Patents by Inventor Hiroko Kitamoto
Hiroko Kitamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240066072Abstract: Provided herein is technology relating to preventing and treating gastrointestinal dysbiosis and particularly, but not exclusively, to compositions, methods, systems, and kits for treating and/or preventing Clostridioides difficile infection in an organism.Type: ApplicationFiled: September 28, 2020Publication date: February 29, 2024Inventors: Nobuhiko Kamada, Hiroko Kitamoto
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Publication number: 20230077099Abstract: [Problem to be Solved] Provided is a nursery pot body having stability over time, exhibiting suppressed decomposition during seedling raising, maintaining sufficient strength at the time of planting, and being rapidly degraded after planting in a field through enzyme treatment immediately before and/or immediately after planting. [Solution] Base paper for a nursery pot body is characterized in that a biodegradable resin layer is provided on at least one surface of a paper substrate, wherein the biodegradable resin layer contains at least 15 mass % of a polylactic acid relative to 100 mass % of a biodegradable resin composition, and a nursery pot body is produced by molding the base paper.Type: ApplicationFiled: February 3, 2021Publication date: March 9, 2023Inventors: Takuya NAKAGAWA, Yasuomi OTA, Naohiro KAWAMURA, Tokuya SASAKI, Hiroko KITAMOTO, Michinori NAKAMOTO
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Patent number: 11519644Abstract: A cooling device includes a cooler disposed inside a shell main body formed in a cylindrical shape, and having a first surface facing an inlet nozzle and an outlet nozzle, and a partition member fixed to the first surface, and partitioning a portion between the cooler and an inner peripheral surface of the shell main body into a first space communicating with the inlet nozzle and a second space communicating with the outlet nozzle. The partition member includes a main partition plate disposed between the inlet nozzle and the outlet nozzle in an axial direction, a first guide portion extending from an end portion of the main partition plate toward a first end surface of the shell main body, and a second guide portion extending from an end portion of the main partition plate toward a second end surface of the shell main body.Type: GrantFiled: February 18, 2021Date of Patent: December 6, 2022Assignee: MITSUBISHI HEAVY INDUSTRIES COMPRESSOR CORPORATIONInventors: Kazutoshi Yokoo, Hiroko Kitamoto
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Publication number: 20210262711Abstract: A cooling device includes a cooler disposed inside a shell main body formed in a cylindrical shape, and having a first surface facing an inlet nozzle and an outlet nozzle, and a partition member fixed to the first surface, and partitioning a portion between the cooler and an inner peripheral surface of the shell main body into a first space communicating with the inlet nozzle and a second space communicating with the outlet nozzle. The partition member includes a main partition plate disposed between the inlet nozzle and the outlet nozzle in an axial direction, a first guide portion extending from an end portion of the main partition plate toward a first end surface of the shell main body, and a second guide portion extending from an end portion of the main partition plate toward a second end surface of the shell main body.Type: ApplicationFiled: February 18, 2021Publication date: August 26, 2021Applicant: MITSUBISHI HEAVY INDUSTRIES COMPRESSOR CORPORATIONInventors: Kazutoshi Yokoo, Hiroko Kitamoto
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Patent number: 9644482Abstract: A method for manufacturing a machine component includes a process of estimating post-heat-treatment strength for the intermediate form of a base material after a certain mechanical working process is performed, and a process of comparing the estimated strength with reference strength required for a final form. According to a result of the comparison, heat treatment of the base material is performed after one of the mechanical working processes is performed.Type: GrantFiled: December 20, 2012Date of Patent: May 9, 2017Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Shimpei Okayasu, Hiroko Kitamoto, Daisuke Kawanishi, Hiroki Takagi, Nobuyori Yagi
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Patent number: 9423183Abstract: A heat treatment method of an impeller includes a heat treatment preparation process of arranging the impeller within a vacuum furnace, an impeller covering process of covering an outer peripheral surface of the impeller in a circumferential direction by a heat uniformizing jig made of a radiation conversion material which radiates transferred heat as radiant heat, and a heat treatment process including a heating process and a cooling process in which heat treatment is performed by heating or cooling the impeller covered with the heat uniformizing jig from the periphery using a heater.Type: GrantFiled: February 15, 2013Date of Patent: August 23, 2016Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Kazutoshi Yoko, Hiroko Kitamoto, Shimpei Okayasu, Hiroki Takagi
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Publication number: 20150017593Abstract: A heat treatment method of an impeller includes a heat treatment preparation process of arranging the impeller within a vacuum furnace, an impeller covering process of covering an outer peripheral surface of the impeller in a circumferential direction by a heat uniformizing jig made of a radiation conversion material which radiates transferred heat as radiant heat, and a heat treatment process including a heating process and a cooling process in which heat treatment is performed by heating or cooling the impeller covered with the heat uniformizing jig from the periphery using a heater.Type: ApplicationFiled: February 15, 2013Publication date: January 15, 2015Inventors: Kazutoshi Yoko, Hiroko Kitamoto, Shimpei Okayasu, Hiroki Takagi
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Publication number: 20140105751Abstract: A method for manufacturing a machine component includes a process of estimating post-heat-treatment strength for the intermediate form of a base material after a certain mechanical working process is performed, and a process of comparing the estimated strength with reference strength required for a final form. According to a result of the comparison, heat treatment of the base material is performed after one of the mechanical working processes is performed.Type: ApplicationFiled: December 20, 2012Publication date: April 17, 2014Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Shimpei Okayasu, Hiroko Kitamoto, Daisuke Kawanishi, Hiroki Takagi, Nobuyori Yagi
