Patents by Inventor Hiroko Kitamoto

Hiroko Kitamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240066072
    Abstract: Provided herein is technology relating to preventing and treating gastrointestinal dysbiosis and particularly, but not exclusively, to compositions, methods, systems, and kits for treating and/or preventing Clostridioides difficile infection in an organism.
    Type: Application
    Filed: September 28, 2020
    Publication date: February 29, 2024
    Inventors: Nobuhiko Kamada, Hiroko Kitamoto
  • Publication number: 20230077099
    Abstract: [Problem to be Solved] Provided is a nursery pot body having stability over time, exhibiting suppressed decomposition during seedling raising, maintaining sufficient strength at the time of planting, and being rapidly degraded after planting in a field through enzyme treatment immediately before and/or immediately after planting. [Solution] Base paper for a nursery pot body is characterized in that a biodegradable resin layer is provided on at least one surface of a paper substrate, wherein the biodegradable resin layer contains at least 15 mass % of a polylactic acid relative to 100 mass % of a biodegradable resin composition, and a nursery pot body is produced by molding the base paper.
    Type: Application
    Filed: February 3, 2021
    Publication date: March 9, 2023
    Inventors: Takuya NAKAGAWA, Yasuomi OTA, Naohiro KAWAMURA, Tokuya SASAKI, Hiroko KITAMOTO, Michinori NAKAMOTO
  • Patent number: 11519644
    Abstract: A cooling device includes a cooler disposed inside a shell main body formed in a cylindrical shape, and having a first surface facing an inlet nozzle and an outlet nozzle, and a partition member fixed to the first surface, and partitioning a portion between the cooler and an inner peripheral surface of the shell main body into a first space communicating with the inlet nozzle and a second space communicating with the outlet nozzle. The partition member includes a main partition plate disposed between the inlet nozzle and the outlet nozzle in an axial direction, a first guide portion extending from an end portion of the main partition plate toward a first end surface of the shell main body, and a second guide portion extending from an end portion of the main partition plate toward a second end surface of the shell main body.
    Type: Grant
    Filed: February 18, 2021
    Date of Patent: December 6, 2022
    Assignee: MITSUBISHI HEAVY INDUSTRIES COMPRESSOR CORPORATION
    Inventors: Kazutoshi Yokoo, Hiroko Kitamoto
  • Publication number: 20210262711
    Abstract: A cooling device includes a cooler disposed inside a shell main body formed in a cylindrical shape, and having a first surface facing an inlet nozzle and an outlet nozzle, and a partition member fixed to the first surface, and partitioning a portion between the cooler and an inner peripheral surface of the shell main body into a first space communicating with the inlet nozzle and a second space communicating with the outlet nozzle. The partition member includes a main partition plate disposed between the inlet nozzle and the outlet nozzle in an axial direction, a first guide portion extending from an end portion of the main partition plate toward a first end surface of the shell main body, and a second guide portion extending from an end portion of the main partition plate toward a second end surface of the shell main body.
    Type: Application
    Filed: February 18, 2021
    Publication date: August 26, 2021
    Applicant: MITSUBISHI HEAVY INDUSTRIES COMPRESSOR CORPORATION
    Inventors: Kazutoshi Yokoo, Hiroko Kitamoto
  • Patent number: 9644482
    Abstract: A method for manufacturing a machine component includes a process of estimating post-heat-treatment strength for the intermediate form of a base material after a certain mechanical working process is performed, and a process of comparing the estimated strength with reference strength required for a final form. According to a result of the comparison, heat treatment of the base material is performed after one of the mechanical working processes is performed.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: May 9, 2017
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Shimpei Okayasu, Hiroko Kitamoto, Daisuke Kawanishi, Hiroki Takagi, Nobuyori Yagi
  • Patent number: 9423183
    Abstract: A heat treatment method of an impeller includes a heat treatment preparation process of arranging the impeller within a vacuum furnace, an impeller covering process of covering an outer peripheral surface of the impeller in a circumferential direction by a heat uniformizing jig made of a radiation conversion material which radiates transferred heat as radiant heat, and a heat treatment process including a heating process and a cooling process in which heat treatment is performed by heating or cooling the impeller covered with the heat uniformizing jig from the periphery using a heater.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: August 23, 2016
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Kazutoshi Yoko, Hiroko Kitamoto, Shimpei Okayasu, Hiroki Takagi
  • Publication number: 20150017593
    Abstract: A heat treatment method of an impeller includes a heat treatment preparation process of arranging the impeller within a vacuum furnace, an impeller covering process of covering an outer peripheral surface of the impeller in a circumferential direction by a heat uniformizing jig made of a radiation conversion material which radiates transferred heat as radiant heat, and a heat treatment process including a heating process and a cooling process in which heat treatment is performed by heating or cooling the impeller covered with the heat uniformizing jig from the periphery using a heater.
    Type: Application
    Filed: February 15, 2013
    Publication date: January 15, 2015
    Inventors: Kazutoshi Yoko, Hiroko Kitamoto, Shimpei Okayasu, Hiroki Takagi
  • Publication number: 20140105751
    Abstract: A method for manufacturing a machine component includes a process of estimating post-heat-treatment strength for the intermediate form of a base material after a certain mechanical working process is performed, and a process of comparing the estimated strength with reference strength required for a final form. According to a result of the comparison, heat treatment of the base material is performed after one of the mechanical working processes is performed.
