
  • Publication number: 20160083557
    Abstract: Provided is a filler powder that has a lower coefficient of thermal expansion than silica powder and is less likely to cause quality and color alteration of a resin when blended into the resin. The filler powder is made of a crystallized glass in which ?-quartz solid solution and/or ?-eucryptite is precipitated. The filler powder preferably has an average particle size D50 of 5 ?m or less. The filler powder preferably has a coefficient of thermal expansion of 5×10?7/° C. or less in a range of 30 to 150° C.
    Type: Application
    Filed: May 19, 2014
    Publication date: March 24, 2016
    Inventors: Noriaki MASUDA, Yohei HOSODA, Shingo NAKANE, Hiroki YAMAZAKI
  • Publication number: 20140124139
    Abstract: A plasma processing apparatus includes a first and second electrodes disposed on upper and lower sides and opposite each other within a process container, a first RF power application unit and a DC power supply both connected to the first electrode, and second and third radio frequency power application units both connected to the second electrode. A conductive member is disposed within the process container and grounded to release through plasma a current caused by a DC voltage applied from the DC power supply. The conductive member is supported by a first shield part around the second electrode and laterally protruding therefrom at a position between the mount face of the second electrode and an exhaust plate for the conductive member to be exposed to the plasma. The conductive member is grounded through a conductive internal body of the first shield part.
    Type: Application
    Filed: November 1, 2013
    Publication date: May 8, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akira KOSHIISHI, Masaru SUGIMOTO, Kunihiko HINATA, Noriyuki KOBAYASHI, Chishio KOSHIMIZU, Ryuji OHTANI, Kazuo KIBI, Masashi SAITO, Naoki MATSUMOTO, Yoshinobu OHYA, Manabu IWATA, Daisuke YANO, Yohei YAMAZAWA, Hidetoshi HANAOKA, Toshihiro HAYAMI, Hiroki YAMAZAKI, Manabu SATO
  • Patent number: 8674570
    Abstract: In the brushless motor, a magnetic recording disk is to be mounted on a hub. A base plate rotatably supports the hub on the upper surface. A laminated core is fixed on the upper surface of the base plate and has a ring portion and a plurality of teeth that extend radially from the ring portion. Coils are wound around the plurality of teeth. A cylindrical magnet is fixed to the hub and is magnetized for driving with a plurality of poles along the circumferential direction and is arranged to radially face the plurality of teeth of the laminated core. A wire of one end of one of the coils is drawn out to the bottom surface of the base plate through a hole arranged on the base plate. The wire is connected to a driving line for supplying a current to the coils at a position other than the position of the hole on the base plate. The hole of the base plate is plugged with a resin.
    Type: Grant
    Filed: April 23, 2013
    Date of Patent: March 18, 2014
    Assignee: Samsung Electro-Mechanics Japan Advanced Technology Co., Ltd.
    Inventors: Hiroki Yamazaki, Hiroshi Muramatsu
  • Patent number: 8603293
    Abstract: A plasma processing apparatus includes a processing container, an exhaust unit, an exhaust plate, an RF power application unit connected to a second electrode but not connected to the first electrode and configured to apply an RF power with a single frequency, the second electrode being connected to no power supply that applies an RF power other than the RF power with the single frequency, a DC power supply connected to the first electrode but not connected to the second electrode, the first electrode being connected to no power supply that applies an RF power, and a conductive member within the process container grounded to release through plasma a current caused by the DC voltage, the conductive member supported by the first shield part and laterally protruding therefrom only at a position that is located, in a height-wise direction, between a mount face and the exhaust plate and below a bottom of a focus ring.
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: December 10, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani, Kazuo Kibi, Masashi Saito, Naoki Matsumoto, Yoshinobu Ohya, Manabu Iwata, Daisuke Yano, Yohei Yamazawa, Hidetoshi Hanaoka, Toshihiro Hayami, Hiroki Yamazaki, Manabu Sato
  • Publication number: 20130213852
    Abstract: Provided is an electrical element package, comprising an element substrate on which an electrical element is provided, a sealing substrate provided at a distance from a surface of the element substrate on a side of the electrical element so as to be opposed to the element substrate, and a glass frit for hermetically sealing a gap between the element substrate and the sealing substrate so as to surround the electrical element, wherein the electrical element package comprises a protective film for protecting an electrode from laser light applied in welding the glass frit, the protective film being provided between the element substrate and the glass frit.
    Type: Application
    Filed: September 30, 2011
    Publication date: August 22, 2013
    Inventors: Yasuo Yamazaki, Toru Shiragami, Noriaki Masuda, Takeshi Sakurai, Hiroki Yamazaki
  • Patent number: 8492084
    Abstract: Disclosed are a method for assaying a target substance in a sample and an apparatus for the method. The method can specifically assay the target substance in the sample without using any antibody against the target substance. The assaying method includes simultaneously or successively bringing a labeled aptamer, the target substance in the sample and a solid phase into contact together, and then measuring the label of the aptamer which has not been bound on the solid phase. The labeled aptamer has a property of binding to the target substance. The solid phase carries an oligonucleotide immobilized on it in an excess amount relative to the target substance. The oligonucleotide is hybridizable with the labeled aptamer when the labeled aptamer is in a state that it is not bound to the target substance, but is not hybridizable with the labeled aptamer when the labeled aptamer is in a state that it is bound to the target substance.
