Patents by Inventor Hiromi Ishikawa

Hiromi Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7095921
    Abstract: An optical fiber of a bundled fiber light source is an optical fiber whose core diameter is uniform but whose emission end cladding diameter is smaller than an incidence end cladding diameter thereof, and a light emission region thereof is made smaller. An angle of luminous flux from this higher luminance bundled fiber light source, which passes through a lens system and is incident on a DMD, is smaller, i.e., an illumination NA is made smaller. Thus, an angle of flux which is incident on a surface that is to be exposed is smaller. That is, a minute image formation beam can be obtained without increasing the image formation NA, focal depth is lengthen.
    Type: Grant
    Filed: August 3, 2005
    Date of Patent: August 22, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yoji Okazaki, Hiromi Ishikawa, Kazuhiko Nagano, Takeshi Fujii, Hiromitsu Yamakawa
  • Patent number: 7091511
    Abstract: Stimulating rays are linearly irradiated onto an area of a stimulable phosphor sheet, and light emitted by the sheet is detected with a line sensor. A device for irradiating the stimulating rays comprises laser diodes and a cylindrical lens. The laser diodes are located such that laser beams produced by the laser diodes as the stimulating rays stand in a row along the length direction of the linear area of the sheet exposed to the stimulating rays. Each laser diode is located in an orientation such that a beam spread direction normal to a junction plane approximately coincides with the direction, along which the laser beams stand in a row. The cylindrical lens converges each laser beam only in a plane normal to the direction, along which the laser beams stand in a row, and onto the sheet.
    Type: Grant
    Filed: August 28, 2001
    Date of Patent: August 15, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Hiromi Ishikawa
  • Patent number: 7077972
    Abstract: A method of creating a micro-channel in a substrate surface by exposing a resist film with a laser beam, removing the exposed resist film per the predetermined pattern, and etching the substrate using the predetermined pattern to form the micro-channel.
    Type: Grant
    Filed: April 13, 2005
    Date of Patent: July 18, 2006
    Assignees: Fuji Photo Film Co., Ltd., Fujinon Corporation
    Inventors: Hiromi Ishikawa, Kazuhiko Nagano, Yoji Okazaki, Takeshi Fujii, Hiromitsu Yamakawa
  • Patent number: 7079169
    Abstract: In an exposure apparatus of the invention, for a spatial light modulator, each of a plurality of pixel portions fewer than the total number of the pixel portions is controlled with a control signal generated according to exposure information. Namely, a part of the pixel portions is controlled without controlling a whole of the pixel portions on the substrate. Thus, the number of pixels in the pixel portions is decreased, and transfer time of the control signal becomes short. This enables modulation speed of the laser beam to be increased and the high-speed exposure to be performed. An incorporated laser light source, in which the laser beams are incorporated and struck on the optical fiber, is preferable to the laser device. By adopting the incorporated laser light source, high brightness and high output can be obtained, and it is preferable to the exposure of the spatial light modulator. Since the fiber array is obtained with few optical fibers, it is low cost.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: July 18, 2006
    Assignees: Fuji Photo Film Co., Ltd., Fujinon Corporation
    Inventors: Hiromi Ishikawa, Kazuhiko Nagano, Yoji Okazaki, Takeshi Fujii, Hiromitsu Yamakawa
  • Patent number: 7068414
    Abstract: A reduction in utilization efficiency of laser beams emitted from laser emission portions of illumination means is limited and an exposure surface is exposed by beam spots with desired spot diameters and spot forms. At an exposure head, first microlenses are arranged in a two dimensional manner so as to correspond to micromirrors at a DMD, and apertures are arranged in a two dimensional manner at back side focusing positions of the first microlenses. With this exposure head, light source images, which are formed to be very small at back side focusing positions of the first microlenses by the first microlenses, are projected onto the exposure surface, and these light source images serve as beam spots BS and expose the exposure surface.
