Patents by Inventor Hiromichi Hara

Hiromichi Hara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10481509
    Abstract: The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: November 19, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yoshihiro Morimoto, Hiromichi Hara, Masahiko Ogawa, Ryo Takai
  • Publication number: 20190278185
    Abstract: The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.
    Type: Application
    Filed: March 4, 2019
    Publication date: September 12, 2019
    Inventors: Yoshihiro Morimoto, Hiromichi Hara, Masahiko Ogawa, Ryo Takai
  • Patent number: 8780329
    Abstract: An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: July 15, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiromichi Hara, Yasuyo Kawabata
  • Patent number: 7944546
    Abstract: An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: May 17, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masatomi Yoshida, Hiromichi Hara
  • Patent number: 7821617
    Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: October 26, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara
  • Publication number: 20100079736
    Abstract: An apparatus that exposes a pattern of an original onto a plate through a projection optical system. The apparatus includes a reference base that holds the projection optical system, a supporting unit configured to elastically support the reference base, a base structure that holds the supporting unit on an installation floor, a detection unit configured to detect a relative position between the base structure and the reference base, and an adjustment unit, which is disposed at the installation floor of the base structure, configured to adjust an attitude of the base structure based on the results detected by the detection unit.
    Type: Application
    Filed: September 30, 2009
    Publication date: April 1, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hiroyuki Wada, Hiromichi Hara
  • Publication number: 20090195767
    Abstract: An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.
    Type: Application
    Filed: January 28, 2009
    Publication date: August 6, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Masatomi Yoshida, Hiromichi Hara
  • Publication number: 20090168036
    Abstract: An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.
    Type: Application
    Filed: December 22, 2008
    Publication date: July 2, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hiromichi Hara, Yasuyo Kawabata
  • Publication number: 20070160356
    Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
    Type: Application
    Filed: March 20, 2007
    Publication date: July 12, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Hiromichi Hara
  • Patent number: 7227617
    Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
    Type: Grant
    Filed: July 28, 2005
    Date of Patent: June 5, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara
  • Patent number: 7060414
    Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: June 13, 2006
    Assignee: JSR Corporation
    Inventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
  • Publication number: 20060023180
    Abstract: Disclosed is an apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, a first anti-vibration mount being supported by the first unit and for supporting a first constituent element of the exposure system, and a second anti-vibration mount being supported by the second unit and for supporting a second constituent element of the exposure system.
    Type: Application
    Filed: July 28, 2005
    Publication date: February 2, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Hiromichi Hara
  • Publication number: 20050158657
    Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
    Type: Application
    Filed: March 16, 2005
    Publication date: July 21, 2005
    Inventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
  • Patent number: 6914663
    Abstract: An exposure apparatus has an optical system and transfers a pattern of a mask to a substrate via the optical system. The apparatus includes a structure, a partition wall which defines a space including an optical path of the optical system, and an elastic seal member which couples the structure and the partition wall to seal the space. The elastic seal member is arranged so that a hollow cylinder is compressed in a direction of an axis of the hollow cylinder. The hollow cylinder, in an uncompressed state, includes a member undulated in a cross section perpendicular to the axis and a shape of the uncompressed-state hollow cylinder in the cross section being substantially uniform along the axis.
    Type: Grant
    Filed: September 15, 2003
    Date of Patent: July 5, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara
  • Patent number: 6899989
    Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
    Type: Grant
    Filed: November 16, 2001
    Date of Patent: May 31, 2005
    Assignee: JSR Corporation
    Inventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
  • Patent number: 6897939
    Abstract: An exposure apparatus for exposing a substrate in a vacuum atmosphere includes vibration absorbing mounts that are disposed in a vacuum chamber in order to make it possible to support at least one exposure structure in the vacuum atmosphere with high precision. The at least one exposure structure includes at least one of a mask stage plate, a wafer stage plate, and a barrel surface plate. The vibration absorbing mounts are formed using metallic bellows. By the vibration absorbing mounts, the at least one exposure structure is supported in the vacuum chamber.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: May 24, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara
  • Patent number: 6885431
    Abstract: An exposure apparatus has a structure supported by a vibration isolating mechanism and a partition wall inserted in at least part of the optical path of exposure light used in the exposure apparatus. The structure and partition wall are coupled by an elastic seal member to form a closed space, and the interior of the partition wall is partitioned from the remaining space.
    Type: Grant
    Filed: September 10, 2003
    Date of Patent: April 26, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara
  • Patent number: 6862077
    Abstract: An anti-vibration system includes air dampers of high natural frequency, in a compact space. A pair of air dampers are disposed with their driving directions opposed to each other, and inside pressures of these dampers are variably controlled so as to set the natural vibration frequency.
    Type: Grant
    Filed: October 3, 2002
    Date of Patent: March 1, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara
  • Publication number: 20040137384
    Abstract: An exposure apparatus for exposing a substrate in a vacuum atmosphere includes vibration absorbing mounts that are disposed in a vacuum chamber in order to make it possible to support at least one exposure structure in the vacuum atmosphere with high precision. The at least one exposure structure includes at least one of a mask stage plate, a wafer stage plate, and a barrel surface plate. The vibration absorbing mounts are formed using metallic bellows. By the vibration absorbing mounts, the at least one exposure structure is supported in the vacuum chamber.
    Type: Application
    Filed: November 12, 2003
    Publication date: July 15, 2004
    Applicant: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara
  • Publication number: 20040057031
    Abstract: In an exposure apparatus having a structure which is supported by a vibration isolating mechanism, and a partition wall which is inserted in at least part of the optical path of exposure light used in the exposure apparatus, the structure and partition wall are coupled by an elastic seal member to form a closed space, and the interior of the partition wall is partitioned from the remaining space.
    Type: Application
    Filed: September 10, 2003
    Publication date: March 25, 2004
    Applicant: Canon Kabushiki Kaisha
    Inventor: Hiromichi Hara