Patents by Inventor Hiromichi Hara
Hiromichi Hara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10481509Abstract: The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.Type: GrantFiled: March 4, 2019Date of Patent: November 19, 2019Assignee: CANON KABUSHIKI KAISHAInventors: Yoshihiro Morimoto, Hiromichi Hara, Masahiko Ogawa, Ryo Takai
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Publication number: 20190278185Abstract: The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.Type: ApplicationFiled: March 4, 2019Publication date: September 12, 2019Inventors: Yoshihiro Morimoto, Hiromichi Hara, Masahiko Ogawa, Ryo Takai
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Patent number: 8780329Abstract: An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.Type: GrantFiled: December 22, 2008Date of Patent: July 15, 2014Assignee: Canon Kabushiki KaishaInventors: Hiromichi Hara, Yasuyo Kawabata
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Patent number: 7944546Abstract: An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.Type: GrantFiled: January 28, 2009Date of Patent: May 17, 2011Assignee: Canon Kabushiki KaishaInventors: Masatomi Yoshida, Hiromichi Hara
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Patent number: 7821617Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.Type: GrantFiled: March 20, 2007Date of Patent: October 26, 2010Assignee: Canon Kabushiki KaishaInventor: Hiromichi Hara
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Publication number: 20100079736Abstract: An apparatus that exposes a pattern of an original onto a plate through a projection optical system. The apparatus includes a reference base that holds the projection optical system, a supporting unit configured to elastically support the reference base, a base structure that holds the supporting unit on an installation floor, a detection unit configured to detect a relative position between the base structure and the reference base, and an adjustment unit, which is disposed at the installation floor of the base structure, configured to adjust an attitude of the base structure based on the results detected by the detection unit.Type: ApplicationFiled: September 30, 2009Publication date: April 1, 2010Applicant: CANON KABUSHIKI KAISHAInventors: Hiroyuki Wada, Hiromichi Hara
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Publication number: 20090195767Abstract: An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.Type: ApplicationFiled: January 28, 2009Publication date: August 6, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Masatomi Yoshida, Hiromichi Hara
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Publication number: 20090168036Abstract: An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.Type: ApplicationFiled: December 22, 2008Publication date: July 2, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Hiromichi Hara, Yasuyo Kawabata
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Publication number: 20070160356Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.Type: ApplicationFiled: March 20, 2007Publication date: July 12, 2007Applicant: CANON KABUSHIKI KAISHAInventor: Hiromichi Hara
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Patent number: 7227617Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.Type: GrantFiled: July 28, 2005Date of Patent: June 5, 2007Assignee: Canon Kabushiki KaishaInventor: Hiromichi Hara
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Patent number: 7060414Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.Type: GrantFiled: March 16, 2005Date of Patent: June 13, 2006Assignee: JSR CorporationInventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
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Publication number: 20060023180Abstract: Disclosed is an apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, a first anti-vibration mount being supported by the first unit and for supporting a first constituent element of the exposure system, and a second anti-vibration mount being supported by the second unit and for supporting a second constituent element of the exposure system.Type: ApplicationFiled: July 28, 2005Publication date: February 2, 2006Applicant: CANON KABUSHIKI KAISHAInventor: Hiromichi Hara
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Publication number: 20050158657Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.Type: ApplicationFiled: March 16, 2005Publication date: July 21, 2005Inventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
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Patent number: 6914663Abstract: An exposure apparatus has an optical system and transfers a pattern of a mask to a substrate via the optical system. The apparatus includes a structure, a partition wall which defines a space including an optical path of the optical system, and an elastic seal member which couples the structure and the partition wall to seal the space. The elastic seal member is arranged so that a hollow cylinder is compressed in a direction of an axis of the hollow cylinder. The hollow cylinder, in an uncompressed state, includes a member undulated in a cross section perpendicular to the axis and a shape of the uncompressed-state hollow cylinder in the cross section being substantially uniform along the axis.Type: GrantFiled: September 15, 2003Date of Patent: July 5, 2005Assignee: Canon Kabushiki KaishaInventor: Hiromichi Hara
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Patent number: 6899989Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.Type: GrantFiled: November 16, 2001Date of Patent: May 31, 2005Assignee: JSR CorporationInventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
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Patent number: 6897939Abstract: An exposure apparatus for exposing a substrate in a vacuum atmosphere includes vibration absorbing mounts that are disposed in a vacuum chamber in order to make it possible to support at least one exposure structure in the vacuum atmosphere with high precision. The at least one exposure structure includes at least one of a mask stage plate, a wafer stage plate, and a barrel surface plate. The vibration absorbing mounts are formed using metallic bellows. By the vibration absorbing mounts, the at least one exposure structure is supported in the vacuum chamber.Type: GrantFiled: November 12, 2003Date of Patent: May 24, 2005Assignee: Canon Kabushiki KaishaInventor: Hiromichi Hara
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Patent number: 6885431Abstract: An exposure apparatus has a structure supported by a vibration isolating mechanism and a partition wall inserted in at least part of the optical path of exposure light used in the exposure apparatus. The structure and partition wall are coupled by an elastic seal member to form a closed space, and the interior of the partition wall is partitioned from the remaining space.Type: GrantFiled: September 10, 2003Date of Patent: April 26, 2005Assignee: Canon Kabushiki KaishaInventor: Hiromichi Hara
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Patent number: 6862077Abstract: An anti-vibration system includes air dampers of high natural frequency, in a compact space. A pair of air dampers are disposed with their driving directions opposed to each other, and inside pressures of these dampers are variably controlled so as to set the natural vibration frequency.Type: GrantFiled: October 3, 2002Date of Patent: March 1, 2005Assignee: Canon Kabushiki KaishaInventor: Hiromichi Hara
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Publication number: 20040137384Abstract: An exposure apparatus for exposing a substrate in a vacuum atmosphere includes vibration absorbing mounts that are disposed in a vacuum chamber in order to make it possible to support at least one exposure structure in the vacuum atmosphere with high precision. The at least one exposure structure includes at least one of a mask stage plate, a wafer stage plate, and a barrel surface plate. The vibration absorbing mounts are formed using metallic bellows. By the vibration absorbing mounts, the at least one exposure structure is supported in the vacuum chamber.Type: ApplicationFiled: November 12, 2003Publication date: July 15, 2004Applicant: Canon Kabushiki KaishaInventor: Hiromichi Hara
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Publication number: 20040057031Abstract: In an exposure apparatus having a structure which is supported by a vibration isolating mechanism, and a partition wall which is inserted in at least part of the optical path of exposure light used in the exposure apparatus, the structure and partition wall are coupled by an elastic seal member to form a closed space, and the interior of the partition wall is partitioned from the remaining space.Type: ApplicationFiled: September 10, 2003Publication date: March 25, 2004Applicant: Canon Kabushiki KaishaInventor: Hiromichi Hara