    Type: Grant
    Filed: June 9, 2003
    Date of Patent: June 27, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Sunagawa, Hiromi Ishikawa, Yoji Okazaki, Kazuhiko Nagano, Takeshi Fujii, Toshihiko Omori
  • Patent number: 7061517
    Abstract: In the present invention provides, in order to obtain a desired focal depth t in a range ? of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula. D W ? ? × M 2 × t - K × ? a ? In the above formula, parameters are defined as follows.
    Type: Grant
    Filed: May 9, 2005
    Date of Patent: June 13, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiromi Ishikawa, Yoji Okazaki, Kazuhiko Nagano
  • Patent number: 7048528
    Abstract: In an exposure apparatus of the invention, for a spatial light modulator, each of a plurality of pixel portions fewer than the total number of the pixel portions is controlled with a control signal generated according to exposure information. Namely, a part of the pixel portions is controlled without controlling a whole of the pixel portions on the substrate. Thus, the number of pixels in the pixel portions is decreased, and transfer time of the control signal becomes short. This enables modulation speed of the laser beam to be increased and the high-speed exposure to be performed. An incorporated laser light source, in which the laser beams are incorporated and struck on the optical fiber, is preferable to the laser device. By adopting the incorporated laser light source, high brightness and high output can be obtained, and it is preferable to the exposure of the spatial light modulator. Since the fiber array is obtained with few optical fibers, it is low cost.
    Type: Grant
    Filed: April 13, 2005
    Date of Patent: May 23, 2006
    Assignees: Fuji Photo Film Co., Ltd., Fuji Photo Optical Co., Ltd.
    Inventors: Hiromi Ishikawa, Kazuhiko Nagano, Yoji Okazaki, Takeshi Fujii, Hiromitsu Yamakawa
  • Patent number: 7015488
    Abstract: In an exposure apparatus of the invention, for a spatial light modulator, each of a plurality of pixel portions fewer than the total number of the pixel portions is controlled with a control signal generated according to exposure information. Namely, a part of the pixel portions is controlled without controlling a whole of the pixel portions on the substrate. Thus, the number of pixels in the pixel portions is decreased, and transfer time of the control signal becomes short. This enables modulation speed of the laser beam to be increased and the high-speed exposure to be performed. An incorporated laser light source, in which the laser beams are incorporated and struck on the optical fiber, is preferable to the laser device. By adopting the incorporated laser light source, high brightness and high output can be obtained, and it is preferable to the exposure of the spatial light modulator. Since the fiber array is obtained with few optical fibers, it is low cost.
    Type: Grant
    Filed: April 13, 2005
    Date of Patent: March 21, 2006
    Assignees: Fuji Photo Film Co., Ltd., Fuji Photo Optical Co., Ltd.
    Inventors: Hiromi Ishikawa, Kazuhiko Nagano, Yoji Okazaki, Takeshi Fujii, Hiromitsu Yamakawa
  • Patent number: 7014986
    Abstract: A writing device is provided which, in simple processes, can write in two dimensions and three dimensions, and which can form highly accurate patterns. An exposure head, a conductive material discharging head, and an insulating material discharging head are disposed at one scanning stage. At the one scanning stage, a pattern can be formed on a printed board which is on the scanning stage. As a result, processes can be simplified, time between patternings can be shortened, and pattern formation can be made to be faster. Moreover, positional offset of the exposure head and the discharging heads with respect to the printed board does not arise. Thus, it is easy to increase a density of a pattern, and a highly accurate pattern is formed.
    Type: Grant
    Filed: June 6, 2003
    Date of Patent: March 21, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Mitsuru Sawano, Yoji Okazaki, Kazuhiko Nagano, Hiromi Ishikawa, Takeshi Fujii
  • Publication number: 20060055998
    Abstract: An imaging head faces an imaging surface and is relatively moved along the scanning surface in a predetermined scanning direction. The imaging head includes an imaging element group and an alteration section. The imaging element group is structured by a plurality of imaging elements, which are arranged two-dimensionally in a plane substantially parallel to the imaging surface. The imaging element group generates a group of image pixels at the imaging surface in a two-dimensional arrangement which is inclined, as a whole, at a predetermined inclination angle with respect to the scanning direction. The alteration section alters a number of image pixels in a direction which is inclined from the scanning direction by the inclination angle, on the basis of a difference between the predetermined inclination angle of the imaging element group and an actual inclination angle of the image pixel group.