    Type: Grant
    Filed: January 24, 2007
    Date of Patent: July 23, 2013
    Inventors: Koji Sode, Kazunori Ikebukuro, Hiroki Yamazaki
  • Publication number: 20130157172
    Abstract: Provided is an ion-conducting material, comprising, as a composition in terms of mol o, 15 to 80% of P2O5, 0 to 70% of SiO2, and 5 to 35% of R2O, which represents the total content of Li2O, Na2O, K2O, Rb2O, Cs2O, and Ag2O.
    Type: Application
    Filed: September 5, 2011
    Publication date: June 20, 2013
    Inventors: Tetsuo Yazawa, Yusuke Daiko, Takeshi Yamada, Hironori Takase, Hiroki Yamazaki
  • Patent number: 8456050
    Abstract: In the brushless motor, a magnetic recording disk is to be mounted on a hub. A base plate rotatably supports the hub on the upper surface. A laminated core is fixed on the upper surface of the base plate and has a ring portion and a plurality of teeth that extend radially from the ring portion. Coils are wound around the plurality of teeth. A cylindrical magnet is fixed to the hub and is magnetized for driving with a plurality of poles along the circumferential direction and is arranged to radially face the plurality of teeth of the laminated core. A wire of one end of one of the coils is drawn out to the bottom surface of the base plate through a hole arranged on the base plate. The wire is connected to a driving line for supplying a current to the coils at a position other than the position of the hole on the base plate. The hole of the base plate is plugged with a resin.
    Type: Grant
    Filed: October 1, 2012
    Date of Patent: June 4, 2013
    Assignee: Samsung Electro-Mechanics Japan Advanced Technology Co., Ltd.
    Inventors: Hiroki Yamazaki, Hiroshi Muramatsu
  • Publication number: 20130069460
    Abstract: In the brushless motor, a magnetic recording disk is to be mounted on a hub. A base plate rotatably supports the hub on the upper surface. A laminated core is fixed on the upper surface of the base plate and has a ring portion and a plurality of teeth that extend radially from the ring portion. Coils are wound around the plurality of teeth. A cylindrical magnet is fixed to the hub and is magnetized for driving with a plurality of poles along the circumferential direction and is arranged to radially face the plurality of teeth of the laminated core. A wire of one end of one of the coils is drawn out to the bottom surface of the base plate through a hole arranged on the base plate. The wire is connected to a driving line for supplying a current to the coils at a position other than the position of the hole on the base plate. The hole of the base plate is plugged with a resin.
    Type: Application
    Filed: October 1, 2012
    Publication date: March 21, 2013
    Applicant: ALPHANA TECHNOLOGY CO., LTD.
    Inventors: Hiroki YAMAZAKI, Hiroshi MURAMATSU
  • Patent number: 8365413
    Abstract: In an apparatus for manufacturing a fluid dynamic bearing, a housing portion defines a first work area. A vacuum pump discharges air in the first work area. A lubricant discharge device is arranged in the first work area, and discharges a lubricant into an inlet of a reservoir for storing the lubricant of the fluid dynamic bearing. At least one aperture is provided in the housing portion. A first door closes the aperture and a second door closes the aperture. Between the first door and the second door, when both have closed the aperture, a second work area is formed where the fluid dynamic bearing is placed.
    Type: Grant
    Filed: February 1, 2010
    Date of Patent: February 5, 2013
    Assignee: Alphana Technology Co., Ltd.
    Inventor: Hiroki Yamazaki
  • Patent number: 8349454
    Abstract: An object of the invention is to obtain a glass substrate having high mechanical strength by reconciling suitability for ion exchange and devitrification proof in a glass. The strengthened glass substrate of the invention is a strengthened glass substrate having a compression stress layer in the surface thereof, the glass substrate having a glass composition including, in terms of % by mass, 40-70% of SiO2, 12-25% of Al2O3, 0-10% of B2O3, 0-8% of Li2O, 6-15% of Na2O, 0-10% of K2O, 13-20% of Li2O+Na2O+K2O, 0-3.9% of MgO, 0-5% of CaO, 0-5% of ZnO, 0-6% of ZrO2, and 0-5% of SrO+BaO, the value of (MgO+ZrO2+ZnO)/(MgO+ZrO2+ZnO+Al2O3) in terms of mass proportion being from 0.25 to 0.45. The above-mentioned strengthened glass can be produced by melting raw glass materials mixed together so as to result in the given glass composition, forming the melt into a sheet by an overflow downdraw process, and then conducting an ion exchange treatment to form a compression stress layer in the glass sheet surface.
    Type: Grant
    Filed: June 3, 2008
    Date of Patent: January 8, 2013
    Assignee: Nippon Electric Glass Co., Ltd.
    Inventors: Takashi Murata, Hiroki Yamazaki