Patents by Inventor Hiromitsu CHATANI
Hiromitsu CHATANI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11984291Abstract: A method for manufacturing an electron source includes steps of sandwiching a welding object in which a tip of an electron emission material and a tungsten filament overlap in direct contact between a pair of welding electrodes, and welding the tip and the tungsten filament by causing a current to flow while pressing forces are applied to the welding object by the pair of welding electrodes. A thickness of the welding object is within a range of 50 to 500 ?m.Type: GrantFiled: December 20, 2021Date of Patent: May 14, 2024Assignee: Denka Company LimitedInventor: Hiromitsu Chatani
-
Patent number: 11915921Abstract: An electron source according to the present disclosure includes a columnar portion made of a first material having an electron emission characteristic; and a tubular portion that is disposed to surround the columnar portion and made of a second material having a higher work function than the first material, wherein a hole that extends in a direction from one end face toward the other end face and has a substantially circular cross-sectional shape is formed in the tubular portion, and the columnar portion has a substantially triangular or substantially quadrangular cross-sectional shape and is fixed to the tubular portion in an abutting engagement with an inner surface of the hole.Type: GrantFiled: April 14, 2021Date of Patent: February 27, 2024Assignee: Denka Company LimitedInventors: Dai Tsukada, Hiromitsu Chatani, Daisuke Ishikawa
-
Publication number: 20240029989Abstract: A method for manufacturing an electron source includes steps of sandwiching a welding object in which a tip of an electron emission material and a tungsten filament overlap in direct contact between a pair of welding electrodes, and welding the tip and the tungsten filament by causing a current to flow while pressing forces are applied to the welding object by the pair of welding electrodes. A thickness of the welding object is within a range of 50 to 500 ?m.Type: ApplicationFiled: December 20, 2021Publication date: January 25, 2024Applicant: Denka Company LimitedInventor: Hiromitsu CHATANI
-
Publication number: 20230317395Abstract: A method for manufacturing an electron source according to the present disclosure includes steps of: (A) preparing a first member provided with a columnar portion made of a first material having an electron emission characteristic, (B) preparing a second member which has a higher work function and a lower strength than the first material, and in which a hole is formed extending in a direction from one end surface toward the other end surface, and (C) pushing the columnar portion into the hole in the second member, wherein the first member has a cross-sectional shape that is dissimilar to the cross-sectional shape of the hole; and in the step (C), by pressing the columnar portion into the hole, a portion of a side surface of the columnar portion scrapes the inner surface of the hole and bites into the second member, thereby fixing the columnar portion to the second member.Type: ApplicationFiled: April 14, 2021Publication date: October 5, 2023Applicant: Denka Company LimitedInventors: Daisuke ISHIKAWA, Hiromitsu CHATANI
-
Publication number: 20230298846Abstract: An emitter according to the present disclosure includes: first and second heaters generating heat by energization; an electron source comprising a first material emitting an electron by being heated by the first and second heaters; and an intermediate member interposed between the electron source, and the first and second heaters, the intermediate member comprising a second material lower in thermal conductivity than the first material.Type: ApplicationFiled: August 5, 2021Publication date: September 21, 2023Applicant: Denka Company LimitedInventors: Daisuke ISHIKAWA, Hiromitsu CHATANI
-
Publication number: 20230215679Abstract: An electron source according to the present disclosure includes a columnar portion made of a first material having an electron emission characteristic; and a tubular portion that is disposed to surround the columnar portion and made of a second material having a higher work function than the first material, wherein a hole that extends in a direction from one end face toward the other end face and has a substantially circular cross-sectional shape is formed in the tubular portion, and the columnar portion has a substantially triangular or substantially quadrangular cross-sectional shape and is fixed to the tubular portion in an abutting engagement with an inner surface of the hole.Type: ApplicationFiled: April 14, 2021Publication date: July 6, 2023Applicant: Denka Company LimitedInventors: Dai TSUKADA, Hiromitsu CHATANI, Daisuke ISHIKAWA