    Type: Application
    Filed: October 28, 2005
    Publication date: March 16, 2006
    Inventors: Daisuke Nakaya, Takao Ozaki, Hiromi Ishikawa
  • Patent number: 6980366
    Abstract: A spatial light modulator has pixel sections for performing spatial light modulation of light. An image-side telecentric image forming optical system forms an image of a two-dimensional pattern of the light having been obtained from the spatial light modulation. A microlens array having microlenses arrayed in two-dimensional directions is located in the vicinity of a plane of image formation of the two-dimensional pattern, whose image is formed by the image forming optical system. A magnification adjusting optical system for adjusting a magnification of image formation at the time of the formation of the image of the two-dimensional pattern of the light with the image forming optical system is located between the image forming optical system and the microlens array.
    Type: Grant
    Filed: May 5, 2004
    Date of Patent: December 27, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Hiromi Ishikawa
  • Patent number: 6980348
    Abstract: An imaging head faces an imaging surface and is relatively moved along the scanning surface in a predetermined scanning direction. The imaging head includes an imaging element group and an alteration section. The imaging element group is structured by a plurality of imaging elements, which are arranged two-dimensionally in a plane substantially parallel to the imaging surface. The imaging element group generates a group of image pixels at the imaging surface in a two-dimensional arrangement which is inclined, as a whole, at a predetermined inclination angle with respect to the scanning direction. The alteration section alters a number of image pixels in a direction which is inclined from the scanning direction by the inclination angle, on the basis of a difference between the predetermined inclination angle of the imaging element group and an actual inclination angle of the image pixel group.
    Type: Grant
    Filed: December 2, 2003
    Date of Patent: December 27, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Daisuke Nakaya, Takao Ozaki, Hiromi Ishikawa
  • Publication number: 20050281516
    Abstract: An optical fiber of a bundled fiber light source is an optical fiber whose core diameter is uniform but whose emission end cladding diameter is smaller than an incidence end cladding diameter thereof, and a light emission region thereof is made smaller. An angle of luminous flux from this higher luminance bundled fiber light source, which passes through a lens system and is incident on a DMD, is smaller, i.e., an illumination NA is made smaller. Thus, an angle of flux which is incident on a surface that is to be exposed is smaller. That is, a minute image formation beam can be obtained without increasing the image formation NA, focal depth is lengthen.
    Type: Application
    Filed: August 3, 2005
    Publication date: December 22, 2005
    Inventors: Yoji Okazaki, Hiromi Ishikawa, Kazuhiko Nagano, Takeshi Fujii, Hiromitsu Yamakawa
  • Publication number: 20050281506
    Abstract: An optical fiber of a bundled fiber light source is an optical fiber whose core diameter is uniform but whose emission end cladding diameter is smaller than an incidence end cladding diameter thereof, and a light emission region thereof is made smaller. An angle of luminous flux from this higher luminance bundled fiber light source, which passes through a lens system and is incident on a DMD, is smaller, i.e., an illumination NA is made smaller. Thus, an angle of flux which is incident on a surface that is to be exposed is smaller. That is, a minute image formation beam can be obtained without increasing the image formation NA, focal depth is lengthen.
