Abstract: To provide an X-ray microscopic inspection apparatus capable of performing non-destructive inspection with high resolving power within a very short period, and having advantageous functions such as a high precision electron probe control function, a CT function, an elemental analysis function, and a target switching function. The apparatus includes a magnetic superposition lens having a magnetic field generating portion disposed in the vicinity of an electron generating portion of an electron gun; reflected electron detecting means having a detecting portion disposed above the target for X-ray generation, for detecting a reflected electron from the target; and electron image generating means for performing imaging of a target surface utilizing the signals from the reflected electron detecting means, wherein the apparatus is arranged so that alignment including focus adjustment to the target for X-ray generation and astigmatism correction may be performed based on image information of the electron image.

Abstract: To provide an X-ray microscopic inspection apparatus capable of performing non-destructive inspection with high resolving power equal to or less than 0.1 ?m in a very short period, and largely contributing to the nano-technology field. In the X-ray microscopic inspection apparatus having X-ray generating means for generating an X-ray by allowing an electron beam from an electron source to impinge on a target for X-ray generation, for inspecting an object to be inspected by utilizing the X-ray, a magnetic field superposition lens having a magnetic field generating portion disposed in the vicinity of an electron generating portion of an electron gun is included as a component element of the X-ray generating means. Further, the apparatus includes a liquid metal electron source using liquid metal or a thermal field emission electron source as the electron source, as a component element of the X-ray generating means.

Abstract: To provide an X-ray microscopic inspection apparatus capable of performing non-destructive inspection with high resolving power equal to or less than 0.1 ?m in a very short period, and largely contributing to the nano-technology field. In the X-ray microscopic inspection apparatus having X-ray generating means for generating an X-ray by allowing an electron beam from an electron source to impinge on a target for X-ray generation, for inspecting an object to be inspected by utilizing the X-ray, a magnetic field superposition lens having a magnetic field generating portion disposed in the vicinity of an electron generating portion of an electron gun is included as a component element of the X-ray generating means. Further, the apparatus includes a liquid metal electron source using liquid metal or a thermal field emission electron source as the electron source, as a component element of the X-ray generating means.

Abstract: To provide an X-ray microscopic inspection apparatus capable of performing non-destructive inspection with high resolving power within a very short period, and having advantageous functions such as a high precision electron probe control function, a CT function, an elemental analysis function, and a target switching function. The apparatus includes a magnetic superposition lens having a magnetic field generating portion disposed in the vicinity of an electron generating portion of an electron gun; reflected electron detecting means having a detecting portion disposed above the target for X-ray generation, for detecting a reflected electron from the target; and electron image generating means for performing imaging of a target surface utilizing the signals from the reflected electron detecting means, wherein the apparatus is arranged so that alignment including focus adjustment to the target for X-ray generation and astigmatism correction may be performed based on image information of the electron image.

Abstract: A proximity printing device in which the angle of the light with which a workpiece is irradiated can be changed has an exit part attached on a base and a light source part supported by two bearings. Light emitted from a lamp is focused by an oval focusing mirror and is radiated onto the workpiece via a mask. In one embodiment, two ends of the base are joined to guides of arc-shaped arms. Rotating the base tilts the exit part and the workpiece can be obliquely irradiated with light. Because the light source part is held by two bearings, the lamp of the light source part can be held in a vertical state even when the base is tilted. Furthermore, the direction of motion of the light source part can be limited by means of a ball spline or the like to a horizontal direction, and can be moved by means of a drive so that the exit part can be tilted while holding the light source part vertical.

Abstract: To prevent tilting or bending of a large mask frame holder and at the same time to prevent distortion when the mask holding frame is attached to a support base by ball plungers in three of the four corner areas of a mask holding frame that engage V groove bodies which face the ball plungers on the surface of the base, compression springs are provided in those three corners which pre-stress the mask holding frame toward the support base while a compression spring is provided between the remaining corner area of the mask holding frame and the base which acts in a direction pressing the mask holding frame away from the support base, thereby preventing the mask holding frame from bending or tilting. As an alternative, in each of the three pre-stressed corner areas of the mask holding frame, instead of a compression spring, an elastic attachment component in the form of a bracket with spring-like legs mounted to the supporting component can be provided.