-
Patent number: 11152185Abstract: An electron source capable of suppressing consumption of an electron emission material is provide. The present invention provides an electron source including: an electron emission material; and, an electron emission-suppressing material covering a side surface of the electron emission material, wherein a work function of the electron emission-suppressing material is higher than that of the electron emission material, and a thermal emissivity of the electron emission-suppressing material is lower than that of the electron emission material.Type: GrantFiled: February 17, 2021Date of Patent: October 19, 2021Assignee: Denka Company LimitedInventors: Toshiyuki Morishita, Hiromitsu Chatani, Shimpei Hirokawa, Toshiyuki Ibayashi, Isao Sugimoto
-
Publication number: 20210193427Abstract: An electron source capable of suppressing consumption of an electron emission material is provide. The present invention provides an electron source including: an electron emission material; and, an electron emission-suppressing material covering a side surface of the electron emission material, wherein a work function of the electron emission-suppressing material is higher than that of the electron emission material, and a thermal emissivity of the electron emission-suppressing material is lower than that of the electron emission material.Type: ApplicationFiled: February 17, 2021Publication date: June 24, 2021Inventors: Toshiyuki Morishita, Hiromitsu Chatani, Shimpei Hirokawa, Toshiyuki Ibayashi, Isao Sugimoto
-
Patent number: 10957511Abstract: An electron source capable of suppressing consumption of an electron emission material is provide. The present invention provides an electron source including: an electron emission material; and, an electron emission-suppressing material covering a side surface of the electron emission material, wherein a work function of the electron emission-suppressing material is higher than that of the electron emission material, and a thermal emissivity of the electron emission-suppressing material is lower than that of the electron emission material.Type: GrantFiled: December 9, 2019Date of Patent: March 23, 2021Assignee: Denka Company LimitedInventors: Toshiyuki Morishita, Hiromitsu Chatani, Shimpei Hirokawa, Toshiyuki Ibayashi, Isao Sugimoto
-
Publication number: 20200126750Abstract: An electron source capable of suppressing consumption of an electron emission material is provide. The present invention provides an electron source including: an electron emission material; and, an electron emission-suppressing material covering a side surface of the electron emission material, wherein a work function of the electron emission-suppressing material is higher than that of the electron emission material, and a thermal emissivity of the electron emission-suppressing material is lower than that of the electron emission material.Type: ApplicationFiled: December 9, 2019Publication date: April 23, 2020Inventors: Toshiyuki Morishita, Hiromitsu Chatani, Shimpei Hirokawa, Toshiyuki Ibayashi, Isao Sugimoto
-
Patent number: 10553390Abstract: An electron source capable of suppressing consumption of an electron emission material is provide. The present invention provides an electron source including: an electron emission material; and, an electron emission-suppressing material covering a side surface of the electron emission material, wherein a work function of the electron emission-suppressing material is higher than that of the electron emission material, and a thermal emissivity of the electron emission-suppressing material is lower than that of the electron emission material.Type: GrantFiled: June 29, 2017Date of Patent: February 4, 2020Assignee: Denka Company LimitedInventors: Toshiyuki Morishita, Hiromitsu Chatani, Shimpei Hirokawa, Toshiyuki Ibayashi, Isao Sugimoto
-
Publication number: 20190221399Abstract: An electron source capable of suppressing consumption of an electron emission material is provide. The present invention provides an electron source including: an electron emission material; and, an electron emission-suppressing material covering a side surface of the electron emission material, wherein a work function of the electron emission-suppressing material is higher than that of the electron emission material, and a thermal emissivity of the electron emission-suppressing material is lower than that of the electron emission material.Type: ApplicationFiled: June 29, 2017Publication date: July 18, 2019Applicant: Denka Company LimitedInventors: Toshiyuki MORISHITA, Hiromitsu CHATANI, Shimpei HIROKAWA, Toshiyuki IBAYASHI, Isao SUGIMOTO