    Type: Application
    Filed: August 3, 2005
    Publication date: December 22, 2005
    Inventors: Yoji Okazaki, Hiromi Ishikawa, Kazuhiko Nagano, Takeshi Fujii, Hiromitsu Yamakawa
  • Publication number: 20050265655
    Abstract: An optical fiber of a bundled fiber light source is an optical fiber whose core diameter is uniform but whose emission end cladding diameter is smaller than an incidence end cladding diameter thereof, and a light emission region thereof is made smaller. An angle of luminous flux from this higher luminance bundled fiber light source, which passes through a lens system and is incident on a DMD, is smaller, i.e., an illumination NA is made smaller. Thus, an angle of flux which is incident on a surface that is to be exposed is smaller. That is, a minute image formation beam can be obtained without increasing the image formation NA, focal depth is lengthen.
    Type: Application
    Filed: August 3, 2005
    Publication date: December 1, 2005
    Inventors: Yoji Okazaki, Hiromi Ishikawa, Kazuhiko Nagano, Takeshi Fujii, Hiromitsu Yamakawa
  • Publication number: 20050254034
    Abstract: In an illumination optical system constituted to uniformize the intensity distribution of illumination light by use of an optical integrator, the overall length thereof is shortened. The illumination optical system includes: a light source including a laser irradiating illumination light on an illuminated body such as a two-dimensional SLM and an optical integrator; the optical integrator being placed between this light source and the illuminated body and uniformizes the intensity distribution of the illumination light by passing the light through minute cells. In this system, the size of the minute cell of the optical integrator (S1=S2) is 1.5 mm or less.
    Type: Application
    Filed: July 25, 2005
    Publication date: November 17, 2005
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Toshihiko Ohmori, Hiromi Ishikawa
  • Patent number: 6960035
    Abstract: An optical fiber of a bundled fiber light source is an optical fiber whose core diameter is uniform but whose emission end cladding diameter is smaller than an incidence end cladding diameter thereof, and a light emission region thereof is made smaller. An angle of luminous flux from this higher luminance bundled fiber light source, which passes through a lens system and is incident on a DMD, is smaller, i.e., an illumination NA is made smaller. Thus, an angle of flux which is incident on a surface that is to be exposed is smaller. That is, a minute image formation beam can be obtained without increasing the image formation NA, focal depth is lengthen.
    Type: Grant
    Filed: April 9, 2003
    Date of Patent: November 1, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yoji Okazaki, Hiromi Ishikawa, Kazuhiko Nagano, Takeshi Fujii, Hiromitsu Yamakawa
  • Patent number: 6958867
    Abstract: In an illumination optical system constituted to uniformize the intensity distribution of illumination light by use of an optical integrator, the overall length thereof is shortened. The illumination optical system includes: a light source including a laser irradiating illumination light on an illuminated body such as a two-dimensional SLM and an optical integrator; the optical integrator being placed between this light source and the illuminated body and uniformizes the intensity distribution of the illumination light by passing the light through minute cells. In this system, the size of the minute cell of the optical integrator (S1=S2) is 1.5 mm or less.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: October 25, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshihiko Ohmori, Hiromi Ishikawa
  • Publication number: 20050213068
    Abstract: An image exposure device includes an exposure head for forming a desired pattern on a photosensitive material. The exposure head is equipped with a light source for emitting a great number of light beams, a spatial light modulator in which a great number of pixel portions are arranged for independently modulating the light beams emitted from the light source, a micro lens array in which a great number of micro lenses are arranged for individually converging the great number of light beams modulated by the pixel portions, and a total of two or more aperture arrays arranged in the stage before the micro lens array and/or the stage after the micro lens array. Each of the aperture arrays has a great number of apertures for individually restricting the light beams.
    Type: Application
    Filed: March 28, 2005
    Publication date: September 29, 2005
    Inventors: Shuichi Ishii, Hiromi Ishikawa, Yoji Okazaki
  • Publication number: 20050200693
    Abstract: In the present invention provides, in order to obtain a desired focal depth t in a range a of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula. D W ? ? × M 2 × t - K × ? a ? In the above formula, parameters are defined as follows.
    Type: Application
    Filed: May 9, 2005
    Publication date: September 15, 2005
    Inventors: Hiromi Ishikawa, Yoji Okazaki, Kazuhiko Nagano