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Patent number: 8353113Abstract: A drying device including: a travelling unit and a drying unit. The travelling unit transports a sheet-like substrate in a travelling direction. The sheet-like substrate includes a thin film body wherein at least one surface of the thin film body is coated with a coating material including an active material. The drying unit dries the thin film body. The drying unit includes a radiative heater and a first nozzle. The radiative heater irradiates an infrared ray to a to-be-dried surface of the thin film body. The first nozzle blows a dry air to the to-be-dried surface in a direction opposite to the travelling direction of the sheet-like substrate.Type: GrantFiled: March 30, 2010Date of Patent: January 15, 2013Assignee: Mitsubishi Heavy Industries, LTD.Inventors: Hiroko Kitamoto, Keiichi Sato, Naohiko Matsuda, Masahiro Sugihara
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Patent number: 8177912Abstract: An evaporation source having a nozzle structure that makes the distribution of film thickness uniform in the width direction of a substrate and a vacuum evaporator using the same are provided. A vapor produced by evaporation or sublimation by heating to evaporation material is discharged from a long nozzle opening like a band. A deposited substrate is transferred in a direction perpendicular to the longitudinal direction of the nozzle opening while facing the nozzle opening. A discharge flow rate of vapor per unit area in the longitudinal direction of the nozzle opening is made to be maximum in a portion at a nozzle width direction position corresponding to a substrate edge position rather than a central part of the nozzle opening and a plurality of partition plates providing directivity to the flow of vapor are arranged inside the nozzle opening.Type: GrantFiled: November 16, 2007Date of Patent: May 15, 2012Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Atsushi Oda, Toshiro Kobayashi, Keiichi Sato, Hiroko Kitamoto, Susumu Kamikawa, Kozo Wada
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Publication number: 20100269366Abstract: A drying device including: a travelling unit and a drying unit. The travelling unit transports a sheet-like substrate in a travelling direction. The sheet-like substrate includes a thin film body wherein at least one surface of the thin film body is coated with a coating material including an active material. The drying unit dries the thin film body. The drying unit includes a radiative heater and a first nozzle. The radiative heater irradiates an infrared ray to a to-be-dried surface of the thin film body. The first nozzle blows a dry air to the to-be-dried surface in a direction opposite to the travelling direction of the sheet-like substrate.Type: ApplicationFiled: March 30, 2010Publication date: October 28, 2010Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Hiroko Kitamoto, Keiichi Sato, Naohiko Matsuda, Masahiro Sugihara
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Publication number: 20090133629Abstract: Provided is an in-line film-formation apparatus including: deposition sources, deposition-preventing plates, and a screen. The deposition sources store different film-formation materials, and include openings extending in the width directions of a substrate, which is perpendicular to the conveying direction. The openings, arranged in parallel with each other, are disposed respectively on the upstream and the downstream sides in the conveying direction. The plates, partitioning a co-deposition chamber from adjacent deposition chambers and placed, in parallel to each other, on the upstream and the downstream sides in the conveying direction, limit a deposition region of the vapor from the openings. The screen limits and makes the deposition regions of the substrate for vapor from openings coincide with deposition regions limited by the plates. Thereby, the formation of a mono-content film is prevented and only the mixed film is formed on the substrate.Type: ApplicationFiled: November 18, 2008Publication date: May 28, 2009Applicant: Mitsubishi-Hitachi Metals Machinery, Inc.Inventors: Susumu KAMIKAWA, Keiichi SATO, Hiroko KITAMOTO, Toshiro KOBAYASHI
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Publication number: 20080115729Abstract: An evaporation source having a nozzle structure that makes the distribution of film thickness uniform in the width direction of a substrate and a vacuum evaporator using the same are provided. A vapor produced by evaporation or sublimation by heating to evaporation material is discharged from a long nozzle opening like a band. A deposited substrate is transferred in a direction perpendicular to the longitudinal direction of the nozzle opening while facing the nozzle opening. A discharge flow rate of vapor per unit area in the longitudinal direction of the nozzle opening is made to be maximum in a portion at a nozzle width direction position corresponding to a substrate edge position rather than a central part of the nozzle opening and a plurality of partition plates providing directivity to the flow of vapor are arranged inside the nozzle opening.Type: ApplicationFiled: November 16, 2007Publication date: May 22, 2008Applicants: Yamagata Promotional Organization for Industrial Technology, MITSUBISHI HEAVY INDUSTRIES, LTD., Mitsubishi-Hitachi Metals Machinery, Inc.Inventors: Atsushi Oda, Toshiro Kobayashi, Keiichi Sato, Hiroko Kitamoto, Susumu Kamikawa, Kozo Wada
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Publication number: 20060241042Abstract: A calcineurin activator, comprising the following protein (a) or (b) as an active ingredient and having the action of increasing intracellular calcium ion concentration through the influx of calcium ions into eukaryotic cells: (a) a killer protein (KLKP), being composed of 3 subunits consisting of amino acid sequences represented by SEQ ID NOS: 2, 3, and 4, respectively, and being produced by Kluyveromyces lactis killer yeast; or (b) a protein, being the same as protein (a) except for differing from protein (a) in that at least one of the 3 subunits consists of an amino acid sequence derived from the amino acid sequence represented by SEQ ID NO: 2, 3, or 4 by deletion, substitution, or addition of 1 or several amino acids, and having Kluyveromyces lactis killer protein (KLKP) activity.Type: ApplicationFiled: May 26, 2006Publication date: October 26, 2006Applicant: National Institute of Agrobiological SciencesInventors: Hiroko Kitamoto, Tokichi Miyakawa