    Type: Application
    Filed: December 20, 2012
    Publication date: April 17, 2014
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Shimpei Okayasu, Hiroko Kitamoto, Daisuke Kawanishi, Hiroki Takagi, Nobuyori Yagi
  • Patent number: 8353113
    Abstract: A drying device including: a travelling unit and a drying unit. The travelling unit transports a sheet-like substrate in a travelling direction. The sheet-like substrate includes a thin film body wherein at least one surface of the thin film body is coated with a coating material including an active material. The drying unit dries the thin film body. The drying unit includes a radiative heater and a first nozzle. The radiative heater irradiates an infrared ray to a to-be-dried surface of the thin film body. The first nozzle blows a dry air to the to-be-dried surface in a direction opposite to the travelling direction of the sheet-like substrate.
    Type: Grant
    Filed: March 30, 2010
    Date of Patent: January 15, 2013
    Assignee: Mitsubishi Heavy Industries, LTD.
    Inventors: Hiroko Kitamoto, Keiichi Sato, Naohiko Matsuda, Masahiro Sugihara
  • Patent number: 8177912
    Abstract: An evaporation source having a nozzle structure that makes the distribution of film thickness uniform in the width direction of a substrate and a vacuum evaporator using the same are provided. A vapor produced by evaporation or sublimation by heating to evaporation material is discharged from a long nozzle opening like a band. A deposited substrate is transferred in a direction perpendicular to the longitudinal direction of the nozzle opening while facing the nozzle opening. A discharge flow rate of vapor per unit area in the longitudinal direction of the nozzle opening is made to be maximum in a portion at a nozzle width direction position corresponding to a substrate edge position rather than a central part of the nozzle opening and a plurality of partition plates providing directivity to the flow of vapor are arranged inside the nozzle opening.
    Type: Grant
    Filed: November 16, 2007
    Date of Patent: May 15, 2012
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Atsushi Oda, Toshiro Kobayashi, Keiichi Sato, Hiroko Kitamoto, Susumu Kamikawa, Kozo Wada
  • Publication number: 20100269366
    Abstract: A drying device including: a travelling unit and a drying unit. The travelling unit transports a sheet-like substrate in a travelling direction. The sheet-like substrate includes a thin film body wherein at least one surface of the thin film body is coated with a coating material including an active material. The drying unit dries the thin film body. The drying unit includes a radiative heater and a first nozzle. The radiative heater irradiates an infrared ray to a to-be-dried surface of the thin film body. The first nozzle blows a dry air to the to-be-dried surface in a direction opposite to the travelling direction of the sheet-like substrate.
    Type: Application
    Filed: March 30, 2010
    Publication date: October 28, 2010
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Hiroko Kitamoto, Keiichi Sato, Naohiko Matsuda, Masahiro Sugihara
  • Publication number: 20090133629
    Abstract: Provided is an in-line film-formation apparatus including: deposition sources, deposition-preventing plates, and a screen. The deposition sources store different film-formation materials, and include openings extending in the width directions of a substrate, which is perpendicular to the conveying direction. The openings, arranged in parallel with each other, are disposed respectively on the upstream and the downstream sides in the conveying direction. The plates, partitioning a co-deposition chamber from adjacent deposition chambers and placed, in parallel to each other, on the upstream and the downstream sides in the conveying direction, limit a deposition region of the vapor from the openings. The screen limits and makes the deposition regions of the substrate for vapor from openings coincide with deposition regions limited by the plates. Thereby, the formation of a mono-content film is prevented and only the mixed film is formed on the substrate.
    Type: Application
    Filed: November 18, 2008
    Publication date: May 28, 2009
    Applicant: Mitsubishi-Hitachi Metals Machinery, Inc.
    Inventors: Susumu KAMIKAWA, Keiichi SATO, Hiroko KITAMOTO, Toshiro KOBAYASHI
  • Publication number: 20080115729
    Abstract: An evaporation source having a nozzle structure that makes the distribution of film thickness uniform in the width direction of a substrate and a vacuum evaporator using the same are provided. A vapor produced by evaporation or sublimation by heating to evaporation material is discharged from a long nozzle opening like a band. A deposited substrate is transferred in a direction perpendicular to the longitudinal direction of the nozzle opening while facing the nozzle opening. A discharge flow rate of vapor per unit area in the longitudinal direction of the nozzle opening is made to be maximum in a portion at a nozzle width direction position corresponding to a substrate edge position rather than a central part of the nozzle opening and a plurality of partition plates providing directivity to the flow of vapor are arranged inside the nozzle opening.
    Type: Application
    Filed: November 16, 2007
    Publication date: May 22, 2008
    Applicants: Yamagata Promotional Organization for Industrial Technology, MITSUBISHI HEAVY INDUSTRIES, LTD., Mitsubishi-Hitachi Metals Machinery, Inc.
    Inventors: Atsushi Oda, Toshiro Kobayashi, Keiichi Sato, Hiroko Kitamoto, Susumu Kamikawa, Kozo Wada
  • Publication number: 20060241042
    Abstract: A calcineurin activator, comprising the following protein (a) or (b) as an active ingredient and having the action of increasing intracellular calcium ion concentration through the influx of calcium ions into eukaryotic cells: (a) a killer protein (KLKP), being composed of 3 subunits consisting of amino acid sequences represented by SEQ ID NOS: 2, 3, and 4, respectively, and being produced by Kluyveromyces lactis killer yeast; or (b) a protein, being the same as protein (a) except for differing from protein (a) in that at least one of the 3 subunits consists of an amino acid sequence derived from the amino acid sequence represented by SEQ ID NO: 2, 3, or 4 by deletion, substitution, or addition of 1 or several amino acids, and having Kluyveromyces lactis killer protein (KLKP) activity.
    Type: Application
    Filed: May 26, 2006
    Publication date: October 26, 2006
    Applicant: National Institute of Agrobiological Sciences
    Inventors: Hiroko Kitamoto, Tokichi Miyakawa